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623. Theory of negative resistance in hollow cathode discharges
Classified Abstracts
614-623
Classified Abstracts General
10.
Vacuum
Science
and
Engineering
Vacuum Science and Technology
16 619. Ion cyclotron resonance in a slightly ionized gas. A. M&i, J. Phys. Sot. Japan, 17 (5), May 1962, 884-885.
10 614. Anwendung von Baueinheiten fib die Hochvakmuntechnik. (The utilization of structural units in high-vacuum techniques.) S. Diihne, Feingeviiteiechnik, 11 (S), Aug. 1962, 363-366.
13.
17.
17 620. Methods of measuring the vapour pressure of slightly deformed substances. U.S.S.R. Methods for calculating and determining the true condensation coefficient z are examined. For the surface of the evaporation with a roughness of a macroscopic nature for powders, chips etc., the effective condensation coefficient q which is always higher than z must be considered. The relation between q and the geometric parameters of the surface and z is found. The expression for the probability W(U) for the transition of the evaporation gives the relation between the condensation coefficient u and the geometric parameters of the evaporator and container of an arbitrary form. Methods for measuring the condensation coefficient are suggested on the basis of the established function of W(U). A general formula is suggested for calculating the equilibrium vapour pressure when measuring by using Knudsen’s and Langmuir’s methods which are treated as equivalent methods. It is shown that the size and the nature of the evaporator are of decisive importance for methods of evaporation in a vacuum, particularly for small CL. A method is given for calculating the geometric factors which have an effect on the evaporation rate in a vacuum (in Russian).
Vacuum Applications 13
615. Apercu sur la technique da vide : role des pressions partielles. (Outline of vacuum technique : importance of partial pressures). of high vacuum techniques France. The rapid development results from the many applications of this branch of science in the most diverse fields. The reasons for using rarefied atmospheric conditions are thus numerous : the mechanical effects due to pumping, desiccation ; suppression of the oxidant elements of air ; pumping (for degassing, purification, vaporization of metals and liquid) ; setting up of environmental conditions for generation of electronic ionic phenomena such as electrical discharges, plasma states, etc. ; space simulation for the development of satellites, etc. (in French and English). (Author, modified) S. Choumoff,
Instrum. &Lab., 21, July/Sept.
1962, 13-23. 13
616. Instruments et materiel dans la technique du vide. ments and equipment in vacuum technique). Anon., Instrum. & Lab., 21, July/Sept. 1962, 25-52.
(Instru-
V. I. Lozgachev, 1961, 31-38.
13 617. High vacuum. United States. General production processes-thin
Thermodynamics
Izv. Akad. Nauk SSSR,
18.
Otd. Tekh. Nauk, (4),
Gaseous Electronics
18 : 56 621. Life indicating valves. Announcement by National Electronics Inc. of gas-filled valves which show a change in discharge colour when. the end of life is near.
outline of vacuum applications in film processing, metal degassing, etc.
A. R. Gardner, Product Engng, 13 (12), 11 June 1962,82-88.
Anon., Electronic Equipm. News, 4, Sept, 1962, 16.
16.
Gases and Solids
18 622. Study of breakdown of gases by purely azimuthal electric fields. S. Kubota, J. Phys. Sot. Japan, 17 (S), Aug. 1962, 1314-1315.
16 618. Sorption of water vapour on glass surface in vacuum apparatus. Japan. The sorption and desorption of water vapour on borosilicate glass have been studied at temperatures between 3.8” and 46.6”C and at a pressure of lo+ torr, using the constant pressure method. A part of the sorption process is diffusion of water molecules into a surface layer of glass which is named “ hygroscopic surface layer “. The activation energy of diffusion is 7 N 11 kcalimole, and the diffusion constant is about IO-‘* on borosilicate glass cm2 /sec. The’ sorption and desorption surfaces covered with a thin film of diffusion pump oil, Lion A, Octoil S, Apiezon C or Myvane, have also been investigated. The results are similar to those for clean glass surfaces. (Author)
18 623. Theory of negative resistance in hollow cathode discharges. Japan. The mechanisms of negative resistance of hollow cathode discharges are discussed theoretically based on energy balance. Dependence of radiation intensity from the glow determines the behaviour of V-i curves of the discharge. In hollow cathode discharges radiation is mainly due to sputtered metal atoms of the cathode. Conditions for gas and cathode material have been obtained under which negative resistance appears. (Author) T. Musha, J. Phys. Sot. Japan, 17 (9), Sept. 1962, 1447-1453.
Y. Tuzi, J. Phys. Sot. Japan, 17 (l), Jan. 1962,218-227. 323
614-623
Classified Abstracts General
10.
Vacuum
Science
and
Engineering
Vacuum Science and Technology
16 619. Ion cyclotron resonance in a slightly ionized gas. A. M&i, J. Phys. Sot. Japan, 17 (5), May 1962, 884-885.
10 614. Anwendung von Baueinheiten fib die Hochvakmuntechnik. (The utilization of structural units in high-vacuum techniques.) S. Diihne, Feingeviiteiechnik, 11 (S), Aug. 1962, 363-366.
13.
17.
17 620. Methods of measuring the vapour pressure of slightly deformed substances. U.S.S.R. Methods for calculating and determining the true condensation coefficient z are examined. For the surface of the evaporation with a roughness of a macroscopic nature for powders, chips etc., the effective condensation coefficient q which is always higher than z must be considered. The relation between q and the geometric parameters of the surface and z is found. The expression for the probability W(U) for the transition of the evaporation gives the relation between the condensation coefficient u and the geometric parameters of the evaporator and container of an arbitrary form. Methods for measuring the condensation coefficient are suggested on the basis of the established function of W(U). A general formula is suggested for calculating the equilibrium vapour pressure when measuring by using Knudsen’s and Langmuir’s methods which are treated as equivalent methods. It is shown that the size and the nature of the evaporator are of decisive importance for methods of evaporation in a vacuum, particularly for small CL. A method is given for calculating the geometric factors which have an effect on the evaporation rate in a vacuum (in Russian).
Vacuum Applications 13
615. Apercu sur la technique da vide : role des pressions partielles. (Outline of vacuum technique : importance of partial pressures). of high vacuum techniques France. The rapid development results from the many applications of this branch of science in the most diverse fields. The reasons for using rarefied atmospheric conditions are thus numerous : the mechanical effects due to pumping, desiccation ; suppression of the oxidant elements of air ; pumping (for degassing, purification, vaporization of metals and liquid) ; setting up of environmental conditions for generation of electronic ionic phenomena such as electrical discharges, plasma states, etc. ; space simulation for the development of satellites, etc. (in French and English). (Author, modified) S. Choumoff,
Instrum. &Lab., 21, July/Sept.
1962, 13-23. 13
616. Instruments et materiel dans la technique du vide. ments and equipment in vacuum technique). Anon., Instrum. & Lab., 21, July/Sept. 1962, 25-52.
(Instru-
V. I. Lozgachev, 1961, 31-38.
13 617. High vacuum. United States. General production processes-thin
Thermodynamics
Izv. Akad. Nauk SSSR,
18.
Otd. Tekh. Nauk, (4),
Gaseous Electronics
18 : 56 621. Life indicating valves. Announcement by National Electronics Inc. of gas-filled valves which show a change in discharge colour when. the end of life is near.
outline of vacuum applications in film processing, metal degassing, etc.
A. R. Gardner, Product Engng, 13 (12), 11 June 1962,82-88.
Anon., Electronic Equipm. News, 4, Sept, 1962, 16.
16.
Gases and Solids
18 622. Study of breakdown of gases by purely azimuthal electric fields. S. Kubota, J. Phys. Sot. Japan, 17 (S), Aug. 1962, 1314-1315.
16 618. Sorption of water vapour on glass surface in vacuum apparatus. Japan. The sorption and desorption of water vapour on borosilicate glass have been studied at temperatures between 3.8” and 46.6”C and at a pressure of lo+ torr, using the constant pressure method. A part of the sorption process is diffusion of water molecules into a surface layer of glass which is named “ hygroscopic surface layer “. The activation energy of diffusion is 7 N 11 kcalimole, and the diffusion constant is about IO-‘* on borosilicate glass cm2 /sec. The’ sorption and desorption surfaces covered with a thin film of diffusion pump oil, Lion A, Octoil S, Apiezon C or Myvane, have also been investigated. The results are similar to those for clean glass surfaces. (Author)
18 623. Theory of negative resistance in hollow cathode discharges. Japan. The mechanisms of negative resistance of hollow cathode discharges are discussed theoretically based on energy balance. Dependence of radiation intensity from the glow determines the behaviour of V-i curves of the discharge. In hollow cathode discharges radiation is mainly due to sputtered metal atoms of the cathode. Conditions for gas and cathode material have been obtained under which negative resistance appears. (Author) T. Musha, J. Phys. Sot. Japan, 17 (9), Sept. 1962, 1447-1453.
Y. Tuzi, J. Phys. Sot. Japan, 17 (l), Jan. 1962,218-227. 323