552. Simple windowless lamp for ultrahigh vacuum photoemission spectroscopy

552. Simple windowless lamp for ultrahigh vacuum photoemission spectroscopy

Classified abstracts 552-565 torr is investigated in a helium field ion microscope with nitrogen cooling of specimens. A characteristic asymmetry of ...

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Classified abstracts 552-565

torr is investigated in a helium field ion microscope with nitrogen cooling of specimens. A characteristic asymmetry of the smearing out of image points and appearance of duplicate points of comparatively low intensity are observed. It is demonstrated quantitatively that charge exchange processes are predominant among the various types of interactions between the field-ions and imaging gas. P A Bereznyak and I M Mikhaylovskiy, Zh Eksper Tear Fiz, 65 (2), 1973, 475-480 552. Simple spectroscopy.

(in Russian). windowless (USA)

lamp

for ultrahigh

vacuum

33 photoemission

A windowless resonance discharge lamp with differential pumping is described. The lamp can be isolated from an ultrahigh vacuum sample chamber by a bakeablevalve.Thedifferential pumpingarrangement is very simple and uses only one mechanical forepump and one oil diffusion pump. J E Rowe et al, Rev Sci Znstrum, 44 (ll), 1973, 1675-1676. 33 553. A photoionization mass spectrometer utilizing a high intensity molecular beam sampling system and synchrotron radiation. (USA) A compact photoionization mass spectrometer utilizing a supersonic molecular beam sampling system is described. Beam intensities of the order of 3 x lo’* molecules/sr s are obtained for CO,. The use of this apparatus with synchrotron radiation is discussed. Results are presented for C,H, and CO, which indicate the usefulness of the nozzle beam with its attendant thermal relaxation for photoionization mass spectrometry studies. G R Parr and J W Taylor, Rev Sci Instrum, 44 (ll), 1973, 15781583. 554. Development of an intense pulsed relativistic electron beam of large diameter and uniform flux. (GB)

Experiments were carried out on a 4 MV pulsed electron-beam generator of v/y N 1, in order to obtain a broad, uniform flux distribution for sample irradiations. Various cathodes were tested, and a design using multiple razor-blade emitters was chosen for its uniform emission and small electron angles. The flux of the propagated beam was measured as a function of both radial and axial distance in the irradiation drift tube. Small electron angles and the relatively uniform flux distribution of the injected beam resulted in propagation with a slow change of radial flux profile as a function of axial drift distance. Between the positions of maximum convergence the irradiation flux passed through regions with a fairly uniform flux of 40 cal cmm2 over a diameter of 100 mm. The axial positions of convergence of the beam were in good agreement with simple models of propagation, and the measured depth-deposition profiles in graphite were in agreement with Monte Carlo predictions. E Thornton and R R Harris, J Phys E: Scient Instrum, 6 (12), 1973, 1223-1232. 555. Secondary electron emission as a technique alignment in low ion-energy reflection experiments.

33 for in situ crystal

(GB) The secondary electron yield due to the bombardment of a copper (001) crystal with 7 keV HZ+ ions was measured as a function of the target spatial position. From these spectra the orientation of the crystal could be determined within 0.2”. (Netherlands) H H W Feijen et al, JPhys E: Scient Znstrum, 6 (12), 1973, 1174-1175. 33 556. Field ion microscope images of DNA and other organic molecules. (USA)

Molecules of DNA, transfer RNA, and copper phthalocyanine on a sharp iridium tip were surrounded with ordered layers of platinum by vacuum deposition. The field ion microscope was used to show cavities in the platinum layers with dimensions of the same order as the molecules being visualized. W R Graham et al, J AppZPhys, 44 (ll), 1973, 5155-5159. 33 557. Projection color television displays. (USA)

Current projection television displays are achieved by direct projection from a-small CRT or by controlling the light from a separate light source with a ‘light valve’. This oauer briefly reviews the Swiss Eidophor three-gun color television light valve and, more fully, the recently announced single-gun colour television sealed light valve developed by the General Electric Company. W E Good and T T True, J Vat Sci Techtwl, 10 (5), 1973, 827-830.

33 558. Flat cathode ray tubes. (USA) The hope of achieving a flat screen television display has resulted in a substantial effort by a number of individuals and companies to develop such a display. However, the performance requirements of such a display present a significant challenge to any display technique attempting to displace the extremely versatile analogue defection CRT. To date, no new display has demonstrated the ability to meet these stringent performance requirements, but some of these new devices indicate that with further development these goals may be achieved. This paper reviews the performance characteristics of one of these new displays, called the Digisplay, a flat panel digitally addressed CRT. In addition to the principles of operation and special operating characteristics, the characteristics of a new 160 x 256 resolution element device (2.2 lines/mm resolution), which has been used to present live-full grey scale-television will be briefly discussed. W F Goede, J Vat Sci Technol, 10 (5), 1973, 768-771. 33 559. The cathode ray tube display: why use anything else? (USA) The cathode ray tube (CRT), especially if the definition is extended to cover all electron-beam addressed display services, both selfluminous and light-modulating types, remains preeminent in today’s display world in spite of competition from a variety of newer laser beam and matrix addressed display technologies. In this paper, we examine some of the reasons for the CRTs success, give a few examples of its continuing adaptability, and speculate on those weak points which may let other technologies get a foot in the door. L K Anderson, J Vuc Sci Technol, 10 (5), 1973, 761-767. 33 560. Possibilities of utilization of microanalysis with the aid of secondary ions in problems of semiconductors. (Germany) Utilization of the methods of secondary ion mass spectrometry and microscopy for determination of implantation profiles and trace analysis of semiconductor materials is considered. S E Richter et al, Proc Int Work Confon Ion Implant in Semieon, Rossendorf 1972, 183-189 (in Russian). 33 561. Emission microscopical investigation of variations in secondary electron emission at plastic deformation. (Germany) Using an emission microscope in the secondary electron emission mode, variations in secondary electron emission due to plastic deformation of specimens are investigated in dependence on specimen temperature. Construction of the specimen holder is described. The influence of residual gas pressure on image contrast of emission microscope is determined. K Wetzig and R Reichelt, Krist und Techn, 7 (7), 1972, 803-812 (in German). 33 562. Ion sources with strong focusing. (Roumania)

Advantages of ion sources with strong focusing used for electromagnetic separation of isotopes and in mass spectrometers are described. A lens with space periodical field is described. G Aleksandru, Stud Si Cerc Fir, 25 (2), 1973,249-251 (in Roumanian). 33 563. On the influence of thermal processes in electron guns on stability of beam currents. (USSR)

Thermal processes in electron guns are analyzed. The influence of variations in geometry of electrode structure and evaporation of heater material on stability of beam current is considered. L I Podgomova et al, Methods of Miniaturiz and Automatiz of Manufact of Computer Elements, Coil, Kiev 1972, 123-135 (in Russian). 33 564. Equipment for electron-beam micromachining. (Poland)

Construction and performance of an equipment for electron-beam micromachining are described. Examples of application of the equipment for technological operations are presented. I Mokrauz et al, Pr Nauk Inst Technol Elektron P Wr, No 8, 1973, 322 (in Polish) 565. Electromagnetic stigmator micromachining. (Poland)

of an equipment

33 for electron-beam

Principles of operation and construction of a stigmator used in an electron-beam equipment for micromachining are described. I Mokrauz and W Slowko, Pr Nauk No 8, 1973, 23-28 (in Polish).

Znst Technol

Elektron

PWr,

233