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Ergebnisse der Hochvakuumtechnik und der Physik dünner Schichten
Thin Solid Films. 17(1973) 123 © Elsevier Sequoia S.A., Lausanne--Printed in Switzerland
123
Book Reviews Ergebnisse der Hochvakuumtechnik und der Physik diinner Schichten, Vol. II Edited by M. Auw~irter, published by Wissenschaftliche Verlagsgesellschaft M b H , Stuttgart, 1971; 469 pp.; 324 diagrams; 37 tables; Price D M 142.00.
This is the second volume of a work with the same title published in 1957, presented again in the form of a well produced, well illustrated but apparently somewhat heterogeneous collection of essays and reviews (all but one, in German) reporting on the advances in "high vacuum technology and the physics of thin films". In both instances, the editor Max Auw~irter of the vacuum equipment manufacturer Balzers in Liechtenstein, pointed out in the foreword that he was stimulated by the 10th and 25th anniversary of the foundation of his company respectively. In this new volume there are some 27 papers (compared with 19 in the considerably shorter earlier work) and it is therefore not surprising that a proportion are again contributed from members of research and development sections of the editor's establishment. As one would expect with present tendencies there is a strong emphasis on surface effects and associated instrumentation with contributions ranging over chemical reactions at surfaces, surface problems in space research, spectroscopy using ions and u.v.-electrons, photo-emission microscopy and electron interferometry measurements. Contributions on thin films also cover a wide selection of topics with two on specimen preparation for electron microscopy using freeze etching, a comparison of deposition by evaporation and sputtering, nucleation theory, the geometrical control of films, and lastly three aspects of optical thin films. Finally there are reviews on the measurement and production of vacuum, ultra high vacuum equipment for thin film deposition, and several are concerned with vacuum metallurgy and related gas analysis aspects. It is not feasible to single out any particular account, it is likely that each reader will want to select the ones of his own particular i n t e r e s t s - or that he may just want to get an overall impression of the varied topics dealt with by well-known workers in their respective fields. Just as the first volume represented a landmark in a steadily growing technology, the present work m a y be regarded as a state of the art report of recent developments. W. Steckelmacher
123
Book Reviews Ergebnisse der Hochvakuumtechnik und der Physik diinner Schichten, Vol. II Edited by M. Auw~irter, published by Wissenschaftliche Verlagsgesellschaft M b H , Stuttgart, 1971; 469 pp.; 324 diagrams; 37 tables; Price D M 142.00.
This is the second volume of a work with the same title published in 1957, presented again in the form of a well produced, well illustrated but apparently somewhat heterogeneous collection of essays and reviews (all but one, in German) reporting on the advances in "high vacuum technology and the physics of thin films". In both instances, the editor Max Auw~irter of the vacuum equipment manufacturer Balzers in Liechtenstein, pointed out in the foreword that he was stimulated by the 10th and 25th anniversary of the foundation of his company respectively. In this new volume there are some 27 papers (compared with 19 in the considerably shorter earlier work) and it is therefore not surprising that a proportion are again contributed from members of research and development sections of the editor's establishment. As one would expect with present tendencies there is a strong emphasis on surface effects and associated instrumentation with contributions ranging over chemical reactions at surfaces, surface problems in space research, spectroscopy using ions and u.v.-electrons, photo-emission microscopy and electron interferometry measurements. Contributions on thin films also cover a wide selection of topics with two on specimen preparation for electron microscopy using freeze etching, a comparison of deposition by evaporation and sputtering, nucleation theory, the geometrical control of films, and lastly three aspects of optical thin films. Finally there are reviews on the measurement and production of vacuum, ultra high vacuum equipment for thin film deposition, and several are concerned with vacuum metallurgy and related gas analysis aspects. It is not feasible to single out any particular account, it is likely that each reader will want to select the ones of his own particular i n t e r e s t s - or that he may just want to get an overall impression of the varied topics dealt with by well-known workers in their respective fields. Just as the first volume represented a landmark in a steadily growing technology, the present work m a y be regarded as a state of the art report of recent developments. W. Steckelmacher