Deposition of SiNx by reactive d.c. magnetron sputtering

Thin Solid Films. 45 ( 1977) 157 J‘ Elsevier Sequoia S.A., Lausanne

DEPOSITION

--Printedin the Netherlands

OF SIN, BY REACTIVE

157

D.C. MAGNETRON

SPUTTERING*

PETER J. CLARKE Sputtered Films, Inc.. Santa Barbara. CaliJ 93103 (U.S.A.)

SIN, was deposited by d.c. reactive sputtering using the S-Gun, a magnetron sputtering device (Varian Associates). The vacuum chamber was pumped by a Cryo-Torr 7 cryopump (CT1 Cryogenic Technology, Inc.). During the sputtering process the vacuum atmosphere was monitored with a quadrupole mass spectrometer. The films were analyzed quantitatively and qualitatively. The optical properties measured were the index of refraction and white light absorption. The relative hardness was determined by a scratch test. The composition of the films was analyzed by X-ray diffraction, scanning electron microscopy and surface analysis techniques.

*Abstract Francisco,

of a paper presented at the International California, U.S.A., March 2%April 1, 1977.

Conference

on Metallurgical

Coatings,

San