- Email: [email protected]
A performance survey of production ion implanters
590
World Abstracts on Microelectronics and Reliability
contamination and microparticulate characterization of integrated circuits.
A performance survey of production ion implanters. M. I. CURREY'r and W. A. KEE~AN. Solid St. Technol. 139 (February 1985). The successful use of ion beam processing in semiconductor manufacturing requires a high degree of accuracy and repeatability of key implant parameters. The
results of a ten-company survey of production implanta,tion equipment using an automated four-point probe sheet resistance mapping system as the evaluation tool, are presented. Substantial disagreement in dose was observed among the seventeen implanters evaluated, suggesting the need for a more extensive study of dose accuracy and a cooperative effort to establish procedures for bringing ion implanters into better agreement.
World Abstracts on Microelectronics and Reliability
contamination and microparticulate characterization of integrated circuits.
A performance survey of production ion implanters. M. I. CURREY'r and W. A. KEE~AN. Solid St. Technol. 139 (February 1985). The successful use of ion beam processing in semiconductor manufacturing requires a high degree of accuracy and repeatability of key implant parameters. The
results of a ten-company survey of production implanta,tion equipment using an automated four-point probe sheet resistance mapping system as the evaluation tool, are presented. Substantial disagreement in dose was observed among the seventeen implanters evaluated, suggesting the need for a more extensive study of dose accuracy and a cooperative effort to establish procedures for bringing ion implanters into better agreement.