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Eighth International Conference on Secondary Ion Mass Spectrometry
Vacuum News Lecture' by Professor John A Venables of the Department of Mathematical and Physical Sciences at the University of Sussex. Professor Venables is a world known authority in electron microscopy and surface physics and his talk on 'Electron Spectroscopy and Microscopy of Surfaces' was, as expected, both interesting and revealing.
Clean pumping--techniques and applications The 'Vacuum Group' of the Institute of Physics held a very successful one-day meeting at their headquarters in Belgrave Square on 31 October 1 990, on the 'Techniques and Applications of Clean Pumping'. There were about 50 participants from universities and industrial and research organizations including two speakers from mainland Europe. The first paper in the 'techniques' section was presented by Dr C Benvenuti w h o spoke about the application of non-evaporable getters in the LEP machine at CERN. He was able to describe a model to fit a theoretical curve of the pumping speeds for different gases and gas mixtures. Dr J Henning, of Balzers High Vacuum, described both the turbomolecular and the molecular drag pumps, culminating with a combination of these t w o pumps to produce pressures of 10 4o mbar. Mr L Laurenson, of Edwards High Vaccum International, stated that clean pumping was possible with some fluids but often they were prohibitively expensive and he made comparisons with the rotary pump and the booster/dry pump combination. Dr W Obert of the JET joint undertaking opened the afternoon session by speaking about the advantages and problems of large scale cryopumping and compared this with turbo and diffusion pumps and he included a number of applications of large scale cryo-pumped systems in JET. Dr J Zhang of Imperial College talked about his 3 / 5 MBE system which demanded pressures less than 1 0 40 mbar, high pumping speeds and the necessity of being hydrocarbon free. They used a combination of sorption and venturi pumps or sorption and diaphragm pumps together with ion pumps and liquid nitrogen panels or closed-cycle cryo pumps. Dr Murrell of UKAEA, Harwell, spoke about an interesting ion pump/closed circuit cryo/turbo combination which resulted in a high speed/fail-safe system which gave pressures of 3x 10 11 mbar. The fourth paper in this section was given by Dr I Owen of VSW w h o described pumping applications in surface science in which he reminded the audience of the problems of cost cutting exercises such as manual or automatic facilities, the need to look at individual items and pitfalls in order to ensure successful design and usage of vacuum equipment. The meeting was concluded by a brief but interesting account of a few highlights, relevant to the meeting, that the Chairman of the Vacuum Group, Dr Austin Chambers, had experienced at the 37th AVS symposium in Toronto. These included a ceramic turbo-viscous pump by Y Mukarami of Japan, a technique for the prevention of water vapour in load locks by Ohanlon and Shieh and an aluminium/aluminium alloy vaccum system by H Ishamaru.
Eighth International Conference on Secondary Ion Mass Spectrometery Under the auspices of the Royal Netherlands Chemical Society, the Eighth International Conference on Secondary Ion Mass Spectrometry (SIMS VIII) will be held at the RAI Congress Centre, Amsterdam, The Netherlands, from 1 5 - 2 0 September 1991. All interested scientists in university, industrial and government laboratories are invited to attend the SIMS VIII-conference. In line with its predecessors, SIMS VIII is intended to cover a wide range of aspects of secondary ion mass spectrometry ; fundamentals, quantification, new developments, instrumentation, various applications (semiconductors, electronics, polymers, biology, geology and metallurgy) and related techniques. 708
The scientific programme will consist of plenary sessions, parallel sessions, poster sessions and workshops on specific themes. The opening lecture will be held by Prof Dr W Paul, 1 989, Nobel Prize for Physics. Furthermore, a number of invited lectures on a broad range of subjects are scheduled as openings for the different sessions. Further information from : Van Namen & Westerlaken Congress Organization Services PO Box 1 558 6501 BN Nilmegen The Netherlands Tel 31 (0) 80 234471 Fax 31 (0) 80 601159
Advanced vacuum technology processes and equipment and microelectronic components An All-Union scientific-and-technical workshop on the 'Advanced Vacuum Technology Processes and Equipment and Microelectronic Components" sponsored by the Vacuum System & Instrument Engineering division of the USSR Society of Scientists and Engineers was held in the city of Sochi, 2 - 4 October 1 990. There were over 1 60 participants including Soviet scientists and specialists from the major centres of Moscow, Leningrad, Kiev, Novosibirsk, Kharkov, Tashkent and Kazan. The main topics were concerned with the problems of vacuum physics and techniques in experimental physics, microelectronics and optics. The presentations were made at plenary sessions (a total of 1 5 papers) and poster sessions (about 50 papers) in four sections: A. Resonance accelerators for challenging microelectronic technologies; B. Ion-plasma processes and equipment for electronic products; C. Pumping means and vacuum components and D. Involatilized getters and cryogenic pumps. The opening paper of the first plenary session was A A Glazkov's ( M o s c o w ) report on the 'Ultra-High Vacuum News' from 'Experimental Physics' covering the major achievements in high and ultra-high vacuum production in accelerators and superaccelerators. The modern vacuum techniques allowed pressures ranging from 10 7 to 10 ~0 Pa for linear colliders and supercolliders. Thus, vacuum of 10 7 Pa was produced at the Stanford linear collider with a chamber about 3 km long, while the 400 GeV proton super-synchrotron (CERN) required pressure d o w n to 1 0 9 Pa. Involatilized getter-assisted vacuum to 10 7 Pa was achieved for a collider (Switzerland) with an energy to 100 GeV and a chamber 23 km long. Finally, a giant colliding proton-beam super-accelerator (USA) produced a vacuum of 10 9 Pa, with a chamber 83 km long (3 cm dia). Also devoted to the same topic, were presentations on the 'Linear Resonance Ion Accelerator for Process Applications' by V F Tass ( M o s c o w ) and 'An Overview of rf Implanters' by A A Glazkov (Moscow). The poster sessions had a number of contributions such as 'Resonance Systems in Linear Ion Accelerators for Process Applications' (V N Leonov), 'Resonance Accelerators for Microelectronics' (V D Danilov) and 'A Proton Accelerator for Electronic Technology' (A K Pronin). V V Sleptsov ( M o s c o w ) gave a review on the 'Challenging IonPlasma Processes and Equipment for Solid Thin-Film Structures' outlining the main trends in nanomicron technology, with the component size of 0.5 tim and in future d o w n to 0.2 izm. The above included processing with rigorously fixed beams and accelerated neutral beams from active elements (CI, etc.), substituted for ionplasma treatment, stringent requirements for ion etching process with the selectivity of prime importance, diamond-like masks. V I Granjko's 'Requirements for Advanced Electronic Production Equipment and Technology' specifies hazards involved in ion-plasma treatment due to break-down occurrence, for example in capacitors, with the reject possibility to 8 0 - 8 5 % At the same time, high field reliability of the equipment was reported, effected with a back-up of fore-vacuum pumps which made the plant's downtime and failures avoidable by their switching. Emphasis was made on the ecology
Clean pumping--techniques and applications The 'Vacuum Group' of the Institute of Physics held a very successful one-day meeting at their headquarters in Belgrave Square on 31 October 1 990, on the 'Techniques and Applications of Clean Pumping'. There were about 50 participants from universities and industrial and research organizations including two speakers from mainland Europe. The first paper in the 'techniques' section was presented by Dr C Benvenuti w h o spoke about the application of non-evaporable getters in the LEP machine at CERN. He was able to describe a model to fit a theoretical curve of the pumping speeds for different gases and gas mixtures. Dr J Henning, of Balzers High Vacuum, described both the turbomolecular and the molecular drag pumps, culminating with a combination of these t w o pumps to produce pressures of 10 4o mbar. Mr L Laurenson, of Edwards High Vaccum International, stated that clean pumping was possible with some fluids but often they were prohibitively expensive and he made comparisons with the rotary pump and the booster/dry pump combination. Dr W Obert of the JET joint undertaking opened the afternoon session by speaking about the advantages and problems of large scale cryopumping and compared this with turbo and diffusion pumps and he included a number of applications of large scale cryo-pumped systems in JET. Dr J Zhang of Imperial College talked about his 3 / 5 MBE system which demanded pressures less than 1 0 40 mbar, high pumping speeds and the necessity of being hydrocarbon free. They used a combination of sorption and venturi pumps or sorption and diaphragm pumps together with ion pumps and liquid nitrogen panels or closed-cycle cryo pumps. Dr Murrell of UKAEA, Harwell, spoke about an interesting ion pump/closed circuit cryo/turbo combination which resulted in a high speed/fail-safe system which gave pressures of 3x 10 11 mbar. The fourth paper in this section was given by Dr I Owen of VSW w h o described pumping applications in surface science in which he reminded the audience of the problems of cost cutting exercises such as manual or automatic facilities, the need to look at individual items and pitfalls in order to ensure successful design and usage of vacuum equipment. The meeting was concluded by a brief but interesting account of a few highlights, relevant to the meeting, that the Chairman of the Vacuum Group, Dr Austin Chambers, had experienced at the 37th AVS symposium in Toronto. These included a ceramic turbo-viscous pump by Y Mukarami of Japan, a technique for the prevention of water vapour in load locks by Ohanlon and Shieh and an aluminium/aluminium alloy vaccum system by H Ishamaru.
Eighth International Conference on Secondary Ion Mass Spectrometery Under the auspices of the Royal Netherlands Chemical Society, the Eighth International Conference on Secondary Ion Mass Spectrometry (SIMS VIII) will be held at the RAI Congress Centre, Amsterdam, The Netherlands, from 1 5 - 2 0 September 1991. All interested scientists in university, industrial and government laboratories are invited to attend the SIMS VIII-conference. In line with its predecessors, SIMS VIII is intended to cover a wide range of aspects of secondary ion mass spectrometry ; fundamentals, quantification, new developments, instrumentation, various applications (semiconductors, electronics, polymers, biology, geology and metallurgy) and related techniques. 708
The scientific programme will consist of plenary sessions, parallel sessions, poster sessions and workshops on specific themes. The opening lecture will be held by Prof Dr W Paul, 1 989, Nobel Prize for Physics. Furthermore, a number of invited lectures on a broad range of subjects are scheduled as openings for the different sessions. Further information from : Van Namen & Westerlaken Congress Organization Services PO Box 1 558 6501 BN Nilmegen The Netherlands Tel 31 (0) 80 234471 Fax 31 (0) 80 601159
Advanced vacuum technology processes and equipment and microelectronic components An All-Union scientific-and-technical workshop on the 'Advanced Vacuum Technology Processes and Equipment and Microelectronic Components" sponsored by the Vacuum System & Instrument Engineering division of the USSR Society of Scientists and Engineers was held in the city of Sochi, 2 - 4 October 1 990. There were over 1 60 participants including Soviet scientists and specialists from the major centres of Moscow, Leningrad, Kiev, Novosibirsk, Kharkov, Tashkent and Kazan. The main topics were concerned with the problems of vacuum physics and techniques in experimental physics, microelectronics and optics. The presentations were made at plenary sessions (a total of 1 5 papers) and poster sessions (about 50 papers) in four sections: A. Resonance accelerators for challenging microelectronic technologies; B. Ion-plasma processes and equipment for electronic products; C. Pumping means and vacuum components and D. Involatilized getters and cryogenic pumps. The opening paper of the first plenary session was A A Glazkov's ( M o s c o w ) report on the 'Ultra-High Vacuum News' from 'Experimental Physics' covering the major achievements in high and ultra-high vacuum production in accelerators and superaccelerators. The modern vacuum techniques allowed pressures ranging from 10 7 to 10 ~0 Pa for linear colliders and supercolliders. Thus, vacuum of 10 7 Pa was produced at the Stanford linear collider with a chamber about 3 km long, while the 400 GeV proton super-synchrotron (CERN) required pressure d o w n to 1 0 9 Pa. Involatilized getter-assisted vacuum to 10 7 Pa was achieved for a collider (Switzerland) with an energy to 100 GeV and a chamber 23 km long. Finally, a giant colliding proton-beam super-accelerator (USA) produced a vacuum of 10 9 Pa, with a chamber 83 km long (3 cm dia). Also devoted to the same topic, were presentations on the 'Linear Resonance Ion Accelerator for Process Applications' by V F Tass ( M o s c o w ) and 'An Overview of rf Implanters' by A A Glazkov (Moscow). The poster sessions had a number of contributions such as 'Resonance Systems in Linear Ion Accelerators for Process Applications' (V N Leonov), 'Resonance Accelerators for Microelectronics' (V D Danilov) and 'A Proton Accelerator for Electronic Technology' (A K Pronin). V V Sleptsov ( M o s c o w ) gave a review on the 'Challenging IonPlasma Processes and Equipment for Solid Thin-Film Structures' outlining the main trends in nanomicron technology, with the component size of 0.5 tim and in future d o w n to 0.2 izm. The above included processing with rigorously fixed beams and accelerated neutral beams from active elements (CI, etc.), substituted for ionplasma treatment, stringent requirements for ion etching process with the selectivity of prime importance, diamond-like masks. V I Granjko's 'Requirements for Advanced Electronic Production Equipment and Technology' specifies hazards involved in ion-plasma treatment due to break-down occurrence, for example in capacitors, with the reject possibility to 8 0 - 8 5 % At the same time, high field reliability of the equipment was reported, effected with a back-up of fore-vacuum pumps which made the plant's downtime and failures avoidable by their switching. Emphasis was made on the ecology