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Extended efficiency from anti-reflection coating
TOOLS AND TECHNIQUES
Extended efficiency from antireflection coating
range of nanomanipulation and gas injector tools that are the leading tools that nano researchers demand. “Omniprobe joined Oxford Instruments last year and our shared heritage of innovation continues to focus on turning smart science into tools and systems our customers really want”’ said Ian Barkshire, Managing Director of Oxford Instruments NanoAnalysis. For more information visit: www.oxinst.com/omniprobe400.
Andor Technology has announced the launch of its ‘Extended Range, Dual-AR technology’ for the marketleading Newton and iDus spectroscopy CCD platforms. This new coating extends the outstanding Near-Infrared Quantum Efficiency (QE) performance of back-illuminated, deep-depletion sensors into the Visible and Ultraviolet range. Available on the flagship Newton 920 platform and the laboratory-workhorse iDus 420 platform, the Extended Range, Dual-AR technology facilitates broadening of the QE range of back-illuminated, deep-depletion sensors through implementation of a new dual anti-reflection coating process. This new process has been developed and characterized by the sensor manufacturer e2v (Chelmsford, England). The technology also significantly improves sensitivity in the Visible and Ultraviolet regions, with ~90 % or greater QE in the 500 – 850 nm range, whilst maintaining the standard virtual etaloning-free performance of Andor’s deep-depletion sensors in the Near-Infrared. Antoine Varagnat, Spectroscopy Product Specialist at Andor Technology, commented “The outstanding broadband QE performance of the Dual-AR technology, combined with the superb low-etalonning performance and natural NIR sensitivity of back-illuminated deepdepletion sensors, constitute a very attractive solution for broadband luminescence / photoluminescence and absorption spectroscopy, as well as multi-laser Raman setups.” For more information, visit: www.andor.com
Nanomanipulation jumps a generation An innovative new nanomanipulator with a resolution of 10 atoms is generating interest across a wide spectrum of industries. The OmniProbe 400, Oxford Instruments’ latest tool, is optimised for accuracy and high speed. Cheryl Hartfield, Business Manager - Omniprobe Products, says, “the many integrated features of the OmniProbe 400 allow the user to manipulate a sample with unparalleled speed and precision.” Specially designed to provide closed-loop motion in 4 degrees of freedom, the OmniProbe 400 has an easy to use in situ tip exchange and rotation capability. For use on both the SEM and FIB, it is the latest in the Omniprobe 412
New nanomanipulator and gas injector solutions FEI recently announced significant performance enhancements for its DualBeam™ systems. The new EasyLift™ nanomanipulator allows for improved ease of use, reliability, precision and integration in preparing ultra thin samples for analysis in a transmission electron microscope (TEM).The new MultiChem™ gas delivery system, used for direct beam-induced deposition and etching of materials, provides superior control and flexibility over the gasinjection process and features simplified maintenance. EasyLift is designed specifically for in-situ liftout (INLO) TEM sample preparation and other demanding nanomanipulation activities. “By taking ownership of this critical step in the TEM lamella creation process, FEI can now deliver a more robust, integrated, and automated solution for our DualBeam customers,” stated Paul Kirby, senior product marketing manager for FEI’s Electronics Business Unit.“Better performance and a roadmap to fully-automated sample liftout will greatly benefit our advanced failure analysis and research lab customers.” EasyLift is now available on the Helios™ NanoLab™ and Versa 3D™ DualBeam systems. FEI’s portfolio of gas injection solutions for direct beaminduced deposition and etching is now further strengthened by the introduction of the MultiChem. The MultiChem targets applications where it is critical to further improve the properties of the materials deposited, better optimize the deposition or preferential etching process parameters, or etch materials with new gases. “FEI leveraged many years of in-house expertise in the design of the MultiChem. It is a compact, integrated and automated solution supporting up to six precursors and advanced controls for optimizing the gas flux, delivery and mixing of chemistries. It also ensures faster and simpler maintenance of the precursor crucibles,” stated Andre Mijiritskii, director product marketing for SEM and DualBeam products, Materials Science Business Unit, FEI. Better control over the gas injection parameters and full integration are essential to bring beam-induced deposition and etching to the next level, such as the deposition of materials with higher purity or of more complex and controlled contents. Together, with the iFastTM automation framework, MultiChem now allows for even more
SEPTEMBER 2012 | VOLUME 15 | NUMBER 9
New compact highperformance WDXRF spectrometer Rigaku has announced the release of the Supermini200 wavelength dispersive x-ray fluorescence (WDXRF) spectrometer, an enhanced version of the Rigaku Supermini, their popular benchtop WDXRF spectrometer and the newest addition to the broadest line of laboratory XRF instruments available today. Elemental analysis is among the most important fundamental measurements made for industrial quality control and research and development. Wavelength dispersive x-ray fluorescence is one of the most powerful and wellestablished nondestructive techniques for elemental analysis. It has numerous advantages, including light element sensitivity, exceptional elemental resolving power, and low limits of detection. Rigaku’s new Supermini200 combines all of the advantages of traditional WDXRF elemental analysis systems in a smaller, more economical package. Unlike other techniques, such as ICP and AA, no chemical preparation step is required, making sample preparation and cleanup much simpler. The Supermini200 incorporates a number of advancements from the original Supermini, including newly designed and simplified software and an improved footprint. EZ Analysis is a new software feature that simplifies every day, routine operation. A single interface contains comprehensive information about the status of samples, data measurement and analysis parameters, as well as a running output of results. The EZ Scan software module enables analysis of unknown samples with no prior setup and with only a few clicks of the mouse to get started. With a size that is 25 % that of traditional WDXRF units, the Supermini200 is offered at a price that is approximately half that of floor-standing units. Designed to offer performance and value in a compact package, it is positioned to be the perfect instrument for labs replacing older WDXRF units or as a backup WDXRF system for time sensitive industries. For more information visit www.rigaku.com
Interested in the latest Tools and Techniques? Then visit materialstoday.com for the latest news from industry and academia, interviews with leading manufactures, and educational webinars showcasing cuttingedge developments.
Extended efficiency from antireflection coating
range of nanomanipulation and gas injector tools that are the leading tools that nano researchers demand. “Omniprobe joined Oxford Instruments last year and our shared heritage of innovation continues to focus on turning smart science into tools and systems our customers really want”’ said Ian Barkshire, Managing Director of Oxford Instruments NanoAnalysis. For more information visit: www.oxinst.com/omniprobe400.
Andor Technology has announced the launch of its ‘Extended Range, Dual-AR technology’ for the marketleading Newton and iDus spectroscopy CCD platforms. This new coating extends the outstanding Near-Infrared Quantum Efficiency (QE) performance of back-illuminated, deep-depletion sensors into the Visible and Ultraviolet range. Available on the flagship Newton 920 platform and the laboratory-workhorse iDus 420 platform, the Extended Range, Dual-AR technology facilitates broadening of the QE range of back-illuminated, deep-depletion sensors through implementation of a new dual anti-reflection coating process. This new process has been developed and characterized by the sensor manufacturer e2v (Chelmsford, England). The technology also significantly improves sensitivity in the Visible and Ultraviolet regions, with ~90 % or greater QE in the 500 – 850 nm range, whilst maintaining the standard virtual etaloning-free performance of Andor’s deep-depletion sensors in the Near-Infrared. Antoine Varagnat, Spectroscopy Product Specialist at Andor Technology, commented “The outstanding broadband QE performance of the Dual-AR technology, combined with the superb low-etalonning performance and natural NIR sensitivity of back-illuminated deepdepletion sensors, constitute a very attractive solution for broadband luminescence / photoluminescence and absorption spectroscopy, as well as multi-laser Raman setups.” For more information, visit: www.andor.com
Nanomanipulation jumps a generation An innovative new nanomanipulator with a resolution of 10 atoms is generating interest across a wide spectrum of industries. The OmniProbe 400, Oxford Instruments’ latest tool, is optimised for accuracy and high speed. Cheryl Hartfield, Business Manager - Omniprobe Products, says, “the many integrated features of the OmniProbe 400 allow the user to manipulate a sample with unparalleled speed and precision.” Specially designed to provide closed-loop motion in 4 degrees of freedom, the OmniProbe 400 has an easy to use in situ tip exchange and rotation capability. For use on both the SEM and FIB, it is the latest in the Omniprobe 412
New nanomanipulator and gas injector solutions FEI recently announced significant performance enhancements for its DualBeam™ systems. The new EasyLift™ nanomanipulator allows for improved ease of use, reliability, precision and integration in preparing ultra thin samples for analysis in a transmission electron microscope (TEM).The new MultiChem™ gas delivery system, used for direct beam-induced deposition and etching of materials, provides superior control and flexibility over the gasinjection process and features simplified maintenance. EasyLift is designed specifically for in-situ liftout (INLO) TEM sample preparation and other demanding nanomanipulation activities. “By taking ownership of this critical step in the TEM lamella creation process, FEI can now deliver a more robust, integrated, and automated solution for our DualBeam customers,” stated Paul Kirby, senior product marketing manager for FEI’s Electronics Business Unit.“Better performance and a roadmap to fully-automated sample liftout will greatly benefit our advanced failure analysis and research lab customers.” EasyLift is now available on the Helios™ NanoLab™ and Versa 3D™ DualBeam systems. FEI’s portfolio of gas injection solutions for direct beaminduced deposition and etching is now further strengthened by the introduction of the MultiChem. The MultiChem targets applications where it is critical to further improve the properties of the materials deposited, better optimize the deposition or preferential etching process parameters, or etch materials with new gases. “FEI leveraged many years of in-house expertise in the design of the MultiChem. It is a compact, integrated and automated solution supporting up to six precursors and advanced controls for optimizing the gas flux, delivery and mixing of chemistries. It also ensures faster and simpler maintenance of the precursor crucibles,” stated Andre Mijiritskii, director product marketing for SEM and DualBeam products, Materials Science Business Unit, FEI. Better control over the gas injection parameters and full integration are essential to bring beam-induced deposition and etching to the next level, such as the deposition of materials with higher purity or of more complex and controlled contents. Together, with the iFastTM automation framework, MultiChem now allows for even more
SEPTEMBER 2012 | VOLUME 15 | NUMBER 9
New compact highperformance WDXRF spectrometer Rigaku has announced the release of the Supermini200 wavelength dispersive x-ray fluorescence (WDXRF) spectrometer, an enhanced version of the Rigaku Supermini, their popular benchtop WDXRF spectrometer and the newest addition to the broadest line of laboratory XRF instruments available today. Elemental analysis is among the most important fundamental measurements made for industrial quality control and research and development. Wavelength dispersive x-ray fluorescence is one of the most powerful and wellestablished nondestructive techniques for elemental analysis. It has numerous advantages, including light element sensitivity, exceptional elemental resolving power, and low limits of detection. Rigaku’s new Supermini200 combines all of the advantages of traditional WDXRF elemental analysis systems in a smaller, more economical package. Unlike other techniques, such as ICP and AA, no chemical preparation step is required, making sample preparation and cleanup much simpler. The Supermini200 incorporates a number of advancements from the original Supermini, including newly designed and simplified software and an improved footprint. EZ Analysis is a new software feature that simplifies every day, routine operation. A single interface contains comprehensive information about the status of samples, data measurement and analysis parameters, as well as a running output of results. The EZ Scan software module enables analysis of unknown samples with no prior setup and with only a few clicks of the mouse to get started. With a size that is 25 % that of traditional WDXRF units, the Supermini200 is offered at a price that is approximately half that of floor-standing units. Designed to offer performance and value in a compact package, it is positioned to be the perfect instrument for labs replacing older WDXRF units or as a backup WDXRF system for time sensitive industries. For more information visit www.rigaku.com
Interested in the latest Tools and Techniques? Then visit materialstoday.com for the latest news from industry and academia, interviews with leading manufactures, and educational webinars showcasing cuttingedge developments.