694. Sputtering of metals by fast deuterium ions

694. Sputtering of metals by fast deuterium ions

331 Classified Abstracts 691--703 31. suggests that the intermetallic compounds sputter molecularly or perhaps as polyatomic aggregates, w.J.s. C. ...

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331

Classified Abstracts 691--703

31.

suggests that the intermetallic compounds sputter molecularly or perhaps as polyatomic aggregates, w.J.s. C. Moulton, Nature, Lond., 195 (4843), 25 August 1962, 793-794. 30

691. Method for controlled multicomponent sputtering. United States. A new method for sputtering simultaneously from electrically'independent electrodes is described. The important design consideration is that the electrodes (cathodes) are enveloped by a single Crooke's dark space. Using this technique, alloy films (or in the case of reactive sputtering, mixed compound films) can be obtained. Since the electrodes are independent, the composition gradient (in depth) o f the film can be varied at will by proper variation o f applied voltages. (Authors) W. R. Sinclair and F. G. Peters, Rev. Sci. Instrum., 33 (7), July 1962, 744-746.

Evacuation and S e a l i n g 31 : 56

696. The magnitude of trigger tube ignition voltage changes caused by previous discharges. G. O. Crowther and J. Smith, Electronic Engng, 33 (405), Nov. 1961, 728-731. 31 : 56

697. Argon, xenon, and krypton admixtures in neon glow-discharge reference tubes. F. A. Benson and G. P. Burdett, Electronic Engng, 34 (411), May 1962, 326-332. 31

698. A characteristic of the P.I.G. type discharge tube. Y. Tanaka and K. Yamamoto, J. Phys. Soc. Japan, 17 (4), April 1962, 715.

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692. Multiple-heater turret for vapor deposition. United States. A rotary multiple-filament turret is described which permits sequential vapour deposition of several materials from the same position within a vacuum chamber, thereby eliminating angle-of-incidence problems at the receiving surface of the substrate. N o dynamic feed-throughs are used in the system, and only t3ne high-current feed-through is used, thus minimizing high-vacuum leaks. (Authors) J. G. Simmons and D. E. Moister, Rev. Sci. Instrum., 33 (9), Sept. 1962, 978-980. 30

693. Properties and preparation of thin antimony films of high uniformity. United States. The transmission vs. surface density (thickness) relationship has been determined for thin antimony film. Data are given for both white and monochromatic light (4500, 5380 and 6650A.). The results are more accurate than those usually tabulated since the surface densities were determined directly from the films. These films were primarily evapcrated from evenly coated thin nickel rings, giving films o f extreme uniformity. Holland's surface density distribution for films from ring evaporators was found to give an accurate representation of these films. Films of the largest area of constant thickness were produced when the ratio of the evaporation distance to the ring's inner radius was approximately 1:3. (Author)

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Nucleonics 32

699. 40 MeV linear accelerator for a German electron synchrotron. Great Britain. The linear accelerator described has been designed and built by Associated Electrical Industries Ltd. to serve as the electron injector for the 6 MeV electron synchrotron which is being built by Deutches Elektronen Synchrotron at Hamburg. Acceptance tests on the accelerator showed that its output beam has a divergence within ~0.25 mrad. and that 90 per cent of the electrons in the beam will pass through a hole of 9 mm diameter. A beam current of 2 5 0 m A can be produced at a minimum energy of 44 MeV. The specified requirement for 125 mA of electrons having energies within ~½ per cent of the minimum energy can be attained with a total beam current less than 160mA. The maximum permissible energy deviation (from 40 MeV) is :j:0.2 MeV. (Author) Anon., Engineer, 213 (5530), 19 Jan. 1962, 115-118. 32

700. 8 MeV microwave electron linear accelerator installation in Wisconsin. Anon., Engineer, 213 (5537), 9 March 1962, 467-469.

G. A. Condas, Rev. Sci. Instrum., 33 (9), Sept. 1962, 987-991.

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694. Sputtering of metals by fast deuterium ions. U.S.S.R. Metallic Co labelled with a 6°Co-tracer was used for the investigation. Before the test the Co target was cleaned by ionic bombardment with an energy up to 100 keV. The dependence of the absolute value of the sputtering coefficient /~ on the energy of deuterium ions Vr in a range 39-122.2 keV is obtained. This dependence has the form of a gradually falling curve. Moreover, /~ varies within a range from 6.6 × 10-3 to 3.6× I0 -~ atoms per ion (in Russian).

701. Simple storage method for thin serf-supporting carbon films. Great Britain. A method is described in which thin evaporated carbon films for use with the Harwell Tandem Generator can be stored for over six months. The films, on substrates of " Teepol " liquid detergent are stored on glass slides in an atmosphere of water vapour to prevent the substrate drying out. Distilled water has to be used, in a vessel adapted from a glass vacuum desiccator. M.o.A. M. Nobes, J. Sci. Instrum., 38 (10), Oct. 1961, 410. 32 : 24

V. D. Tishchenko, Ukr. Fiz. Zh., 6 (3), 1961, 417-418.

Magnetically operated shutters for use in vacuum systems. 30

See

Abstr. No. 664.

695. The deposition of mixed oxide layers by reactive sputtering. Great Britain. The authors show that it is possible to sputter 33.

General P h y s i c s and Electronics

films of predetermined composition from a composite leadtitanium cathode. Films very similar in chemical composition to lead titanate are obtained with a 5 per cent area ratio of lead to titanium. Annealing o f such films gives a crystalline material with perovskite structure. However, permittivity values are still low (in French and English). D.A. 1".

702. The barrier-grid storage tube. R. J. Paul, Brit. Commun. & Electronics, 9 (1), Jan. 1962, 28-32.

W. P. Bickley and D. S. Campbell, Vide, (99), May/June 1962, 214-221.

703. Image intensifier tubes and astronomy. Anon., Brit. Commun. & Electronics, 9 (2), Feb. 1962, 126.

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