mium free and consisting essentially of effective quantities of one or more rare earth element-containing species including at least one rare earth element capable of having more than one higher valence state; and one or more additives selected from the groups consisting of aqueous metal complexes including at least one per0x0 ligand; and metal salts of a conjugate base of an acid or aqueous metal complexes of a conjugate base of an acid in which the metals are selected from transition elements. SPUTTERING
TARGElS
U.S. Patent 6,206,985. Mar. 27, 2001 T. Onishi et al., assignors to KK Kobe Seiko Sho, Kobe, Japan
A sputtering target, comprising aluminum and 0.1 to 10% of at least one alloy component selected from the group consisting of titanium, zirconium, and hafnium. APPARATUS FOR CONTROLLING TRE GUALITY OF A GALVANNEALED COATING
U.S. Patent 6,206,986. Mar. 27, 2001 R. Brisberger, assignor to SMS Schloemann-Siemag AG, Dusseldorf, Germany
A method of monitoring and controlling the quality of a galvannealed coating of a steel strip immediately following a galvannealing step, the method comprising converting the hot galvanized coating produced by hot dipping through a thermal treatment in an annealing furnace at temperatures above the melting point of zinc into FeZn phases by diffusion reactions, the method further comprising using as a measurement value for the quality of the galvannealed coating of the steel strip a visual appearance of the galvannealed coating using a visual recording device and processing the measurement signals into measurement values, January 2002
and, after converting the measurement values into control values, using the measurement values for a direct control of the annealing furnace. SPUTTERING
DEVICE
U.S. Patent 6,207,028.
Mar. 27, 2001 D. Haas et al., assignors to Leybold Systems GmbH, Germany
A sputtering device with magnetic amplification comprising a permanent magnet system formed of a plurality of permanent magnets located on a side of a target that faces away from a sputtering surface of the target and for generating a magnetic field. APPARATUS DEPOSlTlON
FOR VAPOR
U.S. Patent 6,207,029. Mar. 27, 2001 E. Begmann, Basel, Switzerland
apparatus for plasma-assisted physical vapor deposition of coatings onto workpieces comprising at least one or more cathode spot arc evaporators.
An
2 MICRO-MEllUIZER ELECTRO-PLATING IN A DISPOSABLE
APPARATUS FOR REGENERATION OF CHROMIUM PLATING BATH
U.S. Patent 6,207,033. Mar. 27, 2001 M.D. Miller et al., assignors to The United States of America as represented by the Secretary of the Army, Washington
A process for regeneration of a plating bath including trivalent chromium cations, the process comprising a single plating tank forming a continuum fully containing the plating bath having disposed therein both a platinum containing anode and a cathode, the anode to cathode ratio being greater than 2:1, the process further comprises the steps of heating the plating bath to a temperature within the range of 8085°C and applying a charge having a current density of at least 10 Aldm2 of exposed cathode to plate chromium on the cathode while the anode in the plating bath oxidizes the trivalent chromium cations to hexavalent chromium.
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