15
International Journal of Mass Spectrometry and Ion Physics. 46 (1983) 15-18 Elsevier Scientific Publishing Company, Amsterdam - Printed in The Netherlands
AN
ELECTROHYDRODYNAMIC
AND T.
NODA
AN
EMITTER
1
ION
TIP
1
, T. OKUTANI , K. 2 2 TAMURA , H. O&AN0 and
SOURCE
HEATED 1
YAGI
BY
WITH
A RESERVOIR
ELECTRON
BOMBARDMENT
,
2
H. H. WATANABE 1 Toyohashi University of Technology, 2. Hitachi Central Research Laboratory,
Tempaku,
Toyohashi
Kokubunji,
Tokyo
440,
Japan
185,
Japan
ABSTRACT An electrohydrodynamic (EHD) ion source equipped with a reservoir and an emitter tip heated by electron bombardment was constructed. Owing to the heating method and reservoir, this source can produce various ion including melting point species high materials stably for a long time. Operated with metals such as indium and gold, an intense and stable ion beam was obtained from each material. This ion source can also be operated as a surface ionization source which produce ions at a very small area of the emitter tip heated by electron bombardment.
INTRODUCTION The with
development
a good
interest
focusing
because
microprobe been
sharpened
other
to
is
coil for
a
the
a narrow
posed This ing
to
vacuum
makes
the
a much
an
constxuction,
emitter
a
temperature rapidly
fairly type heated
the
same
ion
source
electron
hardware
shortens type
the
point
a of
heating with
be
0
1983 Elsevier
Scientific
Publishing
the
the extip.
operat-
reservoir the
metaL
method.
bombardment. also
In
the
with
By
Company
We
a reservoir devising
employed
source.
OOZO-7381/83/0000-OOOO/$OS.OO
source
and
of
a
the
heating
ion
shank
that
equipped
could
to and
remained:
than and
of
is
a
the
emitter
melting
because
emitter
and
as
still
capillary the
needle
the
higher
but
low
by
on
far
spot-welded
known
evaporate The
EHD
well
so
(ref.l-3),
hollow
problems
held
lifetime,
be
tip
ionization
some
metal
source.
a new
and
surface
are
are
beam
ion
have
whose
and
.filament a
ion
considerable
sources
type
radius
with
the
microfabrication,
EHD
needle
in
these
there
longer
its
the
for
collected
to of
types
hairpin
type
liquid
the
to
is
tungsten
material of
is constrained designed
Two
first
has
has
applicability
Although
the
source
ion
metals
micrometers
a
beam,
lifetime
gives
its
capillary
type,
EHD
liquid
etc.
few
as
(ref.4,5).
needle
thus
of
The
such
bright
with
analysis,
reported:
heater
a
of
as
a
16 CONSTRUCTION First so
as
of
to
all,
satisfy
(1)
Ion
(2)
Long
the
of
figure
1.
the
power,
a of
In
the
ID
ter
tip
time
and
owing
nun is
to
provision
placed
by
tip the
tip
was
settled
the
as
of
reservoir
is
illustrated
allows
one
with
small
be
produced
to
easily
electric for
made
of
through
0.5mm
quartz which
a long
tungsten
micrometers
in
pipe the
wire
ring
filament
electron
emitter
for
of
emitelm-
radius
A tungsten the
with
ionized.
reservoir. is
few
the be
OC
a hole,
as
materials.
(ref.61
stably
made
and
of
0.12
heating.
Tip/
Construction
1.
3000
of
holder.
Emitter
Fig.
is
and to
source
reservoir
sharp
point
system
can
with
tip
as
a
around
the
The
polished
tip
than
bottom
placed.
chucked
heating
species
study,
source
replenishment.
material ion
ion
cone-shaped
is
the
higher
of
present
trolytically simply
this
ion
melting
emitter
of
present
Since
high without
the
the
this
reqirements:
lifetime
temperature variety
period
6mm
of
for
from
a choice
construction
in
even
replacing at
goal
following
operating
others
raise
design
production
Ease
(3)
The
our
of
the
EHD
ion
source.
RZSULTS We
examined
gold.
Figure
indium
ions,
extraction half
angle
characteristics 2(a) where
shows the
electrode of
20
mrad
probe
voltage
of
this
ion
current
vs
was
and
the
probe
was
monitored
applied current by
source
with
extraction to
the
within
a Faraday
tip the
cup.
indium
and
voltage
for
agains.t
the
acceptance It
is
shown
17
that
ion
the
extraction
current
and
steeply in
varies
half
angle-which
is
set
This
corresponds
to
a
traction ions. the
case
ior
in
voltage Also
found
of
indium
the
I-V
understood
liquid
gold
density gold ty
of
ions.
of
at
and
kV.
20,
a
steep
but
it
on
the
needle
apex.
several
tens
to
typical
gold be
a
The
to
needle
active
as
the
not
yet
phenomenon
reported
unit
in
behav-
have
shows
per
any
We
also
fluctuation
exgold
current
in
figure
the
two-stage
change
current
without
probe
ions.
certain
respectively.
results-for
see
due
emitter
to
the
of
acceptance
)_IA/sr at
the
can
voltage
the
mrad,
100
microampere
probe
hour
of we
may
the
of
2.0
shows
increase
or
al
2(b)
of
t_hreshold
of
addition,
III
(ref.71,
et
A
6.7
a
square
density
Figure
ions.
formation
5% per
ca_
is
to
current
origin,
cusps
Clumpitt
10
at
proportion
characteristics
its
multiple by
of
rises
on the
flow
a
solid shows
of
cesium of
current
angle the
for
stabili-
stabilization. 100
. .
(b)
(a)
*
r
. .
;sI x
In c- J P&I_
X X
“a
a..=2on-G
x
F
$3
*xx
~_,,&“Fiq.
VERSION
FOR
Probe current and gold ions
2.
SURFACE
Primary
ions
secondary
for
purpose
this
opment We new
of
thus
schema
ion
the
ion at
type of
Cs
ion
this
cesium
is
aimed
L
10 VoltageC kV 1
variations of indium ions (a) (b) with extraction voltage.
mass
now gun
have
been
with
source source
with
used
spectrometry
commercially
conversion
Cs
8
Va f Extraction
IONIZATION
of
negative
o-,-
10 8 Voltagec kV)
6 Va : Extraction
a
small of
the
a high
using
CsCl.
for
the
high
(SIMS).
available, source
A Cs but
size
has
abovementioned brightness. This
sensitivity
system
ion
further been
awaited.
source Figure is
source devel-
into
3(a) the
is
same
a a as
18
r 3.
Fig.
that
shown
the
setting
only
the
the
3(b)
electron
The his
of
extracted
ampere
per
1
in
the shows
CS
the ions
relationship
the for
express
position
3t a),
where
the
solid
assistance
the
Figure
within
unit
but
tip,
current
authors
devoted
Figure
shown
end
Figure ions
in
Construction (a) and characteristics of the present Cs ion source.
acceptance
heating.
angle
can
their on
the
of
sincere drafting
emitter
electron are
half
be
bombardment
the
In heats
intensity
angle
of
density
of
20
of
mrad
a few
Cs and
micro-
obtained.
thanks as
tip.
produced.
between
Current easily
the
(b)
well
to as
Mr. the
M.
Fukuda
for
experiment.
REFERENCES 1 2 3 4 5 6 7
and G. H. Robertson, Appl. Phys. R. J. Culbertson T. Sakurai, Lett. 34(l), ll(1979). and H. Kawakatsu, J. Appl. Phys. 52(4), 2642(1981). M. KomGo K, Gamo, Y.Ochiai,.Y_Inomoto and S.Namba, PGc. 28th. Intern. 198h)p83. (Oregon, Field Emission Symp. 27(9),479(1975). Appl. Phys. Lett. V.E. Krohn and G,R.Ringo, Seliger, J-W. Ward, V. Wang and R.L. Kubena, Appl. Phys. R.L. 34(5),310(1979). Lett. and H-Watanabe, H.Okano H.Tamura, K.Yagi, T.Okutani, T.Noda, Rev. Sci. Instrum. (to be published, 19821. Low-Energy Ion beam 1977. Jefferies, Clampitt and D. K. R. Inst. Phys. Conf. Ser. ~0.38 ch 1.