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Contents volume 2 (1984)
Microelectronic North-Holland
Engineering
329
2 (1984) 329 - 330
Contents Volume 2 (1984) S. NAMBA
Research
project on nanometer
FL. CARTER Molecular level fabrication R.E. HOWARD Nanometer-scale
structure
techniques
3
electronics
and molecular
electronic
27
silicon MOSFETs
C. HAMAGUCHI, T. MORI, T. WADA, K. TERASHIMA, and H. HIHARA Physics of nanometer structure devices H. OKAMOTO Optical properties
11
devices
of superlattice
A.N. BROERS Nanostructure fabrication
K. TANIGUCHI,
K. MIYATSUJI 34
44
and MQW laser diode
57
methods
M. ISAACSON, A. MURAY, M. SCHEINFEIN, I. ADESIDA and E. KRATSCHMER Nanometer structure fabrication using electron beam lithography
58
H. BENEKING A field emmision
65
E-beam system for nanometerlithography
K. GAMO and S. NAMBA Ion beam microfabrication
74
D.C. FLANDERS Nanometer structure
82
and device fabrication
T. KITAYAMA, T. TAMAMURA and K. HARADA Resolution limit of E-beam direct writing technology
97
M. TSUDA, M. YABUTA, K. YAMASHITA, S. OIKAWA, A. YOKOTA, H. NAKANE, K. GAMO and S. NAMBA Dry development and fine pattern fabrication PMIPK-AZIDE dry-developable resist in electron beam lithography
105
I. YAMADA, H. INOKAWA and T TAGAKI Ion beam deposition
113
S. FURUKAWA Investigation on solid phase epitaxy
121
and its application
A. KOMA, K. SUNOUCHI and T MIYAJIMA Fabrication and characterization of heterostructures
0167-9317/84/$3.30
with subnanometer
thickness
0 1984, Elsevier Science Publishers B.V. (North-Holland)
129
330
Contents Volume 2
T. IKOMA, M. TANIGUCHI and Y. MOCHIZUKI Mid-gap electron traps (EL2 family) in GaAs
137
T. SUETA and M. IZUTSU Integrated optical devices for high-speed
147
H. INABA An approach
to optically
integrated
K. TADA Proposal of a distributed single-mode oscillation
feedback
K. IGA Surface emitting
injection
signal processing
digital
logic devices
laser with nonuniform
155
stripe width for complete 157
lasers
165
T. SUGANO, Y. OKABE, H. TAMURA, H. MIYAKE and M. TAKATSU Bridge type Josephson junctions as high speed digital devices
175
K. FUJISAWA, T KOBAYASHI and S. KITA Microwave applications of Josephson junction
183
H. FURUKAWA and K. SHIRAE Critical current adjustment of superconducting H. HASEGAWA InP double-layer
gate MISFET technology
diode and triode
microbridge
in liquid helium
191
for VLSls
198
K. YAMANOUCHI Fine lithography and SAW devices
206
Editorial
217
H.N. SLINGERLAND Optimization of a chromatically
limited
ion microprobe
B. SCHNEIDER-GMELCH and I? TISCHER Ion-beam etched multi-level resist technique sorber patterns
for electroplating
219
of submicron
gold ab227
Y. MACHIDA, N. NAKAYAMA, S. YAMAMOTO and S. FURUYA Proximity-effect correction for VLSI patterns in electron-beam lithography
245
B.J.G.M. ROELOFS and J.E. BARTH Feasibility of multi-beam electron lithography
259
Y. UTSUGI, A. YOSHIKAWA and T. KITAYAMA An inorganic resist technology and its applications H.-D. BRUST and F. FOX Frequency tracing and mapping Calendar
of Events
in theory
to LSI fabrication
and practice
processes
281
299 323
Author Index
325
Contents Volume 2
329
Engineering
329
2 (1984) 329 - 330
Contents Volume 2 (1984) S. NAMBA
Research
project on nanometer
FL. CARTER Molecular level fabrication R.E. HOWARD Nanometer-scale
structure
techniques
3
electronics
and molecular
electronic
27
silicon MOSFETs
C. HAMAGUCHI, T. MORI, T. WADA, K. TERASHIMA, and H. HIHARA Physics of nanometer structure devices H. OKAMOTO Optical properties
11
devices
of superlattice
A.N. BROERS Nanostructure fabrication
K. TANIGUCHI,
K. MIYATSUJI 34
44
and MQW laser diode
57
methods
M. ISAACSON, A. MURAY, M. SCHEINFEIN, I. ADESIDA and E. KRATSCHMER Nanometer structure fabrication using electron beam lithography
58
H. BENEKING A field emmision
65
E-beam system for nanometerlithography
K. GAMO and S. NAMBA Ion beam microfabrication
74
D.C. FLANDERS Nanometer structure
82
and device fabrication
T. KITAYAMA, T. TAMAMURA and K. HARADA Resolution limit of E-beam direct writing technology
97
M. TSUDA, M. YABUTA, K. YAMASHITA, S. OIKAWA, A. YOKOTA, H. NAKANE, K. GAMO and S. NAMBA Dry development and fine pattern fabrication PMIPK-AZIDE dry-developable resist in electron beam lithography
105
I. YAMADA, H. INOKAWA and T TAGAKI Ion beam deposition
113
S. FURUKAWA Investigation on solid phase epitaxy
121
and its application
A. KOMA, K. SUNOUCHI and T MIYAJIMA Fabrication and characterization of heterostructures
0167-9317/84/$3.30
with subnanometer
thickness
0 1984, Elsevier Science Publishers B.V. (North-Holland)
129
330
Contents Volume 2
T. IKOMA, M. TANIGUCHI and Y. MOCHIZUKI Mid-gap electron traps (EL2 family) in GaAs
137
T. SUETA and M. IZUTSU Integrated optical devices for high-speed
147
H. INABA An approach
to optically
integrated
K. TADA Proposal of a distributed single-mode oscillation
feedback
K. IGA Surface emitting
injection
signal processing
digital
logic devices
laser with nonuniform
155
stripe width for complete 157
lasers
165
T. SUGANO, Y. OKABE, H. TAMURA, H. MIYAKE and M. TAKATSU Bridge type Josephson junctions as high speed digital devices
175
K. FUJISAWA, T KOBAYASHI and S. KITA Microwave applications of Josephson junction
183
H. FURUKAWA and K. SHIRAE Critical current adjustment of superconducting H. HASEGAWA InP double-layer
gate MISFET technology
diode and triode
microbridge
in liquid helium
191
for VLSls
198
K. YAMANOUCHI Fine lithography and SAW devices
206
Editorial
217
H.N. SLINGERLAND Optimization of a chromatically
limited
ion microprobe
B. SCHNEIDER-GMELCH and I? TISCHER Ion-beam etched multi-level resist technique sorber patterns
for electroplating
219
of submicron
gold ab227
Y. MACHIDA, N. NAKAYAMA, S. YAMAMOTO and S. FURUYA Proximity-effect correction for VLSI patterns in electron-beam lithography
245
B.J.G.M. ROELOFS and J.E. BARTH Feasibility of multi-beam electron lithography
259
Y. UTSUGI, A. YOSHIKAWA and T. KITAYAMA An inorganic resist technology and its applications H.-D. BRUST and F. FOX Frequency tracing and mapping Calendar
of Events
in theory
to LSI fabrication
and practice
processes
281
299 323
Author Index
325
Contents Volume 2
329