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Durable SiN SPM sensor
TOOLS & TECHNIQUES UPDATE
Durable SiN SPM sensor NanoWorld™ has introduced a Hybrid-Nitride™ sensor for contact-mode scanning probe microscopy (SPM). The SiN-based sensor offers low cantilever bending, resistance to wear, and extended lifetime. The oxidesharpened tips have a height of 4 µm and a typical radius of less than 15 nm. Single holder chips make the SPM sensors easy to handle.
Analysis under pressure
Contact: www.nanoworld.com
Enhanced-resolution AFM probe
Probe microscopy without lasers Compatible with all of its scanning probe microscopes (SPMs), Pacific Nanotechnology’s new Crystal Scanner™ does not use a light-lever mechanism but a new type of force sensor that consists of a sharp probe mounted on a small crystal oscillator to scan the sample surface. This new approach to nanoscale imaging removes some of the complexity of atomic force microscopy. With no laser to align, use is simplified, reducing the potential for errors in measurement. Routine imaging can be accomplished without highly trained operators. Crystal Scan Software’s standard menus simplify image acquisition and include on-screen tutorials.
NANOSENSORS’ PointProbe® Plus (PPP) is an all single-crystal Si atomic force microscopy (AFM) probe that consists of a cantilever and integrated tip, supported by a holder. It combines the PointProbe Series’ high application versatility and compatibility with most commercial AFMs with a further reduced and more reproducible tip radius (typically <7 nm) as well as a more defined tip shape. This provides more reproducible images and enhanced resolution.
Contact: www.piezojena.com
Contact: www.hitachi-hitec-uk.com
Contact: www.nanosensors.com
High resolution surface analysis
Carl Zeiss SMT’s Nano Technology Systems Division has added to its CrossBeam® family of nanoscale inspection and structuring tools, which combine a field-emission scanning electron microscope with a focused ion beam system. The CrossBeam® EsB workstation has combined secondary electron and backscattered electron incolumn detectors. The new in-column EsB detector allows ultrahigh resolution and energy- and angleselective backscattered electron (ESB) imaging without any column adjustment. The instrument offers a combination of real-time three-dimensional analysis, nanoscale manipulation, and high-resolution imaging. A compact, five-channel gas injection system and a large, fully eucentric specimen stage are included. Applications include material analysis, subsurface root cause failure analysis, high-precision sample preparation, nanostructuring, and e-beam lithography.
JEOL’s JAMP-9500F field-emission, scanning Auger microprobe has the highest spatial resolution available for surface analysis of micron-sized areas. Minimum probe diameter is 3 nm for secondary electron imaging and 8 nm for Auger imaging. Analytical resolution is comparable to primary electron beam diameter – ten times the spatial resolution of X-ray systems. Combined with ultrahigh vacuum (UHV), it can identify ‘killer defects’ in interfaces and analyze coatings and composites. The neutralizing ion gun and tilting specimen stage allow analysis of insulating materials and thin films without charging. An ‘in-lens’ Schottky field-emission gun and low-aberration objective lens are integrated to produce probe currents of >200 nA and probe diameters of <10 nm. The hemispherical energy analyzer’s sensitivity surpasses that of cylindrical mirror analyzers. In addition, it allows energy resolution to be varied from 0.05% to 0.6% for chemical state analysis or trace element detection, and analysis of smaller features on larger samples up to 95 mm in diameter. The JAMP-9500F can also be operated as an UHV scanning electron microscope.
Contact: www.smt.zeiss.com
Contact: www.jeol.com
Contact: www.pacificnano.com
Nano-world in motion piezosystem jena's TRITOR 200/20 is a three-axis nanopositioner with a travel range of 235 µm x 235 µm x 30 µm. It is designed for microscopy applications with a central aperture of 50 mm x 50 mm. Other uses include optics and laser tuning, fiber positioning, and scanning probe microscopy. Friction-free flexure hinges provide subnanometer resolution and guiding precision. Each axis can be measured and controlled separately and feedback and drift are eliminated by a feedback sensor system. Active tilt error compensation is integrated into the z-axis drive. Samples can be mounted easily via M4 thread holes in the top plate. The device can also be prepared for vacuum or low-temperature applications.
Hitachi High-Technologies’ S-4300SE/N is a fieldemission scanning electron microscope with excellent resolution and sufficient beam current for a range of analytical techniques. Variable-pressure capability (10-1000 Pa) allows difficult wet, oily, or nonconductive specimens to be imaged without sample preparation. An environmental secondary electron detector can be fitted for imaging at high pressure. The microscope can also be equipped for energy-dispersive X-ray, wavelength-dispersive X-ray (WDX), cathodoluminescence, and electron backscattered diffraction analysis. Beam blanking plates can be added for e-beam lithography. The parallel beam WDX system enables elemental analysis with improved resolution for the separation of light elements and better spatial resolution for mapping.
Dual in-column detectors
December 2004
53
Durable SiN SPM sensor NanoWorld™ has introduced a Hybrid-Nitride™ sensor for contact-mode scanning probe microscopy (SPM). The SiN-based sensor offers low cantilever bending, resistance to wear, and extended lifetime. The oxidesharpened tips have a height of 4 µm and a typical radius of less than 15 nm. Single holder chips make the SPM sensors easy to handle.
Analysis under pressure
Contact: www.nanoworld.com
Enhanced-resolution AFM probe
Probe microscopy without lasers Compatible with all of its scanning probe microscopes (SPMs), Pacific Nanotechnology’s new Crystal Scanner™ does not use a light-lever mechanism but a new type of force sensor that consists of a sharp probe mounted on a small crystal oscillator to scan the sample surface. This new approach to nanoscale imaging removes some of the complexity of atomic force microscopy. With no laser to align, use is simplified, reducing the potential for errors in measurement. Routine imaging can be accomplished without highly trained operators. Crystal Scan Software’s standard menus simplify image acquisition and include on-screen tutorials.
NANOSENSORS’ PointProbe® Plus (PPP) is an all single-crystal Si atomic force microscopy (AFM) probe that consists of a cantilever and integrated tip, supported by a holder. It combines the PointProbe Series’ high application versatility and compatibility with most commercial AFMs with a further reduced and more reproducible tip radius (typically <7 nm) as well as a more defined tip shape. This provides more reproducible images and enhanced resolution.
Contact: www.piezojena.com
Contact: www.hitachi-hitec-uk.com
Contact: www.nanosensors.com
High resolution surface analysis
Carl Zeiss SMT’s Nano Technology Systems Division has added to its CrossBeam® family of nanoscale inspection and structuring tools, which combine a field-emission scanning electron microscope with a focused ion beam system. The CrossBeam® EsB workstation has combined secondary electron and backscattered electron incolumn detectors. The new in-column EsB detector allows ultrahigh resolution and energy- and angleselective backscattered electron (ESB) imaging without any column adjustment. The instrument offers a combination of real-time three-dimensional analysis, nanoscale manipulation, and high-resolution imaging. A compact, five-channel gas injection system and a large, fully eucentric specimen stage are included. Applications include material analysis, subsurface root cause failure analysis, high-precision sample preparation, nanostructuring, and e-beam lithography.
JEOL’s JAMP-9500F field-emission, scanning Auger microprobe has the highest spatial resolution available for surface analysis of micron-sized areas. Minimum probe diameter is 3 nm for secondary electron imaging and 8 nm for Auger imaging. Analytical resolution is comparable to primary electron beam diameter – ten times the spatial resolution of X-ray systems. Combined with ultrahigh vacuum (UHV), it can identify ‘killer defects’ in interfaces and analyze coatings and composites. The neutralizing ion gun and tilting specimen stage allow analysis of insulating materials and thin films without charging. An ‘in-lens’ Schottky field-emission gun and low-aberration objective lens are integrated to produce probe currents of >200 nA and probe diameters of <10 nm. The hemispherical energy analyzer’s sensitivity surpasses that of cylindrical mirror analyzers. In addition, it allows energy resolution to be varied from 0.05% to 0.6% for chemical state analysis or trace element detection, and analysis of smaller features on larger samples up to 95 mm in diameter. The JAMP-9500F can also be operated as an UHV scanning electron microscope.
Contact: www.smt.zeiss.com
Contact: www.jeol.com
Contact: www.pacificnano.com
Nano-world in motion piezosystem jena's TRITOR 200/20 is a three-axis nanopositioner with a travel range of 235 µm x 235 µm x 30 µm. It is designed for microscopy applications with a central aperture of 50 mm x 50 mm. Other uses include optics and laser tuning, fiber positioning, and scanning probe microscopy. Friction-free flexure hinges provide subnanometer resolution and guiding precision. Each axis can be measured and controlled separately and feedback and drift are eliminated by a feedback sensor system. Active tilt error compensation is integrated into the z-axis drive. Samples can be mounted easily via M4 thread holes in the top plate. The device can also be prepared for vacuum or low-temperature applications.
Hitachi High-Technologies’ S-4300SE/N is a fieldemission scanning electron microscope with excellent resolution and sufficient beam current for a range of analytical techniques. Variable-pressure capability (10-1000 Pa) allows difficult wet, oily, or nonconductive specimens to be imaged without sample preparation. An environmental secondary electron detector can be fitted for imaging at high pressure. The microscope can also be equipped for energy-dispersive X-ray, wavelength-dispersive X-ray (WDX), cathodoluminescence, and electron backscattered diffraction analysis. Beam blanking plates can be added for e-beam lithography. The parallel beam WDX system enables elemental analysis with improved resolution for the separation of light elements and better spatial resolution for mapping.
Dual in-column detectors
December 2004
53