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Editorial Board & Publication Information
VACUUM, VOLUME 129, July 2016, ELSEVIER LTD
VACUUM Editor-in-Chief Lars G Hultman, Thin Film Division, Department of Physics, Linköping University, S-58183 Linköping, Sweden, E-mail: [email protected] Editor Per Eklund, Dept. of Physics, Chemistry, and Biology (IFM), Linköping University SE-581 83 Linköping, Sweden, E-mail: [email protected] Special Issues Editor John S. Colligon, School of Computing and Engineering, Surface Coatings and Characterisation, University of Huddersfield, Queensgate, Huddersfield HD1 3DH, UK, E-mail: [email protected] Associate Editors Ulf Jansson, Department of Chemistry - Ångström Laboratory, P.O Box 538, 751 21 Uppsala Sweden, E-mail: [email protected] Oleg B Malyshev, STFC, Daresbury Laboratory, Daresbury, Warrington, Cheshire WA4 4AD UK, E-mail: [email protected] Paul H Mayrhofer, Institute of Materials Science and Technology, Vienna University of Technology, A-1040 Vienna, Austria, E-mail: [email protected] Luigia Sabbatini, Chemistry Department, University of Bari “Aldo Moro”, I-70126 Bari, Italy, E-mail: [email protected] Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also publishes full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation. The journal Vacuum welcomes concise papers, short communications and reviews in the above areas and will normally publish those meeting strict refereeing standards promptly after delivery of the manuscript to one of the Editors listed inside the front cover. Details on style and submission are given on the journal website. Author inquiries: You can track your submitted article at http://www.elsevier.com/track-submission. You can track your accepted article at http:// www.elsevier.com/trackarticle. You are also welcome to contact Customer Support via http://support.elsevier.com. Publication information: Vacuum (ISSN 0042-207X). For 2016, volumes 123–134 are scheduled for publication. Subscription prices are available upon request from the Publisher or from the Customer Service Department nearest you or from this journal’s website (http://www.elsevier.com/locate/ vacuum). Further information is available on this journal and other Elsevier products through Elsevier’s website: (http://www.elsevier.com). Subscriptions are accepted on a prepaid basis only and are entered on a calendar year basis. Issues are sent by standard mail (surface within Europe, air delivery outside Europe). Priority rates are available upon request. Claims for missing issues should be made within six months of the date of dispatch. Advertising information: If you are interested in advertising or other commercial opportunities please e-mail [email protected] and your inquiry will be passed to the correct person who will respond to you within 48 hours. Orders, claims, and journal inquiries: please contact the Elsevier Customer Service Department nearest you: St. Louis: Elsevier Customer Service Department, 3251 Riverport Lane, Maryland Heights, MO 63043, USA; phone: (877) 8397126 [toll free within the USA]; (+1) (314) 4478878 [outside the USA]; fax: (+1) (314) 4478077; e-mail: [email protected] Oxford: Elsevier Customer Service Department, The Boulevard, Langford Lane, Kidlington, Oxford OX5 1GB, UK; phone: (+44) (1865) 843434; fax: (+44) (1865) 843970; e-mail: [email protected] Tokyo: Elsevier Customer Service Department, 4F Higashi-Azabu, 1-Chome Bldg, 1-9-15 Higashi-Azabu, Minato-ku, Tokyo 106-0044, Japan; phone: (+81) (3) 5561 5037; fax: (+81) (3) 5561 5047; e-mail: [email protected] Singapore: Elsevier Customer Service Department, 3 Killiney Road, #08-01 Winsland House I, Singapore 239519; phone: (+65) 63490222; fax:(+65) 67331510; e-mail: [email protected] For a full and complete Guide for Authors, please go to: http://www.elsevier.com/locate/vacuum Illustration on front cover: AFM image of etched SiO2 surface irradiated with 38 MeV Ar. Pages 137-141, by L. Vlasukova, F. Komarov, V. Yuvchenko, L. Baran, O. Milchanin, A. Dauletbekova, A. Alzhanova and A. Akilbekov.
VACUUM Editor-in-Chief Lars G Hultman, Thin Film Division, Department of Physics, Linköping University, S-58183 Linköping, Sweden, E-mail: [email protected] Editor Per Eklund, Dept. of Physics, Chemistry, and Biology (IFM), Linköping University SE-581 83 Linköping, Sweden, E-mail: [email protected] Special Issues Editor John S. Colligon, School of Computing and Engineering, Surface Coatings and Characterisation, University of Huddersfield, Queensgate, Huddersfield HD1 3DH, UK, E-mail: [email protected] Associate Editors Ulf Jansson, Department of Chemistry - Ångström Laboratory, P.O Box 538, 751 21 Uppsala Sweden, E-mail: [email protected] Oleg B Malyshev, STFC, Daresbury Laboratory, Daresbury, Warrington, Cheshire WA4 4AD UK, E-mail: [email protected] Paul H Mayrhofer, Institute of Materials Science and Technology, Vienna University of Technology, A-1040 Vienna, Austria, E-mail: [email protected] Luigia Sabbatini, Chemistry Department, University of Bari “Aldo Moro”, I-70126 Bari, Italy, E-mail: [email protected] Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also publishes full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation. The journal Vacuum welcomes concise papers, short communications and reviews in the above areas and will normally publish those meeting strict refereeing standards promptly after delivery of the manuscript to one of the Editors listed inside the front cover. Details on style and submission are given on the journal website. Author inquiries: You can track your submitted article at http://www.elsevier.com/track-submission. You can track your accepted article at http:// www.elsevier.com/trackarticle. You are also welcome to contact Customer Support via http://support.elsevier.com. Publication information: Vacuum (ISSN 0042-207X). For 2016, volumes 123–134 are scheduled for publication. Subscription prices are available upon request from the Publisher or from the Customer Service Department nearest you or from this journal’s website (http://www.elsevier.com/locate/ vacuum). Further information is available on this journal and other Elsevier products through Elsevier’s website: (http://www.elsevier.com). Subscriptions are accepted on a prepaid basis only and are entered on a calendar year basis. Issues are sent by standard mail (surface within Europe, air delivery outside Europe). Priority rates are available upon request. Claims for missing issues should be made within six months of the date of dispatch. Advertising information: If you are interested in advertising or other commercial opportunities please e-mail [email protected] and your inquiry will be passed to the correct person who will respond to you within 48 hours. Orders, claims, and journal inquiries: please contact the Elsevier Customer Service Department nearest you: St. Louis: Elsevier Customer Service Department, 3251 Riverport Lane, Maryland Heights, MO 63043, USA; phone: (877) 8397126 [toll free within the USA]; (+1) (314) 4478878 [outside the USA]; fax: (+1) (314) 4478077; e-mail: [email protected] Oxford: Elsevier Customer Service Department, The Boulevard, Langford Lane, Kidlington, Oxford OX5 1GB, UK; phone: (+44) (1865) 843434; fax: (+44) (1865) 843970; e-mail: [email protected] Tokyo: Elsevier Customer Service Department, 4F Higashi-Azabu, 1-Chome Bldg, 1-9-15 Higashi-Azabu, Minato-ku, Tokyo 106-0044, Japan; phone: (+81) (3) 5561 5037; fax: (+81) (3) 5561 5047; e-mail: [email protected] Singapore: Elsevier Customer Service Department, 3 Killiney Road, #08-01 Winsland House I, Singapore 239519; phone: (+65) 63490222; fax:(+65) 67331510; e-mail: [email protected] For a full and complete Guide for Authors, please go to: http://www.elsevier.com/locate/vacuum Illustration on front cover: AFM image of etched SiO2 surface irradiated with 38 MeV Ar. Pages 137-141, by L. Vlasukova, F. Komarov, V. Yuvchenko, L. Baran, O. Milchanin, A. Dauletbekova, A. Alzhanova and A. Akilbekov.