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779. Intense resonance line sources for photochemical work in the vacuum ultraviolet region
Classified Abstracts
314
17 774. A study of cryopump configurations in free-molecular-flow regions. J. 0. Ballance, W. K. Roberts and D. W. Tarbell, Advances in Cryogenic Engineering, (New York, Plenum Press, 1963) Vol.- 8, 57-64.
18.
Gaseous Electronics 18 : 33
Discharge suppressor for glass tubes with neutral gas flow and for Pirani gauge tubes. (Germany) A simple device is described for preventing self-maintained discharges in glass tubes under high longitudinal electric fields without disturbing the neutral gas flow. The device essentially consists of a pair of grids at the respective anode and cathode voltage placed close together and inserted in the central region of the gas flow. The principle can also be used to protect Pirani w. J. s. gauges against strong glow discharges. (Germany) F. Karger, Vakuum Technik, 13 (5), June 1964,152-l 55.
774-794
782. Electrical resistance-strain metal films. (U.S.A.) R. L. Parker and A. Krinsky, 2700-2708.
characteristics
19 of thin evaporated
J. Appl. Phys., 34 (9), Sept. 1963,
19 783. Effects of a guard-ring upon low-energy sputtering yields of flat single-crystal gold targets. (U.S. A.) W. C. Kreye, J. of Appl. Phys., 34 (9), Sept. 1963, 2897-2903.
775.
18 :22 776. Clean-up of inert gases in a penning discharge studied by a tracer technique. (U.S. A.) K. Kawasaki et al., J. Appl. Phys., 35 (3), pt. 1, March 1964, 479-482. 18 777. Atomic collisions involving low energy electrons and ions. M. A. Biondi, Advances in Electronics and Electron Physics, 18, (1963), 67-160.
19
Sputtering ion source for solids. (U.S. A.) Helmut J. Liebl and Richard F. K. Herzog, $. Appl. Phys., 34 (9), Sept. 1963,2893-2897.
784.
19 785. Structure defects in pyrolytic silicon epitaxial films. (U.S.A.) D. P. Miller et al., J. Appl. Phys., 34 (9), Se& 1963, 2813-2821. 19 786. Fission-fragment damage in gold films. (U.S. A.) K. L. Merkle etal., J. Appl. Phys., 34 (9), Sept. 1963, 2800-2804.
19 787. Isotropic permalloy films. (U.S.A.) E. Fuchs and W. Zinn, J. Appl. Phys., 34 (9). Sept. 1963, 25572562. 19
19.
Radiation
19 : 11 Ultra-high vacuum system for use with a polarizing spectrometer. See Abstr. No. 759. 19 : 30 778. Thin film evaporation at 2°K by means of a laser beam. (U.S.A.)
The laser used for evaporation has a coherent light output of 5 Joules and contains a 90” ruby crystal and two xenon flash lamps. Attached to the laser is an aiming device by which the beam can be centred on the desired impact point of the specimen to be evaporated. The glass substrate is cooled by liquid helium and its temperature controlled between 2 “K and 77°K whilst the pressure of the system is of the order of 10-l” torr. This low pressure eliminates all gaseous impurities except helium and the laser beam eliminates the use of boats. As a result the system lends itself to all investigation when a high degree of purity is required, such as the study of tunneling effects between multiple thin films. It has been discovered that Bismuth films which are not normally superconducting become so when evaporated on a cool surface. (U.S.A.)
F. L. Bonem, Res. Develop.,
Current flow in very thin films of A1203 and BeO. (U.S.A.) Dietrich Meyerhofer and Stefan A. Ochs, J. Appl. Phvs., 34 (9), Sept. 1963,2535-2544. 788.
w. J. s.
15 (6), June 1964, 50-52.
19 779. Intense resonance line sources for photochemical work in the vacuum ultraviolet region. (U.S. A.) H. Okabe, J. Opt. Sot. Amer., 54 (4), April 1964, 478-481. 19 780. Diffraction gratings concentrating radiation in the vacuum ultraviolet and X-ray regions of the spectrum. (U.S.A.) F. M. Gerasimov ei al., Opt. and Spectrosc., (I), Jan. 1964,69-72. 19 781. Optical properties of chromium mirrors in the visible region of the spectrum. (U.S. A .) V. P. Kostyuk and I. N. Shklyarevskii, Opt. and Spectros., 26 (2), Feb. 1964, 165-168.
19 789. A spectroscopic method for determining the density and thickness bf layers-of strongly absorbing substances. N. G. Pakhshiev and N. N. Pribvtkova,Ootika i Spektrosk.. 15 (4). Oct. 1963, 574-576 ; (in Russian). ‘Optics ana’ Spectr&c.,‘ig (4) Oct. 1963, 310-311 ; in (English). 19 790. Nondestructive determination of thickness and refractive index of transparent films. W. A. Pliskin and E. E. Conrad, IBM J. Res Develop., 8 (I), Jan. 1963,43-51. 19 791. Thin films photovoltaic cells for solar energy conversion applications. L. D. Massie, Trans. Inst. Elect. Electron. Engrs., AS-l (3), Dec. 1963, 5-10. 19 792. A method for producing fine transparent slits. K. Fea and A. C. Newton, J. Sci. Znstrum., 41 (3), March 1964, 188-189. 19 793. Krypton lamp for reproducing the standard unit of length. N. R. Batarchukova et a/., Measurement Tech., (8), Feb. 1963, 636-638 ; translated from the Russian in Zzmerit. Tekhnika, (8), Aug. 1962,14-16. 19 794. Optics of solid thin-films. Anon., Electra-Technology, N.Y.,
73 (2), Feb. 1964, 13.
314
17 774. A study of cryopump configurations in free-molecular-flow regions. J. 0. Ballance, W. K. Roberts and D. W. Tarbell, Advances in Cryogenic Engineering, (New York, Plenum Press, 1963) Vol.- 8, 57-64.
18.
Gaseous Electronics 18 : 33
Discharge suppressor for glass tubes with neutral gas flow and for Pirani gauge tubes. (Germany) A simple device is described for preventing self-maintained discharges in glass tubes under high longitudinal electric fields without disturbing the neutral gas flow. The device essentially consists of a pair of grids at the respective anode and cathode voltage placed close together and inserted in the central region of the gas flow. The principle can also be used to protect Pirani w. J. s. gauges against strong glow discharges. (Germany) F. Karger, Vakuum Technik, 13 (5), June 1964,152-l 55.
774-794
782. Electrical resistance-strain metal films. (U.S.A.) R. L. Parker and A. Krinsky, 2700-2708.
characteristics
19 of thin evaporated
J. Appl. Phys., 34 (9), Sept. 1963,
19 783. Effects of a guard-ring upon low-energy sputtering yields of flat single-crystal gold targets. (U.S. A.) W. C. Kreye, J. of Appl. Phys., 34 (9), Sept. 1963, 2897-2903.
775.
18 :22 776. Clean-up of inert gases in a penning discharge studied by a tracer technique. (U.S. A.) K. Kawasaki et al., J. Appl. Phys., 35 (3), pt. 1, March 1964, 479-482. 18 777. Atomic collisions involving low energy electrons and ions. M. A. Biondi, Advances in Electronics and Electron Physics, 18, (1963), 67-160.
19
Sputtering ion source for solids. (U.S. A.) Helmut J. Liebl and Richard F. K. Herzog, $. Appl. Phys., 34 (9), Sept. 1963,2893-2897.
784.
19 785. Structure defects in pyrolytic silicon epitaxial films. (U.S.A.) D. P. Miller et al., J. Appl. Phys., 34 (9), Se& 1963, 2813-2821. 19 786. Fission-fragment damage in gold films. (U.S. A.) K. L. Merkle etal., J. Appl. Phys., 34 (9), Sept. 1963, 2800-2804.
19 787. Isotropic permalloy films. (U.S.A.) E. Fuchs and W. Zinn, J. Appl. Phys., 34 (9). Sept. 1963, 25572562. 19
19.
Radiation
19 : 11 Ultra-high vacuum system for use with a polarizing spectrometer. See Abstr. No. 759. 19 : 30 778. Thin film evaporation at 2°K by means of a laser beam. (U.S.A.)
The laser used for evaporation has a coherent light output of 5 Joules and contains a 90” ruby crystal and two xenon flash lamps. Attached to the laser is an aiming device by which the beam can be centred on the desired impact point of the specimen to be evaporated. The glass substrate is cooled by liquid helium and its temperature controlled between 2 “K and 77°K whilst the pressure of the system is of the order of 10-l” torr. This low pressure eliminates all gaseous impurities except helium and the laser beam eliminates the use of boats. As a result the system lends itself to all investigation when a high degree of purity is required, such as the study of tunneling effects between multiple thin films. It has been discovered that Bismuth films which are not normally superconducting become so when evaporated on a cool surface. (U.S.A.)
F. L. Bonem, Res. Develop.,
Current flow in very thin films of A1203 and BeO. (U.S.A.) Dietrich Meyerhofer and Stefan A. Ochs, J. Appl. Phvs., 34 (9), Sept. 1963,2535-2544. 788.
w. J. s.
15 (6), June 1964, 50-52.
19 779. Intense resonance line sources for photochemical work in the vacuum ultraviolet region. (U.S. A.) H. Okabe, J. Opt. Sot. Amer., 54 (4), April 1964, 478-481. 19 780. Diffraction gratings concentrating radiation in the vacuum ultraviolet and X-ray regions of the spectrum. (U.S.A.) F. M. Gerasimov ei al., Opt. and Spectrosc., (I), Jan. 1964,69-72. 19 781. Optical properties of chromium mirrors in the visible region of the spectrum. (U.S. A .) V. P. Kostyuk and I. N. Shklyarevskii, Opt. and Spectros., 26 (2), Feb. 1964, 165-168.
19 789. A spectroscopic method for determining the density and thickness bf layers-of strongly absorbing substances. N. G. Pakhshiev and N. N. Pribvtkova,Ootika i Spektrosk.. 15 (4). Oct. 1963, 574-576 ; (in Russian). ‘Optics ana’ Spectr&c.,‘ig (4) Oct. 1963, 310-311 ; in (English). 19 790. Nondestructive determination of thickness and refractive index of transparent films. W. A. Pliskin and E. E. Conrad, IBM J. Res Develop., 8 (I), Jan. 1963,43-51. 19 791. Thin films photovoltaic cells for solar energy conversion applications. L. D. Massie, Trans. Inst. Elect. Electron. Engrs., AS-l (3), Dec. 1963, 5-10. 19 792. A method for producing fine transparent slits. K. Fea and A. C. Newton, J. Sci. Znstrum., 41 (3), March 1964, 188-189. 19 793. Krypton lamp for reproducing the standard unit of length. N. R. Batarchukova et a/., Measurement Tech., (8), Feb. 1963, 636-638 ; translated from the Russian in Zzmerit. Tekhnika, (8), Aug. 1962,14-16. 19 794. Optics of solid thin-films. Anon., Electra-Technology, N.Y.,
73 (2), Feb. 1964, 13.