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1641. Adsorption of oxygen on ultra-thin titanium films
Classified abstracts 1633-1875 Classified a b s t r a c t s 1633--1648 on t h i s : p a g e
Editor's Note The label immediately following the title of each item denotes country of origin of publication, and that at the end of each abstract indicates country of origin of work (where known).
I. General v a c u u m science and engineering 10. V a c u u m
science
and technology
10 : 33 : 64 1633. Third Czechoslovak conference on electronics and vacuum physics. (Czechoslovakia) A report of the conference held in Sept 1965. Transactions of this conference are to be published by Academia, Publishing House of the CSAV, Prague, in the summer of 1966 either in German or English. (Czechoslovakia) L Eckertova, Czech J Phys, B16 (3), 1966, 262-264 (in English).
11. Production of low pressures 11 1634. Present limitations of the devices used in the production of low pressures. (France) The author reviews the different devices used for obtaining low pressures. Emphasis is on the present limits achieved with particular reference to the question of pumps and contamination of vacuum enclosures. J Amoignon, Le Vide, 121, Jan-Feb 1966, 1-11 (in French).
12. Measurement of low pressures 12 : 22 1635. Instrument measures very small vacuum-pressure change. (USA) An instrument for measuring minimum pressure changes in vacuum systems, such as leakage or outgassing rates, consists of a micromanometer integrally connected with a reference pressure chamber. L D Briee, Chem Eng, 73 (4), 1966, 176.
12 1636. Measurement of low pressures. (Hungary) A review and discussion of publications relating to low pressure measurements; units of pressure used in vacuum science and technology; standardization of terms; and recent research in low pressure measurement. E Thomas, Proc Syrup Electron Vacuum Phys, Balatonfoldvar,
Hungary, 1963, 29-36. 16. G a s e s a n d s o l i d s 16 : 18 Adsorption and electron emission of alkaline earth metal films on tungsten, iridium and rhodium. See abstract number 1654. 16 : 33 : 18 Caesium adsorption on faces of tungsten single crystals. See abstract number 1655. 16 : 18 Emission and adsorption characteristics of the W-La system. See abstract number 1656. 16 1637. Adsorption and catalytic reactions on evaporated metal films. XH. Work function measurements. (Czechoslovakia) The measurements of work function changes were made during adsorption of O3 and H2 and their interaction on Ni and Mo films during adsorption of N2 or Mo and iron films, and during adsorption of Xe on Mo films. Anon, Coil Czech Chem Comm, 31, 1966, 1172-1179. 16 1638. Accessibility of surface to gases diffusing inside macroporous
media. (USA)
A method is described for measuring flow porosity with values from 35-100 per cent of the open porosity measured. W H Hedley et aL AIChEJ, 12 (2), 1966, 321. 16 1639. Sorption of vapours by ferric oxide gel and silica gel. (Great
Britain) Adsorption isotherms are reported for a series of aliphatic nitriles on a ferric oxide gel and on a silica gel. A G Foster and M A Place, J Chem Soc, 556A, 1966. 16 1640. Free molecular conductance of a cylindrical tube with wall sorption. (USA) A Monte Carlo method was used to calculate the probability that a molecule passes through a cylindrical tube with wall sorption. C G Smith and G Lewin, J Vac Sci Technol, 3 (3), 1966, 92-95. 16 1641. Adsorption of oxygen on ultra-thin titanium films. (Great
Britain) In the present investigation, the adsorption of oxygen on ultra-thin Ti films has been used to test the effect of a change in work function and inter-island distance on film conductivity. F P Fehiner, Nature, 210, 1966, 1035. 16 1642. Oxygen stacking coefficients on clean semiconductor surfaces.
(Great Britain) M Green, Surface Science, 3, 1965, 419-420. 16 1643. Exploratory experiments concerning the desorption of gases by bombardment with electrons. (USA) Electron bombardment of metal surfaces was investigated as an aid to the degassing of vacuum systems. R E Clansing, Oak Ridge National Laboratory, Tennessee, 1965, 34
pages. 16 1644. Steady expansion of a gas into a vacuum. (USA) The problem of the steady expansion of a gas into a vacuum for both the spherically and cylindrically symmetric cases is examined from the viewpoint of kinetic theory. R H E d w a r d s and H K Cheng, AIAAJ, 4, 1966, 558-561. 16 1645. Technique for studying adsorption of gases on metals by field emission microscopy. (France) M Abon and S J Teichner, J Chim Phys, 63, 1966, 272-277 (in French). 16 1646. Adsorption and oxidation of CO on clean films of palladium and nickel. (USA) The adsorption and surface reaction of CO and 02 on clean films of Pd and Ni at room temperature at pressures in the range of 10-g-10 -~ torr were studied by means of a mass spectrometer and by measuring simultaneously electrical resistance. K Kawasaki et al, J Chem Phys, 44, 1966, 2315-2316. 16 1647. Sorption of gases on metal surfaces in ultra high-vacuum. (USA) Systematic investigation of the adsorption mechanisms of different gases on molybdenum films was continued. B Bergsnov-Hansen et al, Stanford Research Inst, Menlo Park,
California, 1966~ 78 pages. 16 : 33 1648. High temperature and field treatment of the tungsten tip in a field emission microscope and the adsorption of oxygen and hydrogen.
(Czechoslovakia) 505
Editor's Note The label immediately following the title of each item denotes country of origin of publication, and that at the end of each abstract indicates country of origin of work (where known).
I. General v a c u u m science and engineering 10. V a c u u m
science
and technology
10 : 33 : 64 1633. Third Czechoslovak conference on electronics and vacuum physics. (Czechoslovakia) A report of the conference held in Sept 1965. Transactions of this conference are to be published by Academia, Publishing House of the CSAV, Prague, in the summer of 1966 either in German or English. (Czechoslovakia) L Eckertova, Czech J Phys, B16 (3), 1966, 262-264 (in English).
11. Production of low pressures 11 1634. Present limitations of the devices used in the production of low pressures. (France) The author reviews the different devices used for obtaining low pressures. Emphasis is on the present limits achieved with particular reference to the question of pumps and contamination of vacuum enclosures. J Amoignon, Le Vide, 121, Jan-Feb 1966, 1-11 (in French).
12. Measurement of low pressures 12 : 22 1635. Instrument measures very small vacuum-pressure change. (USA) An instrument for measuring minimum pressure changes in vacuum systems, such as leakage or outgassing rates, consists of a micromanometer integrally connected with a reference pressure chamber. L D Briee, Chem Eng, 73 (4), 1966, 176.
12 1636. Measurement of low pressures. (Hungary) A review and discussion of publications relating to low pressure measurements; units of pressure used in vacuum science and technology; standardization of terms; and recent research in low pressure measurement. E Thomas, Proc Syrup Electron Vacuum Phys, Balatonfoldvar,
Hungary, 1963, 29-36. 16. G a s e s a n d s o l i d s 16 : 18 Adsorption and electron emission of alkaline earth metal films on tungsten, iridium and rhodium. See abstract number 1654. 16 : 33 : 18 Caesium adsorption on faces of tungsten single crystals. See abstract number 1655. 16 : 18 Emission and adsorption characteristics of the W-La system. See abstract number 1656. 16 1637. Adsorption and catalytic reactions on evaporated metal films. XH. Work function measurements. (Czechoslovakia) The measurements of work function changes were made during adsorption of O3 and H2 and their interaction on Ni and Mo films during adsorption of N2 or Mo and iron films, and during adsorption of Xe on Mo films. Anon, Coil Czech Chem Comm, 31, 1966, 1172-1179. 16 1638. Accessibility of surface to gases diffusing inside macroporous
media. (USA)
A method is described for measuring flow porosity with values from 35-100 per cent of the open porosity measured. W H Hedley et aL AIChEJ, 12 (2), 1966, 321. 16 1639. Sorption of vapours by ferric oxide gel and silica gel. (Great
Britain) Adsorption isotherms are reported for a series of aliphatic nitriles on a ferric oxide gel and on a silica gel. A G Foster and M A Place, J Chem Soc, 556A, 1966. 16 1640. Free molecular conductance of a cylindrical tube with wall sorption. (USA) A Monte Carlo method was used to calculate the probability that a molecule passes through a cylindrical tube with wall sorption. C G Smith and G Lewin, J Vac Sci Technol, 3 (3), 1966, 92-95. 16 1641. Adsorption of oxygen on ultra-thin titanium films. (Great
Britain) In the present investigation, the adsorption of oxygen on ultra-thin Ti films has been used to test the effect of a change in work function and inter-island distance on film conductivity. F P Fehiner, Nature, 210, 1966, 1035. 16 1642. Oxygen stacking coefficients on clean semiconductor surfaces.
(Great Britain) M Green, Surface Science, 3, 1965, 419-420. 16 1643. Exploratory experiments concerning the desorption of gases by bombardment with electrons. (USA) Electron bombardment of metal surfaces was investigated as an aid to the degassing of vacuum systems. R E Clansing, Oak Ridge National Laboratory, Tennessee, 1965, 34
pages. 16 1644. Steady expansion of a gas into a vacuum. (USA) The problem of the steady expansion of a gas into a vacuum for both the spherically and cylindrically symmetric cases is examined from the viewpoint of kinetic theory. R H E d w a r d s and H K Cheng, AIAAJ, 4, 1966, 558-561. 16 1645. Technique for studying adsorption of gases on metals by field emission microscopy. (France) M Abon and S J Teichner, J Chim Phys, 63, 1966, 272-277 (in French). 16 1646. Adsorption and oxidation of CO on clean films of palladium and nickel. (USA) The adsorption and surface reaction of CO and 02 on clean films of Pd and Ni at room temperature at pressures in the range of 10-g-10 -~ torr were studied by means of a mass spectrometer and by measuring simultaneously electrical resistance. K Kawasaki et al, J Chem Phys, 44, 1966, 2315-2316. 16 1647. Sorption of gases on metal surfaces in ultra high-vacuum. (USA) Systematic investigation of the adsorption mechanisms of different gases on molybdenum films was continued. B Bergsnov-Hansen et al, Stanford Research Inst, Menlo Park,
California, 1966~ 78 pages. 16 : 33 1648. High temperature and field treatment of the tungsten tip in a field emission microscope and the adsorption of oxygen and hydrogen.
(Czechoslovakia) 505