III–V compound semiconductors prepared by multisource thermal evaporation techniques

III–V compound semiconductors prepared by multisource thermal evaporation techniques

Abstracts of the papers presented at the Thirteenth National 12 in practice) and a very weak function of the sweep rate. Using a knowledge of the ...

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Abstracts

of the papers presented

at the Thirteenth

National

12 in practice) and a very weak function of the sweep rate. Using a knowledge of the desorption kinetics, a spectrometer of arbitrarily slow sweep rate, and hence arbitrarily high resolving power, has been simulated on a digital computer. Resolving power can be increased to the point where magnification of noise in the data becomes intolerable. Increases by a factor of two or more are evident in examples presented. B A Wightman, Radio and Electrical Engineerirzg Division, National Research

Council, Ottawa,

Ontario.

Canada.

The resolving power of the monopole mass spectrometer The monopole, in contrast to the quadrupole mass filter, is an instrument whose performance at high resolving power depends importantly on entrance and exit aperture dimensions. Yet none of the theoretical expressions developed to predict resolving power includes these aperture dimensions as basic instrument parameters. In addition, aberrations caused by energy and angular spread in the ion beam must be explicitly accounted for if accurate estimates of performance are to be made. An analysis of the factors entering into monopole resolving power is made with respect to the recently proposed mode of operation wherein an integral number of rf cycles occurs during passage of an ion through the analyzer. A simple closed expression is developed for resolving power, and in application predicts values intermediate between the expression of von Zahn and the estimate of Lever. Stanley S Grossel, Veeco Instruments, Terminal Drive, Plainview, New

York 11803.

Improved qnadrnpole mass filter The transmission of ions through a conventional quadrupole mass filter is severely attenuated by the impulses which the ions receive as they traverse the fringing field. A computer study has been made to evaluate this phenomenon. Serious losses are indicated. The computer was also used to explore the effectiveness of a proposed scheme for eliminating these undesired radially directed impulses. The results were encouraging, and an experimental apparatus was built to evaluate the scheme in the laboratory. Preliminary results indicate that, at the higher resolving powers, the transmission of ions through the quadrupole is increased by factors of ten to one hundred without loss of resolving power. Wilson M Brubaker. Bell & Howell Research Center. 360 Sierra Madre

Villa, Pasadena,

California.

The behaviour of background hydrogen below 1O-10 torr A I-litre ultrahigh vacuum system with many valves, and with an envelope of aluminosilicate glass and stainless steel, has been tested. Gauges were (a) modulated Bayard-Alpert, (b) modulated suppressor, and (c) 90” mass spectrometer, all having hot filaments. The residual pressure was dominated by hydrogen, and this background hydrogen has been studied. The main findings have been: (1) Theory postulating a fixed source and pumping rate was not applicable. (2) Local pressures of hydrogen appeared in each gauge, making uncertain the assignment of a unique pressure to the whole system. A single gauge has measured a total pressure of 6 x lo-i3 torr. (3) The equilibrium ratio of masses 1 to 2 varied between 5 and 0.2 under various conditions of system processing. (4) A hypothesis that the primary source of hydrogen was atomic hydrogen coming out of solution in the filaments and recombining on nearby electrodes to yield molecular hydrogen, described most of the observations made. J P Hobson and J W Karnsbaw, Radio and Electrical Engineering Division.

National

Research

Council,

Ottawa

7, Ontario,

Canada.

Partial pressure analyses in the presence of a cold surface at a temperature variable between 3°K and 77°K The mouth of an omegatron tube is directed towards the cold surface SO that all gas molecules entering the gauge head have their starting point at the cold surface. The device is fitted in an ultrahigh vacuum system with a container having a volume of 250 litres. It provides (a) information about the potential sources of residual gases (b) a considerable increase of sensitivity as compared with static methods of mass spectroscopy, due to the accumulation of gases at a low temperature and subsequent re-evaporation. W Bachler, H Hoch and H G Niiller, E Leybold’s Nachfolger, 5 K&zBayenthal, 166

Bonner Str 504, Germany.

Vacuum Symposium

Thin-film

techniques

III-V Compound semiconductors prepared by multisource thermal evaporation techniques A wide variety of semiconductor films has been prepared with principal emphasis on InSb, InAs, GaAs and GaSb. One of the principal advantages of the method is that it allows mixtures of these materials to be formed in a rapid and convenient manner and specimens composed of InAs,Sb,., and GaAs,Sb,_, and Ga,In,_,Sb have been prepared. These systems appeared to be miscible m all proportions as indicated by their x-ray diffraction patterns. The use of optical techniques to study the dispersion and absorption in films of these materials indicates that optical properties behave similarly to those of the bulk materials. However, thoseabsorption processes which are determined by excess carrier scattering can become much larger than in the bulk. Roy F Potter, Infrared Division, US Naval Ordnance Laboratory, Corona,

California.

Film deposition by exploding wires The use of the exploding wire phenomena as a source of vapor for depositing thin films in vacuum is discussed. A capacitor discharge system capable of delivering 1500 J of energy at 15 kV with a rise time of 5 ,tsec for generating exploded wire films is described. Gross distribution of the deposited material and the microstructure of the resulting films are discussed in terms of the deposition variables: (1) residual gas pressure, (2) energy input, (3) wire material, (4) wire size and length, and (5) source to substrate distance. It is found possible to obtain films with a reasonably uniform thickness when using materials such as aluminium which are easily vaporized. The films formed in this manner have a very fine grained structure and exhibit nucleation and growth stages similar to those reported for vacuum evaporation. D M Mattox, A W Mullendore and F N Rebarchik, Sandia Corporation, PO Box 5800, Albuquerque,

New Mexico

87115.

Ion-beam deposition of metal films By using both the ion-beam deposition technique and the electronbeam scanning method, the maskless deposition process is possible. The process is as follows: the ion-beam is controlled such that it passes just above the substrate to collector and the substrate is scanned by the electron beam. The thin films are deposited on the substrate with the negatively charged pattern which is written by electron beam scanning. Structures and electrical properties of the ion-beam deposited metal films are reported. Susumu Namba, Pil Hyon Kim and Norio Kanekama, D’zeInstitute of Physical

and Chemical

Research,

Bunkyo-ka,

Tokyo, Japan.

Thin films of metals and inorganic compounds vacuum deposited by high energy laser A laser beam capable of energy outputs up to 500 J was directed through a glass window into a vacuum system, so that it could impinge onto fine grain powder of Cr, W, Ti, C, Sb,S,, ZnS, SrTiO,, BaTiO, and others. Special vacuum treatment was necessary to avoid splashing. The laser, a neodymium doped glass laser, of 1.06 /,rn wavelength was mostly used without Q-spoiling. Pulse burst duration was 2 to 4 msec, energy outputs 80 to 150 J. Deposition rates up to 100,000 A/set were obtained. The substrate was positioned between vapor source and laser, so that the laser beam passed through it. Electron micrographs and diffraction patterns showed that under certain conditions films were obtained without changing the original chemical composition of the source materials. Helmut Schwarz and H A Tourtellotte, Rensselaer Polytechnic Institute, 06028.

Harrford

Graduate

Center,

East

Windsor

Hill,

Connecticut

New vacuum-evaporated cermet resistor and insulator mixtures In the investigation of possible resistive materials for application as thin-film integrated-circuit components, new useful cermet mixturecompounds were discovered. These mixtures can be co-evaporated from the same crucible, eliminating the necessity of using simultaneous evaporation from two sources with all the attendant problems of dual monitoring and control. A simple relationship has been found between crucible soaking temperature and film composition control. Compounds are formed by in situ reactions of the mixture constituents. A simple mixture of germanium and chromium,