a substrate loading and unloading fork which transfers substrates such as wafer boats from outside the device to a position in the inner deposition chamber and removes them from the inner deposition chamber following deposition.
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4525704
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ENZYMATIC TOXIC GAS SENSOR Donald N Campbell, John C Schmidt assigned to Allied Corporation A signal filter method and apparatus for removing portions of a signal indicative of erroneous data, an exemplary apparatus including means for receiving the signal, means for adjusting a threshold by increasing the threshold a first predetermined amount when the signal is in a predetermined relationship with the threshold and for decreasing the threshold a second predetermined amount when the signal is in a second predetermined relationship with the threshold, and means for comparing the signal with the adjusted threshold and for transmitting the signal if the signal bears a first predetermined relationship to the threshold. Disclosed herein are digital and analog implementations of the signal filter method and apparatus, particularly suited for use with catheter-type oximeter apparatus.
4524719 SUBSTRATE LOADING MEANS FOR A CHEMICAL VAPOR DEPOSITION APPARATUS Bryant A Campbell, Dale DuBois, Ralph F Manriquez, Nicholas E Miller assigned to Anicon Inc
An enzymatic toxic gas sensor l0 having a plurality of parallel planar surfaces and a buffered electrolyte reservoir 44. The buffered electrolyte is conveyed by means of diffusion to a substrate 28 to dissolve the substrate. The substrate diffuses to an immobilized enzyme where it is hydrolyzed if the enzyme is active. An electrochemical cell continuously monitors the hydrolyzed substrate concentration which is an indication of the enzymatic activity and presence of toxic gas. A circuit means responds to the current output of the electrochemical cell to indicate the presence or absence of a toxic gas. The shelf life of the sensor is extended by means of a separator for maintaining the enzyme dry and inactive. The enzyme in the preferred embodiment is acetylcholinesterase (AcHe).
4526029 PARTICLE SIZE ANALYSIS
36
Peter E Starnes, Slough, United Kingdom assigned to Bestobell (U K ) Limited KI
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A controlled temperature deposition device comprising an inner reaction chamber having gas distribution means for introducing gas into inner chamber and removing gas therefrom and a vacuum chamber means surrounding the inner deposition chamber and spaced from the walls thereof for maintaining a medium vacuum therein. Associated with the deposition device is