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719. Microminaturization bibliography
Classified Abstracts 712--728
289
Vacuum Applications 30.
Evaporating and Sputtering
30 : 56 712. Thin film voltage controlled oscillator. (U.S.A.) J. Black, Proc. Instrum. Soc. Amer., 17 (2), Paper No. 49.1.62. 30 : 41 713. Very precise thickness measurements of thin films. Great Britain. The author had previously described an optical method for measuring thin films, using an interference microscope with a Wollaston prism in the rear focal plane of the objective. The film is deposited with a reasonably sharp edge on a flat surface and covered with a reflecting film of silver. The image of an illuminated slit is projected by the objective via an illuminator normally on to the specimen. The reflected beams are polarized mutually at right angles. If one image falls on the film and the other on the substrate, the path difference is equal to twice the film thickness. The author now describes a photoelectric method of measuring the path difference, as the visual method previously employed proved rather tedious. With the new detector, it has been found possible to make settings with a standard deviation corresponding to an uncertainty in film thickness of only 0.1 A. w.J.s. J. Dyson, Nature, 197 (4873), 23 March 1963, 1193. 30 : 16 714. Evaporation of Langmuir : Blodgett monolayers in vacuum. Great Britain. The authors investigated the stability in vacuo of stearic acid and barium=copper stearate monolayers deposited on quartz, soft glass and gold. The films were deposited by the Langmuir-Blodgett method and labelled with C14, and the rate of desorption at r o o m temperature and a pressure of 10 -6 torr was measured radiometrically. The barium-copper stearate films on soft glass lost about 10 per cent of their initial activity in 90 h pumping, whilst 50 per cent of the stearic acid film on gold was lost in 5 h. The authors have extended their investigation to other fatty substances and different substrates. It appears that mica shows the highest resistance to desorption of the solids used. w.J.s. G. L. Gaines and R. W. Roberts, Nature, 197 (4869), 23 Feb. 1963, 787. 30 715. Apparatus for obtaining films by vacuum evaporation technique. U.S.S.R. The article describes a laboratory device for obtaining films of metals and dielectrics by evaporation in vacuum. With this apparatus it is possible to evaporate five different materials, obtaining multi-layer systems consisting of ten different shapes arranged in any desired o r d e r ; this is effected during a single evacuation cycle with the recording of the resistance of films during the deposition and with the measurement of the evaporation temperature. The evaporation takes place in a vacuum of 5 × 10 -6 torr. (Authors) A. D. Grigor'ev, et al., Instrum. & Exper. Tech., 3, Feb. 1963, 543-45. (Transl. from Pribory i Tekh. Eksp., 3, May/June, 1962, 133-135.)
30 : 56 719. Microminaturization bibliography. (U.S.A.) Electron. Reliability & Micromin., 2 (1), J a n . / M a r c h 1963, 71-76. 30 : 56 720. Circuit design and parameters in thin film technology.
(U.S.A.) F. F. Jennym, Electron. Reliability & Micromin., 2 (1), Jan./ March 1963, 19-26. 30 : 33 721. Impact evaporation and thin film growth in a glow discharge.
(U.S.A.) E. Kay, Advances in Electronics and Electron Physics 1962, 17, 245-322. 30 : 41 722. Preparation and study of tungsten thin films. (France) E. Gillet, et al., C.R. Acad. Sci. Paris, 256 (4), 21 Jan. 1963, 900-902. 30 : 33 723. Double barrier in thin film triodes. (U.S.A.) R. H. Davis and H. H. Hosak, J. Appl. Phys., 34 (4), April 1963, 864-866. 30 : 56 724. New charts speed. Thin film resistors design. (U.S.A.) H. L. Cook, Electronics, 36 (15), 12 April 1963, 72-74. 30 : 56 725. Electrical conductions in discontinuous thin metal films. (U.S.A.) T. E. Hartman, J. Appl. Phys., 34 (4), April 1963, 943-947. 30 : 56 726. Vacuum deposited thin film circuits. (U.S.A.) Anon., Electronics, 36 (15), 12 April 1963, 80-82. 30 : 33 727. Articles on ferromagnetic thin films. (Germany) W. Andra, Physica Status Solidi, 2, 1962, 99-111. Central Library Translation No. 639).
(available
30 : 33 728. Ferromagnetic thin films and ferromagnetic resonance. (Germany) Z. Frait, Physica Status Solidi, 2, 1962, 1417-1459. (available as Central Library Translation No. 652). 30 : 33 Display of rotational switching characteristics of magnetic thin films, See Abstr. No. 745.
30 : 56
30 : 33 Instrument for observation of magnetization vector position in thin magnetic films. See Abstr. No. 744.
30 : 56
30 : 10 The history and progress of the vacuum deposition processes. See Abstr. No. 680.
(Great Britain) Brit. Commun. & Electron., 10, March 1963, 243. 716. Thin film capacitors.
717. Metal film resistors. (Great Britain) Brit. Commun. & Electron., 10, M a r c h 1963, 230.
30 : 56 718. Thin films for electronic application. (U.S.A.) Electrochemical Society, Spring Meeting 1963, Joint Symposium.
289
Vacuum Applications 30.
Evaporating and Sputtering
30 : 56 712. Thin film voltage controlled oscillator. (U.S.A.) J. Black, Proc. Instrum. Soc. Amer., 17 (2), Paper No. 49.1.62. 30 : 41 713. Very precise thickness measurements of thin films. Great Britain. The author had previously described an optical method for measuring thin films, using an interference microscope with a Wollaston prism in the rear focal plane of the objective. The film is deposited with a reasonably sharp edge on a flat surface and covered with a reflecting film of silver. The image of an illuminated slit is projected by the objective via an illuminator normally on to the specimen. The reflected beams are polarized mutually at right angles. If one image falls on the film and the other on the substrate, the path difference is equal to twice the film thickness. The author now describes a photoelectric method of measuring the path difference, as the visual method previously employed proved rather tedious. With the new detector, it has been found possible to make settings with a standard deviation corresponding to an uncertainty in film thickness of only 0.1 A. w.J.s. J. Dyson, Nature, 197 (4873), 23 March 1963, 1193. 30 : 16 714. Evaporation of Langmuir : Blodgett monolayers in vacuum. Great Britain. The authors investigated the stability in vacuo of stearic acid and barium=copper stearate monolayers deposited on quartz, soft glass and gold. The films were deposited by the Langmuir-Blodgett method and labelled with C14, and the rate of desorption at r o o m temperature and a pressure of 10 -6 torr was measured radiometrically. The barium-copper stearate films on soft glass lost about 10 per cent of their initial activity in 90 h pumping, whilst 50 per cent of the stearic acid film on gold was lost in 5 h. The authors have extended their investigation to other fatty substances and different substrates. It appears that mica shows the highest resistance to desorption of the solids used. w.J.s. G. L. Gaines and R. W. Roberts, Nature, 197 (4869), 23 Feb. 1963, 787. 30 715. Apparatus for obtaining films by vacuum evaporation technique. U.S.S.R. The article describes a laboratory device for obtaining films of metals and dielectrics by evaporation in vacuum. With this apparatus it is possible to evaporate five different materials, obtaining multi-layer systems consisting of ten different shapes arranged in any desired o r d e r ; this is effected during a single evacuation cycle with the recording of the resistance of films during the deposition and with the measurement of the evaporation temperature. The evaporation takes place in a vacuum of 5 × 10 -6 torr. (Authors) A. D. Grigor'ev, et al., Instrum. & Exper. Tech., 3, Feb. 1963, 543-45. (Transl. from Pribory i Tekh. Eksp., 3, May/June, 1962, 133-135.)
30 : 56 719. Microminaturization bibliography. (U.S.A.) Electron. Reliability & Micromin., 2 (1), J a n . / M a r c h 1963, 71-76. 30 : 56 720. Circuit design and parameters in thin film technology.
(U.S.A.) F. F. Jennym, Electron. Reliability & Micromin., 2 (1), Jan./ March 1963, 19-26. 30 : 33 721. Impact evaporation and thin film growth in a glow discharge.
(U.S.A.) E. Kay, Advances in Electronics and Electron Physics 1962, 17, 245-322. 30 : 41 722. Preparation and study of tungsten thin films. (France) E. Gillet, et al., C.R. Acad. Sci. Paris, 256 (4), 21 Jan. 1963, 900-902. 30 : 33 723. Double barrier in thin film triodes. (U.S.A.) R. H. Davis and H. H. Hosak, J. Appl. Phys., 34 (4), April 1963, 864-866. 30 : 56 724. New charts speed. Thin film resistors design. (U.S.A.) H. L. Cook, Electronics, 36 (15), 12 April 1963, 72-74. 30 : 56 725. Electrical conductions in discontinuous thin metal films. (U.S.A.) T. E. Hartman, J. Appl. Phys., 34 (4), April 1963, 943-947. 30 : 56 726. Vacuum deposited thin film circuits. (U.S.A.) Anon., Electronics, 36 (15), 12 April 1963, 80-82. 30 : 33 727. Articles on ferromagnetic thin films. (Germany) W. Andra, Physica Status Solidi, 2, 1962, 99-111. Central Library Translation No. 639).
(available
30 : 33 728. Ferromagnetic thin films and ferromagnetic resonance. (Germany) Z. Frait, Physica Status Solidi, 2, 1962, 1417-1459. (available as Central Library Translation No. 652). 30 : 33 Display of rotational switching characteristics of magnetic thin films, See Abstr. No. 745.
30 : 56
30 : 33 Instrument for observation of magnetization vector position in thin magnetic films. See Abstr. No. 744.
30 : 56
30 : 10 The history and progress of the vacuum deposition processes. See Abstr. No. 680.
(Great Britain) Brit. Commun. & Electron., 10, March 1963, 243. 716. Thin film capacitors.
717. Metal film resistors. (Great Britain) Brit. Commun. & Electron., 10, M a r c h 1963, 230.
30 : 56 718. Thin films for electronic application. (U.S.A.) Electrochemical Society, Spring Meeting 1963, Joint Symposium.