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Design and operating technique of a vacuum drying oven. Part I. Design of the oven
VACUUM Classified A b s t r a c t s
I I I --
O
Vacuum Processing Techniques Contd.
--
III
Fabrication of Radio-Frequency Micropotentiometer Resistance Elements See A b s t r a c t No. : 22/'1
15/Ill
The Production of Diffraction Gratings See A b s t r a c t No. : 27/'I
16/II1
The Behaviour of Light-Sensitive Evaporated Layers in the Electron Microscope See A b s t r a c t No. : 19/II
17/III
Photoconductivity of Indium-Selenide See A b s t r a c t N o . : 3 1 / I
18/III
Photographic Copying Process See A b s t r a c t No. : 62/'I
19/III
3 x --
CATHODIC
SPUTTERING
--
3:
The Photoelectric Effect of Thin Bismuth Films United States. T h i n B i s m u t h films on glass were obtained by s p u t t e r i n g in argon. The photoelectric currents were m e a s u r e d w h e n ultraviolet light was focussed on a film, and at the same time direct c u r r e n t passed t h r o u g h the fihn in one direction and also in the reversed direction, as well as alternating current. I t was found t h a t only relatively large alternating c u r r e n t s affected the p h o t o c u r r e n t - - t h u s heating alone did n o t affect the p h o t o c u r r e n t much. The direction and m a g n i t u d e of the direct currents, however, affected the photoc u r r e n t appreciably. (Science Abstracts) Sommaire: L'effet photo-61ectrique de couches fines de bismuth, o b t e n u e s p a r projection cathodique dans l'argon a dt6 l'object de recherches.
O
Abstract No. and References
Sputtering of Stainless Steel by Protons in the 3 0 - 8 0 keV Range United States. Tile s p u t t e r i n g of metals caused b y h y d r o g e n ion b o m b a r d m e n t has been investigated before. These e x p e r i m e n t s seemed to indicate t h a t the n u m b e r of sputtered a t o m s per incident ion increases linearly w i t h the energy in the range up to 500 eV. The a u t h o r s conducted a similar investigation, reported here, in the range 30-80 keV. T h e y employed a b e a m of 7 0 % H + and 3 0 % H +. The target, { inch thick and 4 inch. in diameter, w a s of stainless steel. The m a s s of material s p u t t e r e d was determined b y weighing the t a r g e t before and after each run. Tile pressure in the c h a m b e r was 10 -5 ram. Hg. The accelerating voltage was m o n i t o r e d with the help of an oscilloscope. The m e a s u r e d values of the accelerating voltage and c u r r e n t to the t a r g e t for a given period gave the n u m b e r of incident particles and their energy. As a check the c u r r e n t was calculated f r o m the a m o u n t of h e a t r e m o v e d b y the w a t e r cooling the t a r g e t during the b o m b a r d m e n t . The formula used for this calculation is given. Tile total a m p e r e - h o u r s of beam, hitting the t a r g e t in a run, were determined b y establishing the values of the c u r r e n t at regular time intervals, plotting these values against time, c u t t i n g out the resulting area of the g r a p h p a p e r and weighing tile p a p e r on an analytical balance. The results of the e x p e r i m e n t s are s h o w n in a table reproduced below.
20/IIi
Note by " D. J. Fourie Phys. Rev. 9 x, 15.8.1953 803
21/III
Results of Hydrogen Ions on Stainless Steel
Aeeel. Voltage (k V) 36.3 50.9 74.9
Mass After :¥itric and Mass Before Mass After Chromic Bombardment Bombardment Acid Wash (g) (g) (9) 409.410 403.528 409.289
409.404 403.511 409.268
409.396 403.508 409.286
Mass 1){ff. (g)
Amp. Sec. Total 4-15%
0.016 0.020 0.021
3020 2220 3460
The ratios of s p u t t e r e d a t o m s to incident ion were calculated for each energy value as follows : 0.92 × 10 -2 at 36.2 keV; 1.6 × 10-2 at 50.9 keV and 0.97 × 10 -2 at 74.9 keV. \Vashing the t a r g e t after a r u n in 16 N nitric and chromic acid resulted in a reduction of its weight. This seems to indicate the formation of a deposit during
January, 1954
Vacuum Vol. I V No. 1
112
I I I --
O
Vacuum Processing Techniques Contd.
--
III
Fabrication of Radio-Frequency Micropotentiometer Resistance Elements See A b s t r a c t No. : 22/'1
15/Ill
The Production of Diffraction Gratings See A b s t r a c t No. : 27/'I
16/II1
The Behaviour of Light-Sensitive Evaporated Layers in the Electron Microscope See A b s t r a c t No. : 19/II
17/III
Photoconductivity of Indium-Selenide See A b s t r a c t N o . : 3 1 / I
18/III
Photographic Copying Process See A b s t r a c t No. : 62/'I
19/III
3 x --
CATHODIC
SPUTTERING
--
3:
The Photoelectric Effect of Thin Bismuth Films United States. T h i n B i s m u t h films on glass were obtained by s p u t t e r i n g in argon. The photoelectric currents were m e a s u r e d w h e n ultraviolet light was focussed on a film, and at the same time direct c u r r e n t passed t h r o u g h the fihn in one direction and also in the reversed direction, as well as alternating current. I t was found t h a t only relatively large alternating c u r r e n t s affected the p h o t o c u r r e n t - - t h u s heating alone did n o t affect the p h o t o c u r r e n t much. The direction and m a g n i t u d e of the direct currents, however, affected the photoc u r r e n t appreciably. (Science Abstracts) Sommaire: L'effet photo-61ectrique de couches fines de bismuth, o b t e n u e s p a r projection cathodique dans l'argon a dt6 l'object de recherches.
O
Abstract No. and References
Sputtering of Stainless Steel by Protons in the 3 0 - 8 0 keV Range United States. Tile s p u t t e r i n g of metals caused b y h y d r o g e n ion b o m b a r d m e n t has been investigated before. These e x p e r i m e n t s seemed to indicate t h a t the n u m b e r of sputtered a t o m s per incident ion increases linearly w i t h the energy in the range up to 500 eV. The a u t h o r s conducted a similar investigation, reported here, in the range 30-80 keV. T h e y employed a b e a m of 7 0 % H + and 3 0 % H +. The target, { inch thick and 4 inch. in diameter, w a s of stainless steel. The m a s s of material s p u t t e r e d was determined b y weighing the t a r g e t before and after each run. Tile pressure in the c h a m b e r was 10 -5 ram. Hg. The accelerating voltage was m o n i t o r e d with the help of an oscilloscope. The m e a s u r e d values of the accelerating voltage and c u r r e n t to the t a r g e t for a given period gave the n u m b e r of incident particles and their energy. As a check the c u r r e n t was calculated f r o m the a m o u n t of h e a t r e m o v e d b y the w a t e r cooling the t a r g e t during the b o m b a r d m e n t . The formula used for this calculation is given. Tile total a m p e r e - h o u r s of beam, hitting the t a r g e t in a run, were determined b y establishing the values of the c u r r e n t at regular time intervals, plotting these values against time, c u t t i n g out the resulting area of the g r a p h p a p e r and weighing tile p a p e r on an analytical balance. The results of the e x p e r i m e n t s are s h o w n in a table reproduced below.
20/IIi
Note by " D. J. Fourie Phys. Rev. 9 x, 15.8.1953 803
21/III
Results of Hydrogen Ions on Stainless Steel
Aeeel. Voltage (k V) 36.3 50.9 74.9
Mass After :¥itric and Mass Before Mass After Chromic Bombardment Bombardment Acid Wash (g) (g) (9) 409.410 403.528 409.289
409.404 403.511 409.268
409.396 403.508 409.286
Mass 1){ff. (g)
Amp. Sec. Total 4-15%
0.016 0.020 0.021
3020 2220 3460
The ratios of s p u t t e r e d a t o m s to incident ion were calculated for each energy value as follows : 0.92 × 10 -2 at 36.2 keV; 1.6 × 10-2 at 50.9 keV and 0.97 × 10 -2 at 74.9 keV. \Vashing the t a r g e t after a r u n in 16 N nitric and chromic acid resulted in a reduction of its weight. This seems to indicate the formation of a deposit during
January, 1954
Vacuum Vol. I V No. 1
112