Solid State Ionics 16 (1985) 141-146 North-HollandPublishingCompany
141
SURFACE CHARGES AT THE INTERFACE OXYDIC SEMICONDUCTOR / ELECTROLYTE SOLUTION
H.N.
STEIN
Laboratory of Collo’id Chemistry, Eindhoven Box 513, 5600 MB Eindhoven, The Netherlands
Different in donor chemical solutions.
pretreatments concentrations, properties of
University
of
Technology,
of
ZnO or TiO2 leading to significant do no cause distinct differences in suspensions of these solids in aqueous
However, 1.
INTRODUCTION The present
ing
the
lid
state
tors
parameters
of
aqueous
aims
whether
question,
influence
ties
differences the colloid electrolyte
the
use
semiconducting
investigation
at
answer-
for
the
in
the
the
question
changes
of
oxidic
the
colloid
dispersions
of
so-
semiconduc-
chemical these
propersolids
results for
oxides
when
whether
obtained
data
isolating,
changes
influence
with
interpreting
in
colloid
raises
solid
state
chemical
pheno-
mena.
in
In TiO,
solutions.
of
oxides
same
character
P.O.
the
present
were
used
investigation,
as
solids.
ZnO
Their
and
solid
sta-
L
This a.
question
Dispersions
a.0.
in
is
currence
e.g.
be
found
In
to
lids
on such
With
the
pretreatment
dispersions as
oxides
rence
of
that
over
interface.
in the This
semiconducting
flatband
dope
behaviour
these
oxides low
/
been
model
so-
oxides,
latices.
one
meets
the
conductivity the
can
of
measurement
potential
be
as a shift
were
changed
or reducing
diffe-
EXPERIMENTAL
2 m
ZnO: -1 g
ex Merck It
*
a continuous OC
for
stream
4 are
p.a.,
was
BET surface
pretreated
stream hrs;
of
oxygen
samples
indicated
(1
in
atm)
at
in
an
cooled
by
3.66
450
O2 Treatment
ZnO/02.
are
indicated
by
as
determined
by
Interstitial
Norman’s 23 * 10 75
ppm
in
ZnO/H
2’ upon
g = 1.965
interstitial TiO
2
4
per *
ESR indicates cooling and
in
at
Zn a
to in
in
a
pronounced
6 ppm (= ZnO/02,
atoms
per
significant
H of 2’ g = 2.003,
Zn and O-,
:
m3)
1o24
cooling
avoid
, amounted
atoms (=
to
Zn, 1)
method Zn
to
at
0 167-2738/85/$03.30 0 Elsevier Science Publishers B.V. (North-Holland Physics Publishing Division)
area heating
ZnO/H2.
measured the
by
H was restricted 2 H stream in order to 2 sintering; such samples
crease
in
heating
materials
solution
potential.
by
atmospheres.
with has
electrolyte
parameter
of
solids.
research
2.
the
concen-
characteristics
in oxidizing
could
might
flow
overall
oxide
oc-
t-educing
prevents the
such
If
polystyrene
the
frequently
changes
or
of the
oxides
containing
AgI
used
under
the of
te
a possibility
chemistry,
dispersions
difficulty,
for
changing
or pastes
by
coagulation. of
affect
colloid
focused
of
conditions,
suspensions b.
of
by
oxidizing
behaviour
properties by
are
profoundly
absence
influenced
significance:
solids
The flow
chemical
tration,
oxidic
influenced
or
colloid be
of
ceramics.
systems
or
has a two-fold
the
3
and m3i in-
signals
ascribed 2) respectively .
to
H.N. Stein / Surface
142
a.
ex Merck
b.
ex
The
(referred
with
pretreated
water
(72
ting.
Pretreatment
tions
leading
heating
for
stream
of
to
at
by
30
passing
oxidizing
at
600
minutes
in
of
heating
finally
by a broad TiO /H 2 2’ absent in TiO /O 2 2’
signal
3.
in
the
f i rmed
The
= 486
of
time.
tion
experiment,
pre-
02;
leading for
0
15
a.
of
the
suspension.
700 rpm,
nm) was
light
followed
Directly the
extinc-
as
before
the
ZnO was
a funccoagula--
dispersed
by
treatment;
19%
12 ( E )_O EO with E = extinction, for
at
and
600
Ti3+
“C
con-
ions
at
g
in
=
the
1.96
TiO
suspension
zz
440
at
measure
a
was
light
extinction
measured
The
(E2).
a measure
giving com4) 7). employed . in
treatment
ultrasonic later
as
method
rest,
was
nm)
taken
rate. simpler
2’ a data only
parative a
was
coagulation
For
as
CEO)
ratio
of
directly and
E /E 2 0 stability
the
th after
two
hours
was
taken of
the
suspension.
consisted
is
adsorbed
fast
(H+
or
following for
expressed In
as
those
cess
employed.
b.
Electrophoresis.
As
radius
particle of
from
the the
poten-
vs.
at
va-
the
pH
of
Hf
amount surface
a slow to
shows
for
Zeta the
time
potentials
0,4-
we took
BET surface
area
as for
kinetics
for ZnO in a stirred 3, 5) (diameter 15
were
cylindrical mm) containing
charge in
( ao) 10 -2
n
X 0
pro=
X 0
X& V
O-
x9
-0 Z-
0
-PH 10
xi@”
xx
method the
particles
ZnO/H2
T~H--H+I (PM&)
0. .2-
a
mobili-
Wiersema-Loeb-Overbeek radius
2
surface and
KC1 solutions.
were
electrophoretic
primary
the
ZnO/O
charge where
by
1
pH
of
average calcula-
-0 .4-
@ X
spherical
particles. Coagulation
RESULTS
8
from the
4.
amount
cases
were
by
OH-1 the
net
adsorption was followed 4) values extrapolated ,
calculated
of
maintaining
The
value.
C.mw2).
too,
adsorption
ions by
present
in short,
Fig. the
KOH necessary
a
are described - 7) In
: of
pH values,
HCl or at
of
determining
rious
3)
elsewhere
Measurement
tial
c.
speed
ultrasonic
followed
ESR data
of
employed
methods detail
they
ted
(h
tion
of
in 10 ml of
METHODS
more
ties 8) .
of
H2 during stream.
cooling
tion
hea-
2’ a N2 stream,
a H 2 presence
and
in
heating
in
extracby
condi-
conditions,
a stream
stirrer, a stirrer
solutiotz
a continuous
cooling
reducing
tic
consisted
“C in
semiconductor/electrol_~te
At
Soxhlet
under
and
‘C
as
followed
consisted
600
by
by
Ti02/H2,
20 hrs
Ti02/H2,
hrs.
to
oxydic
DP ‘25).
as M808);
hrs),
to
O2’ under
treatment
to
(referred
p.a.
was
TiO2
tion
p.a.
Degussa
charges at the interface
investigated
- 0.6 I
vessel a magne-
Surface ZnO/H2
Fig. 1. charge vs. pH for ( 0 ) in 10e2 M KCl.
Zn0/02
(
X )
and
143
H.N. Stein / Surface charges at the interface oxydic semiconductor/electrolyte solution
Differences
in
noticeable
differences
neither
the
point
slope
the
pretreatment
do
in
of
lead
surface
zero
(pzc)
signifi-
changed
2
Fig.
shows
to
foreign ding the
impurities cations
to
lues
are
of
ditions.
The
towards
lower
pzc
in
sorption shift
is
cing
the in
is
pH = 8.6
is
re-
notably
to
ZnO,
ZnO lea-
solution
towards
addition change
(when
the
peak
va-
the of is
the
coagulation
zeta
potential
ment
(fig.
chloride
not
affected
were made about the -2 H KC1 solutions): 10
(in rate
is
determined
irrespective
of
by
the
the
pretreat-
3).
tl
the
cations
rate
the
!
dE/dt E2 0
0.24
first
effected
by
ZnO under reducing con-3 M KC1 is shifted 10
pH values when compared with -2 indicating chemiM KCl, 10
of
not
10
portions,
on no
pxc
the
-3
in
from
these
two
conditions;
reducing tion
of in
Again,
pretreatment
the
of
observed
portion).
the
in
saturation
added
near
desorbed
hydroxides
ZnO is
results
The peak
KC1 solution. lated
similar
observations
coagulation
nor
cantly.
Similar
to
charge:
charge
is
doO/dpH
not
ions. by
this
pretreatment
thus,
noticeably
But
Cl-
influenced
under
chemisorpby
OL
pzc
redu-
pretreatment.
the
Hamaker
constant
between
particles
attraction YoH-H+) Q.LM~-* I
-30
-40
Fig. 3. The initial coagulation rate as a function of the zeta potential in 10e2 H KCl, for ZnOI02 ( 0 1 and for ZnO/Hg ( X ).
Thus, 0.6 I
-20
-10
‘)
is
gree
not by
influenced
changes
in
to
the
describing in a
the
suspension
noticeable
pretreatment
de-
procedu-
re. For
an
found:
for
of
at
ao
tive
sorption Fig. 2. pH for charge vs. ( 0 ) in 10M3 H KCl.
ZnO/O2
(
X )
and
is
found
for
or
shift
more
(fig.
posicomzeta
5);
thus
a reducing
behind
plane,
counterions
is
TiO /H as 2 2 4). The
by
compensated
slipping
circum-
systematic
towards
effected
are
of
a
pH,
some
pretreatment
TiO /O (fig. 2 2 not influenced
differences
trokinetic
under of
H808,
given
is
treatment
Surface ZnO/H2
Ti02 a
with
potential
ions.
influence
values
pared
all
however,
Ti02,
stances
by
the
preelec-
additional
desorption
adof
co-
144
H.N.Stein
/ Surface
charges at the interface
oxydic
semiconductor~ele~trol~te
sol~ltio~
~PH 0
1 -
-_--.il
1
5
6
7
8
10
9
I
I -20 1
I -40
t I
-6O}
I
-80t I Zeta and (TiO2
-
inspection,
reduction
towards
pears
not
to
self:
for
From during
more
of
analysis
ions
Soxhlet
while TiO 2
ions
DP
are
results wards
is
of
)
u
values the
25.
and
reduction,
and
if
these
they
the
more positive
was
on
will
promote OH-
observed values.
/
it-
H+
strongly adsorp-
adsorption. shift
Wc.nr;?
t
-04t
o i-
4
sulfide
are
of
*la% .
that 2SO 4 found
by
contamination
0 1 KN03
on
0
obtained
appeared
If
counteract in
wash-water it
( N
ap-
TiO2
contaminated
such
formed
and
the
extraction,
no
chemisorbed, tion
of
TiO2/02 10-2
O HI --20
shift
positive
a property
0
TiO
I4808
TiO2
in
be
the
(
DP 25, practically identi2 relationsships (5 are found (pH) 0 Ti02/02 and TiO2/H2 (fig. 6).
with
(
Fig. 5. pH for X ) in
’ 02
Fig. 4. charge vs. pH for TiO/Op ( X ) in 1O-2 E4 KN03
closer
cal
vs.
o.zt
Surface TiO2/H2
On
potential Ti02/H2 : N 808).
Surf ace charge and TiO2/H2 (TiO2: DP 25).
Fig. pH
vs.
(
o
)
6 for in
Ti;2/02 3
(
)
l
solutions
This u
0
toAlternatively contamination 2+ Fe or Fe will
one in
could TiO
2 be formed.
think
of
M808;
on
Fe
3+
as
reduction
a
H.N. Stein / Surface charges at the interface oxydic semiconductor/electrolyte
desorption
stronger 2+ Fe could A
explain
no iron
ever, water
be
Atomic
by
(detection The
the
could
limit
2 * IO-’
of
the
summarized
fig.
no difference Ti02/H2
the
DP
25
the
how-
should
wash
sion
and
the
dispersions
are
staare
by local
to
of
groups
E2&
0.3
IEP_,
I
6
10
8
is
Stability Ti02 : Ti02/H2.
of
DP
the
vs. (
pH 0 1
tained
in
that ned
the
their
the
present
colloid
(surface
donor The
value,
charge,
net
slipping are
rather
the
investigation
chemical
electrokinetic constant)
face
data
indicate
parameters charge plane
insensitive
ob-
3)
in
result
elusion
holds
during
cooling
surface
layer
after is
reoxidized
be the
of
have,
at
coagulation
to
cause
rates.
given rates
that
an
a factor the a
10
Hamaker distinct
A similar
(Fig.
2
a
conclusion,
of
the
result,
con-
7).
Hamaker
towards
the
6.
CONCLUSIONS Pretreatment
cannot
from
the
concentration. possibility
between
parts
Zn by
enough
no layer
additively
a change
coagulation
OH
constant, surface
experimental
the
TiO
0.4
attraction up
ZnO/H 2
for
+
OH nmm2).
various
the
in
difference
(8.3
any
interstitial
large in
+
similar
increase
change
9.3
the
to
does
not
:
Hamaker
the
and
leads
excluded,
that
reduction, by a contaminant
a
res,
although
trations does
in not
lead
.
Ti02/H2
of
concer-
behind and
by
2 potential,
de10)
+
+ 0.2
made
Thus
constant
DISCUSSION
at
is
ZnO/O
was
5 .l
distinct
the
because
particles.
This analysis
:
no
of
particles
that
the
: Ti02/02
ZnO/O 2
influence
expected,
(fig.
Taken
case
area.
nm2;
however,
contributions
Pig. 7. dispersions Ti02 25. ( X ) TiO2702;
is,
between
nm2.
and ZnO/H2 (8.5
zeta
5.
per
between
significant
two
reoxi-
cooling
hydrogen were
per
ZnO.
In
4
surface
found
found
nme2)
pH
interface.
superficial during
active
OH groups
For
the
parameters
predominantly
difference
unit
OH groups
was
0.
near
elec-
TiO 10 and TiO /H was 2 2 2 2 to the number of hydroxyl
by
values
0.8
these
the
regard
per
termined
surface
plane:
against
of
conclu-
the
behind
Ti02/H2
with
the
to
charge
significant
surfaces found
draw
determined
conditions
a
The
be
indication
that
to
This
H20).
regard
slipping
expected
dation
/ O2 and
found.
with net
145
(e.g.,
cautious
the
trokinetic to
employed
make us
An Ti02
H2
mentioned
charge
Spectroscopy
regard
in
7.:
between
is
in
of
mol/l) .
with
Ti02
in
than
shift;
UC
detected
Adsorption
observations
bility
Pe3+
of
solution
with
H 2
at
increasing ZnO to
and
high
the TiO
changes
2
temperatu-
donor
concen-
significantly, in
the
colloid
H.N. Stein 1 Surface
146 chemical charge,
plane,
investigated:
parameters chemisorption
charge
behind
charges at the interface
the
of
surface
4)
net
counterions,
electrokinetic
o.xydic serllicondlr~torlelectrol~.te
Electrolyte
5)
“The
Janssen,
Thesis,
slipping
and Hamaker constant.
M.J.G.
6)
Logtenberg
1)
V.J.
Norman,
Analyst
2)
R.D.
Iyengar
and N. Codell,
Adv.Coll.Int.Sci. E.H.P. the loid Ph.D.
3,
Logtenberg,
Solid
State
Chemical Thesis,
89,
261
365
Relation
Properties
Eindhoven
and of
1983.
Zinc
Ph.D.
and H.N.
Stein,
print)
and H.N.
Stein,
J.Coll.Int.Sci.
Janssen
P.H.
and
H.N.
9)
Col-
Oxide”, 10)
P.C.
A.L.
Wiersema,
Overbeek, Between the
/
Stein,
to
be
published. 8)
(1972).
“The
Behaviour
(1964).
M.J.G.
to
Interface”,
(in
Logtenberg
submitted 7)
3)
E.H.P.
Dioxide
1984.
J.Coll.Int.Sci.
REFERENCES
Titanium
Solution Eindhoven
E.H.P.
solutim
J.Coll.Int.Sci.
Hiemenz,
Chemistry,
1977,
412.
T.
Morimoto
Soc.Japan
46,
22,
Principles
Surf ace p.
Loeb
of
Marcel
and
H.
2000
(1973).
Naono,
and
J.Th.G.
78 (1966). Colloid Dekker
and Inc.
Bull.Chem.