The structure and sintering of polycrystalline evaporated metal films

The structure and sintering of polycrystalline evaporated metal films

168 ABSTRACTS ON M I C R O E L E C T R O N I C S AND R E L I A B I L I T Y A thin-film facility for electrical engineering research. M. R. BOUDRY,Pr...

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168

ABSTRACTS ON M I C R O E L E C T R O N I C S AND R E L I A B I L I T Y

A thin-film facility for electrical engineering research. M. R. BOUDRY,Proc. Instn Radio Engrs Aust., April (1967), p. 99. A summary is given of the types of thin films of interest in electrical engineering research. The desirable film properties for various applications, and control of deposition variables to maintain reproducible film properties are discussed. The thin-film facility established in the Department of Electrical Engineering at the University of Melbourne, and the current thin-film research programme are described in outline.

Measurement o f film thickness. R. D. CAMPBELL,Proc. Instn Radio Engrs Aust., April (1967), p. 102. The accuracy of the thickness measurement of many thin films is limited by the uniformity of the film. A brief review of techniques used for film thickness measurements is given. The use of Fringes of Equal Chromatic Order, viewed in reflection, for film thickness measurements is discussed. The difficulties associated with this technique may be reduced to correcting for phase changes on reflection. To a good approximation, the phase change on reflection may be assumed linear in ~.. Previously reported graphical methods, which account for the phase changes on reflection, are extended for computer calculation to give a more accurate determination of film thickness. The error associated with the experimental measurements and the subsequent calculation of the film thickness may be evaluated and compared with the estimate of the non-uniformity of the film. For the thickness measurements made on amorphous carbon and selenium films, the estimate of the non-uniformity has been the limiting factor in the accuracy of the thickness measurements. The study of surface properties of thin Ge films using a piezoelectric mass detector. R. J. MACDONALD,P)'oc. Instn Radio Engrs ,dust., April (1967), p. 104. Adsorption studies on thin germanium films using a piezoelectric mass detector are described. The results obtained for the adsorption of atomic and molecular hydrogen agree with those of other workers. Oxygen adsorption has been studied also and the variation of the sticking coefficient of oxygen on germanium in the fast uptake region to one monolayer coverage has been determined. Measurement of the microwave properties of substrate-supported semiconducting films. D. W. GRIFFIN,Proc. Instn Radio Engrs .dust., April (1967), p. 121. The problem of measuring micro= wave properties of substrate-supported semiconducting films is discussed, particular attention being given to the requirement for methods that cover large ranges of resistivity, carrier mobility and specimen thickness and take account of the substrate. Single mode and bimodal methods are examined from this viewpoint and a procedure is devised, for relating measurable quantities to microscopic parameters, that is applicable to most of these methods. Examples of the application of this procedure are given and confirmatory results presented. Deposition o f ferrite films by sputtering in a glow discbCrge. W. D. WESTWOOD and A. G. SADLV~, Proc. Instn Radio Engrs .dust., April (1967), p. 127. Thin films of spinel-type ferrites have been prepared by d.c. sputtering a ferrite cathode in a glow discharge system. Results are presented to show that the films deposited have the same composition as the cathode for a wide variation in the conditions in the glow discharge. Since this is quite different from the results obtained when sputtering alloys, it is necessary to propose a somewhat different sputtering mechanism.

The structure and sintering o f polycrystalline e v a p o r a t e d m e t a l films. J. R. ANDERSON and B. H. McCoNKEY, Proc. Instn Radio EnRrs Aust., April (1967), p. 132. This paper describes work on the sintering of evaporated films of nickel and molybdenum. T o this end, the effect of temperature on surface area and electrical resistance has been studied, together with some electron microscopic observations. Thln-film magnetoresistive devices. L. W. DAVIES, Proc. Instn Radio Engrs Aust., April (1967), p. 118. A theoretical analysis is given of the transverse magnetoresistance in a proposed thin-film "raster-plate" structure, consisting of alternate strips of metallic and semiconducting thin films. The resistance R increases according to R = Ro (I + , ~ ) ,