- Email: [email protected]
141. Structural and electrical properties of SbCl5-intercalated graphite fibers
220
Abstracts
141. Structural
and electrical
properties of SbCl<
intercalated graphite fibers
A. Hazratti, C. H. Olk and P. C. Eklund (Uniuersity of Kentucky, Department of Physics and Astronomy, Lexington, KY 40506, U.S.A.). No short abstract received. 142. Low resistivity intercalated pitch based carbon fibers V. Nataragan and J. A. Woolam (University of Nebraska, Department of Electrical Engineering, Lincoln, NB 68588, U.S.A.). A. Yavrouian (Jet Propulsion Laboratory, Pasadena, CA 91109, U.S.A.).
We have intercalated carbon fibers from various sources with both single and “double” species. These include Br,, Br, followed by HN03, Br, followed by SbCl,, ICI, ICl followed by SbCl,, and ICI followed by HNO,. Electrical resistivity, magnetoresistance, thermal and air stability, as well Shubnikov-deHaas measurements have been made. 143. An unusual resistivity maximum in low modulus carbon fibers (Celanese Research Company, Summit, NJ 07901, U.S.A.). I. L. Spain and K. J. Volin (Physics Department, Colorado State University, Ft. Collins, CO 80523, U.S.A.). An
H. A. Goldberg
and I. L. Kalnin
unusual maximum has been found in the temperature dependence of the resistivity of several low modulus PAN-based carbon fibers. Correlations between this resistivity behavior and other physical properties (Young’s modulus, strain to fracture, etc.) have been studied and the results will be reported.
magnitude larger than in graphite) determined Hall measurements, are found in these films.
by
146. Optical properties of hydrogenated amorphous carbon films produced by plasma CVD of propane Y. Ichinose and F. Shimokawa (Technological University of Nagaoka, 1603-1, Kami-tomioka, Nagaoka, Niigata, 949-54, Japan). In the present paper, we
investigated on the optical, electrical and structural properties of hydrogenated amorphous carbon (a-C : H) films prepared from propane (C,H,) gas by the plasma CVD method. It was found that a-C:H films obtained here have very large values of 3.1 eV in the optical gap energy and show very bright white-blue photoluminescence with a peak energy of 2.75 eV. These values are the maximum. 147. Optical properties of r.f. plasma deposited and ion beam deposited amorphous carbon films
D. Mathine, A. Azim Khan, G. Bu-Abbud, J. A. Woollam, B. A. Banks and S. Domitz (University of Nebraska-Lincoln, Department of Electrical Engineering, W194 Nebraska Hall, Lincoln, NE 68588, U.S.A.). We have used ion beam sputtering and
plasma deposition to prepare diamond-like carbon films on silicon, gallium arsenide and silica glass. We have measured the optical dielectric constant and extinction coefficient in the visible spectrum, and have evaluated the interface electrical properties with semiconductors using high frequency conductance measurements. The effects of annealing on electrical, optical and structural properties are discussed.
144. Magnetoresistance and microstructure of carbonfiber/CVD-earbon composites Y. Hishiyama and Y. Kaburagi (Musashi Institute of Technology, Setagaya-ku, Tokyo, 158, Japan). T. Hagio (Government Industrial Research Institute of Kyushu, Shuku-machi, Tosu-shi, 841, Japan). E. Yasuda, Y. Tanabe and S. Kimura (Research Labora-
148. Use of Raman scattering to investigate disorder and crystallite formation in AS-deposited and annealed carbon films R. 0. Dillon and John A. Woollam (Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588, U.S.A.). No short abstract received.
tory of Engineering Materials, Tokyo Institute of Technology, Midori-ku, Yokohama-shi, 227, Japan).
149. X-Ray photoelectron and Auger spectra of AS-
Carbon-fiber/CVD-carbon composites were made by chemical vapor deposition of propane-hydrogen mixtures at 1300°C. Three types of matrix components were obtained. Magnetoresistance was measured at 4.2 K for these components and for those heattreated to 1400°C. The data reflect microstructures of the matrix components. The results are in agreement with those of the optical microscope observations. 145. Hall measurements of metallic carrier densities in ion irradiated amorphous carbon films
T. Venkatesan, R. C. Dynes, A. E. White, B. J. Wilkens, J. M. Gibson and R. Hamm (Bell Laboratories, Murray Hill, NJ 07974, U.S.A.). Amorphous carbon films irradiated with 2 MeV Ar+ ions (at a dose of 10” ions/cm’) exhibit a decrease in resistivity from 5 x lo-* 52cm to 5 x 10m4Q cm. Carrier densities of N 1O23electrons/cm’ (four to five orders of
deposited and annealed R.F. and LB. deposited carbon films? David Liu (NASA Lewis Research Center, Cleveland, OH 44135, U.S.A.). R. 0. DillonS and John A. Woollam (Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588, U.S.A.). No
short abstract received. TResearch supported by the NASA Lewis Research Center, Cleveland, OH 44135, U.S.A. $On leave from the University of Waikato, Hamilton, New Zealand. 150. Interfacial electrical properties of amorphous, d.c. sputter-deposited carbon films on crystalline silicon A. Azim Khan and John A. Woollam (Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588, U.S.A.). Yun Chung (Universal
Abstracts
141. Structural
and electrical
properties of SbCl<
intercalated graphite fibers
A. Hazratti, C. H. Olk and P. C. Eklund (Uniuersity of Kentucky, Department of Physics and Astronomy, Lexington, KY 40506, U.S.A.). No short abstract received. 142. Low resistivity intercalated pitch based carbon fibers V. Nataragan and J. A. Woolam (University of Nebraska, Department of Electrical Engineering, Lincoln, NB 68588, U.S.A.). A. Yavrouian (Jet Propulsion Laboratory, Pasadena, CA 91109, U.S.A.).
We have intercalated carbon fibers from various sources with both single and “double” species. These include Br,, Br, followed by HN03, Br, followed by SbCl,, ICI, ICl followed by SbCl,, and ICI followed by HNO,. Electrical resistivity, magnetoresistance, thermal and air stability, as well Shubnikov-deHaas measurements have been made. 143. An unusual resistivity maximum in low modulus carbon fibers (Celanese Research Company, Summit, NJ 07901, U.S.A.). I. L. Spain and K. J. Volin (Physics Department, Colorado State University, Ft. Collins, CO 80523, U.S.A.). An
H. A. Goldberg
and I. L. Kalnin
unusual maximum has been found in the temperature dependence of the resistivity of several low modulus PAN-based carbon fibers. Correlations between this resistivity behavior and other physical properties (Young’s modulus, strain to fracture, etc.) have been studied and the results will be reported.
magnitude larger than in graphite) determined Hall measurements, are found in these films.
by
146. Optical properties of hydrogenated amorphous carbon films produced by plasma CVD of propane Y. Ichinose and F. Shimokawa (Technological University of Nagaoka, 1603-1, Kami-tomioka, Nagaoka, Niigata, 949-54, Japan). In the present paper, we
investigated on the optical, electrical and structural properties of hydrogenated amorphous carbon (a-C : H) films prepared from propane (C,H,) gas by the plasma CVD method. It was found that a-C:H films obtained here have very large values of 3.1 eV in the optical gap energy and show very bright white-blue photoluminescence with a peak energy of 2.75 eV. These values are the maximum. 147. Optical properties of r.f. plasma deposited and ion beam deposited amorphous carbon films
D. Mathine, A. Azim Khan, G. Bu-Abbud, J. A. Woollam, B. A. Banks and S. Domitz (University of Nebraska-Lincoln, Department of Electrical Engineering, W194 Nebraska Hall, Lincoln, NE 68588, U.S.A.). We have used ion beam sputtering and
plasma deposition to prepare diamond-like carbon films on silicon, gallium arsenide and silica glass. We have measured the optical dielectric constant and extinction coefficient in the visible spectrum, and have evaluated the interface electrical properties with semiconductors using high frequency conductance measurements. The effects of annealing on electrical, optical and structural properties are discussed.
144. Magnetoresistance and microstructure of carbonfiber/CVD-earbon composites Y. Hishiyama and Y. Kaburagi (Musashi Institute of Technology, Setagaya-ku, Tokyo, 158, Japan). T. Hagio (Government Industrial Research Institute of Kyushu, Shuku-machi, Tosu-shi, 841, Japan). E. Yasuda, Y. Tanabe and S. Kimura (Research Labora-
148. Use of Raman scattering to investigate disorder and crystallite formation in AS-deposited and annealed carbon films R. 0. Dillon and John A. Woollam (Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588, U.S.A.). No short abstract received.
tory of Engineering Materials, Tokyo Institute of Technology, Midori-ku, Yokohama-shi, 227, Japan).
149. X-Ray photoelectron and Auger spectra of AS-
Carbon-fiber/CVD-carbon composites were made by chemical vapor deposition of propane-hydrogen mixtures at 1300°C. Three types of matrix components were obtained. Magnetoresistance was measured at 4.2 K for these components and for those heattreated to 1400°C. The data reflect microstructures of the matrix components. The results are in agreement with those of the optical microscope observations. 145. Hall measurements of metallic carrier densities in ion irradiated amorphous carbon films
T. Venkatesan, R. C. Dynes, A. E. White, B. J. Wilkens, J. M. Gibson and R. Hamm (Bell Laboratories, Murray Hill, NJ 07974, U.S.A.). Amorphous carbon films irradiated with 2 MeV Ar+ ions (at a dose of 10” ions/cm’) exhibit a decrease in resistivity from 5 x lo-* 52cm to 5 x 10m4Q cm. Carrier densities of N 1O23electrons/cm’ (four to five orders of
deposited and annealed R.F. and LB. deposited carbon films? David Liu (NASA Lewis Research Center, Cleveland, OH 44135, U.S.A.). R. 0. DillonS and John A. Woollam (Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588, U.S.A.). No
short abstract received. TResearch supported by the NASA Lewis Research Center, Cleveland, OH 44135, U.S.A. $On leave from the University of Waikato, Hamilton, New Zealand. 150. Interfacial electrical properties of amorphous, d.c. sputter-deposited carbon films on crystalline silicon A. Azim Khan and John A. Woollam (Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588, U.S.A.). Yun Chung (Universal