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Ion beam assisted film growth
Nuclear Instruments and Methods in Physics Research B42 (1989) 401-404 North-Holland, Amsterdam
401
BOOK REVIEWS
This section of NIM B wil1 bring reviews of books relevant for the regular readership of the journal. Books for review should be sent to one of the Editors.
ION BEAM ASSISTED FILM GROWTH Vol. 3: Beam Modification of Materials Series edited by Tadatsugu Itoh (Elsevier, Amsterdam, 1989) pp. xviii + 440, $147.25/Dfl. 28~.~, ISBN ~-~8728~9 Level: Specialist Reviewer: J.Y. Tsao, Samba National Laboratories, Albuquerque Because of the immense technological importance of thin films and coatings, new methods for depositing them in a controlled manner have become a near-obsession with materials scientists all over the world. These new methods range from refinements of those already in mainstream use, such as chemical vapor deposition, to those so exotic as to be many years away from practical use. One broad class of new methods, which might be loosely characterized as being somewhere between the middle and the exotic end of the spectrum, involves, in one way or another, ion bombardment of surfaces. Among the already demonstrated beneficial effects of such ion bombardment during film growth are improved film adhesion and improved epitaxy. This volume provides an up-to-date review of these methods of film growth. new “ion-beam-assisted” Among the methods reviewed are Sputter Deposition of Compound Semiconductors (R.H. Comely and T. Taguchi/A. Hiraki), Partially Ionized Molecular Beam Epitaxy (T. Itoh/H. Takai), Ionized Cluster Beam Deposition (T. TakagifI. Yamada), Direct Ion Beam Deposition (K. MiyakefT. Tokuyama, S. Gonda and Y. Makita/S. Shimizu) and Ion Implantation Synthesis of Films (I.H. Wilson/P.L.H. Hemment/K.G. Stephens). The chapter by Y. Makita/S. Shimizu, in particular, is a thoughtful review of direct ion beam deposition; it includes much useful info~ation about ery?erimental design not normally found in original research articles. In most of the above chapters, however, forefront research results are stressed. Accordingly, the volume will be most appropriate to the expert who wishes to know detailed results, rather than to the amateur or student who wishes a simple, coherent ~tr~uction to
0168-5&3X/89/$03.50 0 Elsevier Science Publishers B.V. worth-Homed Physics Publishing Division)
the field. As an illustration, the chapters are filled with figures directly reproduced from original research journals (and which make specific points about specific systems), rather than with figures which have been carefully selected and/or condensed to illustrate more general pedagogical points. The expert will be interested in the detail; the amateur or student may be overwhelmed. Furthermore, much of the research presented in the above chapters is original to the authors of the chapters themselves. As often happens, the result is that the chapters are not particularly balanced, in the sense of presenting both the good and bad of the various methods. Again, this will be acceptable for the expert, who will want to form his/her own opinion; but may cause some difficulty for the amateur or student, who is not yet able to form an opinion. The volume also contains a few more general, “fundamental” chapters on Sputtering Yields (Y. Yamamura/N. Itoh), Low-Energy Ion/Surface Interactions (J.E. Greene/S.A. Barnett/J.-E. Sundgren/A. Rockett) and Ion Beam Mixing (B.M. Paine/B.X. Liu). These chapters were written more pedagogically, and can be read with profit by amateurs and students. They also serve to lend important balance to the detail of the rest of the book. The chapter by J.E. Greene/S.A. Barnett/J.-E. Sundgren/A. Rocket& for example, is a well-written, general review of experimental results on the influence of ions on film nucleation, growth, and phase stability. Most importantly, it discusses both what is known as well as what is not known about the subject. The chapter by B.M. Paine/B-X. Liu is also well-written, and strikes a nice balance between theoretical and experimental studies of ion-beam mixing. Overall, the volume is a comprehensive review of the current state-of-the-art in ion-beam assisted film growth. The individual chapters are rich with information, but are generally not “tutorial” reviews; the volume therefore seems best suited to experts in closely related fields.
401
BOOK REVIEWS
This section of NIM B wil1 bring reviews of books relevant for the regular readership of the journal. Books for review should be sent to one of the Editors.
ION BEAM ASSISTED FILM GROWTH Vol. 3: Beam Modification of Materials Series edited by Tadatsugu Itoh (Elsevier, Amsterdam, 1989) pp. xviii + 440, $147.25/Dfl. 28~.~, ISBN ~-~8728~9 Level: Specialist Reviewer: J.Y. Tsao, Samba National Laboratories, Albuquerque Because of the immense technological importance of thin films and coatings, new methods for depositing them in a controlled manner have become a near-obsession with materials scientists all over the world. These new methods range from refinements of those already in mainstream use, such as chemical vapor deposition, to those so exotic as to be many years away from practical use. One broad class of new methods, which might be loosely characterized as being somewhere between the middle and the exotic end of the spectrum, involves, in one way or another, ion bombardment of surfaces. Among the already demonstrated beneficial effects of such ion bombardment during film growth are improved film adhesion and improved epitaxy. This volume provides an up-to-date review of these methods of film growth. new “ion-beam-assisted” Among the methods reviewed are Sputter Deposition of Compound Semiconductors (R.H. Comely and T. Taguchi/A. Hiraki), Partially Ionized Molecular Beam Epitaxy (T. Itoh/H. Takai), Ionized Cluster Beam Deposition (T. TakagifI. Yamada), Direct Ion Beam Deposition (K. MiyakefT. Tokuyama, S. Gonda and Y. Makita/S. Shimizu) and Ion Implantation Synthesis of Films (I.H. Wilson/P.L.H. Hemment/K.G. Stephens). The chapter by Y. Makita/S. Shimizu, in particular, is a thoughtful review of direct ion beam deposition; it includes much useful info~ation about ery?erimental design not normally found in original research articles. In most of the above chapters, however, forefront research results are stressed. Accordingly, the volume will be most appropriate to the expert who wishes to know detailed results, rather than to the amateur or student who wishes a simple, coherent ~tr~uction to
0168-5&3X/89/$03.50 0 Elsevier Science Publishers B.V. worth-Homed Physics Publishing Division)
the field. As an illustration, the chapters are filled with figures directly reproduced from original research journals (and which make specific points about specific systems), rather than with figures which have been carefully selected and/or condensed to illustrate more general pedagogical points. The expert will be interested in the detail; the amateur or student may be overwhelmed. Furthermore, much of the research presented in the above chapters is original to the authors of the chapters themselves. As often happens, the result is that the chapters are not particularly balanced, in the sense of presenting both the good and bad of the various methods. Again, this will be acceptable for the expert, who will want to form his/her own opinion; but may cause some difficulty for the amateur or student, who is not yet able to form an opinion. The volume also contains a few more general, “fundamental” chapters on Sputtering Yields (Y. Yamamura/N. Itoh), Low-Energy Ion/Surface Interactions (J.E. Greene/S.A. Barnett/J.-E. Sundgren/A. Rockett) and Ion Beam Mixing (B.M. Paine/B.X. Liu). These chapters were written more pedagogically, and can be read with profit by amateurs and students. They also serve to lend important balance to the detail of the rest of the book. The chapter by J.E. Greene/S.A. Barnett/J.-E. Sundgren/A. Rocket& for example, is a well-written, general review of experimental results on the influence of ions on film nucleation, growth, and phase stability. Most importantly, it discusses both what is known as well as what is not known about the subject. The chapter by B.M. Paine/B-X. Liu is also well-written, and strikes a nice balance between theoretical and experimental studies of ion-beam mixing. Overall, the volume is a comprehensive review of the current state-of-the-art in ion-beam assisted film growth. The individual chapters are rich with information, but are generally not “tutorial” reviews; the volume therefore seems best suited to experts in closely related fields.