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546. Electron beam evaporation in high vacuum
206
Classified
Abstracts
fitted in and removed from the bell jar of a high vacuum evaporation plant. The apparatus was used for the evaporation of cobalt. The rate of deposition was measured by means of Tolansky’s multiple beam interference method. Rates of I.2 2 0.3 8, sect’ were obtained for drop radii between 1.7 and 1.2 mm. w. J. s. B. Chornik and 1962, 574-576.
E. Grunbaum,
J. Sci. Zns~rum.,
39 (1 I), Nov.
30 : 19 537. Measuring thickness of coatings (X-ray Ruoroscopy). (Great Britain). Anon., Mrasurement and Control, 1 (3), March 1962, 129-133. 30 538. Manifold uses of thin films. Great Britain. Several techniques for the production of thin films exist, including pyrolytic, chemical, electrochemical and cathodic sputtering. The most widely used method however is by vacuum evaporation. If liberated in a sufficiently high vacuum, the atoms or molecules in the vapour radiate outwards from the source in more or less straight lines since the risk of collision with air molecules is small. Thus at a pressure of IO 5 torr the mean free path is of the order of 20 in. and would increase to a number of miles at IO-l5 torr if such low pressures could be readily maintained. In actual practice, evaporation carried out at pressures between lOea and 10ms torr. The field of application of such evaporated films is very wide, ranging from the ‘* silvering ” of reflectors for motor car head lamps to the construction of silicon diodes on a ceramic base. Television screens have a thin film of aluminium deposited on the inner surface of the fluorescent screen to increase image brightness. Selenium films find extensive application in photocells and in the copying plates of the printing process known as Xerography. Magnetic films are used in computers whilst the whole modern development known as microcircuitry is based on the use of thin films, either as links or as passive components. It is hoped that ultimately diodes, transistors, switches as well as piezoelectric, thermomagnetic and thermoelectric devices will be produced solely of thin films. w. J. s. D. Fishlock,
Nell, Scientist.
17 (328), 28 Feb.
1963. 472-475. 30
537-549
544. Temperature characteristics films. C. Feldman and M. Hacskaylo. Dec. 1962, 1459-1460.
of vacuum Rev.
deposited
30 : 33 dielectric
Znstntm.,
33 (12).
Sri.
30 545. Dielectric properties of thin films. Great Britain. Thin film capacitors have been prepared by vacuum deposition and the capacitance and loss factor have been measured under vacuum for a frequency range of 0.1 to 100 kc/s. Results are presented for MgF,, showing the ageing effects which have been observed. These effects are attributed to structural changes in the films and evidence of these changes is shown by electron diffraction. Measurements made at atmospheric pressure give greatly enhanced values of capacitance and loss factor due to atmospheric moisture, and the effects are discussed. (in German) (Author) C. Weaver,
Vakuum-Technik,
11 (6), Sept.
1962,
168-171.
30 : 33 546. Electron beam evaporation in high vacuum. W. Germany. Electron beams are now more frequently used for vacuum evaporation of substances which react with the heated boats. The production of thick metallic layers with high evaporation rates is a promising field for the electron gun and offers new possibilities. The physical principles of electron beam evaporation are discussed. Different kinds of electron guns and their installation in high vacuum plants are mentioned. The relationships between beam power, heat losses, evaporation rates and focusing conditions are investigated. The evaporation rate vs. beam power is shown graphically for different gun types and some substances. The evaporation of materials of high gas content can preferably be carried out by using electron beam pulses. The advantage of this process is briefly discussed. (in German) (Author) G. F. P. Miller,
Vakuum-Technik,
12 (I), Feb.
1963, 12-16.
30 : 47 547. A new range of ring getters evaporating barium. (France). P. della Porta, Le Vide, 17 (lOl), Sept./Ott. 1962, 484-493.
539. Twin foil thickness gauge MGB-1. (Poland). J. Iwinski, Nukleonika, 7 (l), (1962), 54-57. 540. Producing thin monolayer crystal-metal optically flat surfaces. (Germany). R. Speidel and K. Graff, Optik, 19 (8), Aug.
films
30 between
30 two
30
1962, 434-438. 30
541. Thin film cryotrons. (Great Britain). V. L. Newhouse and H. H. Edwards, Proc. Inst. Radio Aug. 1961, 1318.
Electra-erosion
Engrx., 49,
30 : 37 543. Vacuum evaporation source with double-wall cylindrical graphite heater and nozzle outlet. U.S.A. A resistance heated source is described which is capable Film thickness of evaporating refractory materials in vacua. uniformity and deposition efficiency are improved through the use of a converging-diverging nozzle at the crucible outlet. The source also features a double-wall cylindrical graphite heater configuration which facilitates the reduction of heat losses and copper to graphite electrical connectors capable of operating over a large temperature range. (Authors) Rev.
Sci. Instrum.,
technique.
See Abstr.
: IO
No. 473.
: 56
30 : 56 542. Inductance in thin film superconducting structures. (Great Britain). N. H. Meyers, Proc. Inst. Radio Engrs., 49, Nov. 1961, 1640-1649.
F. J. Hemmer and J. R. Piedmont, Dec. 1962, 1355-1357.
548. Evaporated narrow strips. (GermaNy). H. J. Bauer, 2. anger. Phys., 14 (IO), Oct. 1962, 607-608.
33 (12),
Experimental study of an optical resonance phenomenon in thin films of silver. See Abstr. No. 505.
31.
30 : 19 produced
Evacuation and Sealing
31 :56 549. Vacuum and gas photocells. Great Britain. There are so many industrial applications of photocells that a wide variety of types of cell is needed to meet the requirements. This article describes the characteristics of that broad class of cell in which the action takes place in an evacuated or gas-filled envelope. (Author) J. Sharpe.
Intlustr.
Electronics,
1, Nov.
32.
Nucleonics
1962. 70-74.
A new method for measuring the electronic density as a function of the time. See Abstr. No. 497.
32 : 18 of a plasma
Classified
Abstracts
fitted in and removed from the bell jar of a high vacuum evaporation plant. The apparatus was used for the evaporation of cobalt. The rate of deposition was measured by means of Tolansky’s multiple beam interference method. Rates of I.2 2 0.3 8, sect’ were obtained for drop radii between 1.7 and 1.2 mm. w. J. s. B. Chornik and 1962, 574-576.
E. Grunbaum,
J. Sci. Zns~rum.,
39 (1 I), Nov.
30 : 19 537. Measuring thickness of coatings (X-ray Ruoroscopy). (Great Britain). Anon., Mrasurement and Control, 1 (3), March 1962, 129-133. 30 538. Manifold uses of thin films. Great Britain. Several techniques for the production of thin films exist, including pyrolytic, chemical, electrochemical and cathodic sputtering. The most widely used method however is by vacuum evaporation. If liberated in a sufficiently high vacuum, the atoms or molecules in the vapour radiate outwards from the source in more or less straight lines since the risk of collision with air molecules is small. Thus at a pressure of IO 5 torr the mean free path is of the order of 20 in. and would increase to a number of miles at IO-l5 torr if such low pressures could be readily maintained. In actual practice, evaporation carried out at pressures between lOea and 10ms torr. The field of application of such evaporated films is very wide, ranging from the ‘* silvering ” of reflectors for motor car head lamps to the construction of silicon diodes on a ceramic base. Television screens have a thin film of aluminium deposited on the inner surface of the fluorescent screen to increase image brightness. Selenium films find extensive application in photocells and in the copying plates of the printing process known as Xerography. Magnetic films are used in computers whilst the whole modern development known as microcircuitry is based on the use of thin films, either as links or as passive components. It is hoped that ultimately diodes, transistors, switches as well as piezoelectric, thermomagnetic and thermoelectric devices will be produced solely of thin films. w. J. s. D. Fishlock,
Nell, Scientist.
17 (328), 28 Feb.
1963. 472-475. 30
537-549
544. Temperature characteristics films. C. Feldman and M. Hacskaylo. Dec. 1962, 1459-1460.
of vacuum Rev.
deposited
30 : 33 dielectric
Znstntm.,
33 (12).
Sri.
30 545. Dielectric properties of thin films. Great Britain. Thin film capacitors have been prepared by vacuum deposition and the capacitance and loss factor have been measured under vacuum for a frequency range of 0.1 to 100 kc/s. Results are presented for MgF,, showing the ageing effects which have been observed. These effects are attributed to structural changes in the films and evidence of these changes is shown by electron diffraction. Measurements made at atmospheric pressure give greatly enhanced values of capacitance and loss factor due to atmospheric moisture, and the effects are discussed. (in German) (Author) C. Weaver,
Vakuum-Technik,
11 (6), Sept.
1962,
168-171.
30 : 33 546. Electron beam evaporation in high vacuum. W. Germany. Electron beams are now more frequently used for vacuum evaporation of substances which react with the heated boats. The production of thick metallic layers with high evaporation rates is a promising field for the electron gun and offers new possibilities. The physical principles of electron beam evaporation are discussed. Different kinds of electron guns and their installation in high vacuum plants are mentioned. The relationships between beam power, heat losses, evaporation rates and focusing conditions are investigated. The evaporation rate vs. beam power is shown graphically for different gun types and some substances. The evaporation of materials of high gas content can preferably be carried out by using electron beam pulses. The advantage of this process is briefly discussed. (in German) (Author) G. F. P. Miller,
Vakuum-Technik,
12 (I), Feb.
1963, 12-16.
30 : 47 547. A new range of ring getters evaporating barium. (France). P. della Porta, Le Vide, 17 (lOl), Sept./Ott. 1962, 484-493.
539. Twin foil thickness gauge MGB-1. (Poland). J. Iwinski, Nukleonika, 7 (l), (1962), 54-57. 540. Producing thin monolayer crystal-metal optically flat surfaces. (Germany). R. Speidel and K. Graff, Optik, 19 (8), Aug.
films
30 between
30 two
30
1962, 434-438. 30
541. Thin film cryotrons. (Great Britain). V. L. Newhouse and H. H. Edwards, Proc. Inst. Radio Aug. 1961, 1318.
Electra-erosion
Engrx., 49,
30 : 37 543. Vacuum evaporation source with double-wall cylindrical graphite heater and nozzle outlet. U.S.A. A resistance heated source is described which is capable Film thickness of evaporating refractory materials in vacua. uniformity and deposition efficiency are improved through the use of a converging-diverging nozzle at the crucible outlet. The source also features a double-wall cylindrical graphite heater configuration which facilitates the reduction of heat losses and copper to graphite electrical connectors capable of operating over a large temperature range. (Authors) Rev.
Sci. Instrum.,
technique.
See Abstr.
: IO
No. 473.
: 56
30 : 56 542. Inductance in thin film superconducting structures. (Great Britain). N. H. Meyers, Proc. Inst. Radio Engrs., 49, Nov. 1961, 1640-1649.
F. J. Hemmer and J. R. Piedmont, Dec. 1962, 1355-1357.
548. Evaporated narrow strips. (GermaNy). H. J. Bauer, 2. anger. Phys., 14 (IO), Oct. 1962, 607-608.
33 (12),
Experimental study of an optical resonance phenomenon in thin films of silver. See Abstr. No. 505.
31.
30 : 19 produced
Evacuation and Sealing
31 :56 549. Vacuum and gas photocells. Great Britain. There are so many industrial applications of photocells that a wide variety of types of cell is needed to meet the requirements. This article describes the characteristics of that broad class of cell in which the action takes place in an evacuated or gas-filled envelope. (Author) J. Sharpe.
Intlustr.
Electronics,
1, Nov.
32.
Nucleonics
1962. 70-74.
A new method for measuring the electronic density as a function of the time. See Abstr. No. 497.
32 : 18 of a plasma