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Fast cycle water vapor cryopump
Thin-Film Vacuum Sensor
Fast Cycle Water Vapor Cryopump
TeledyneBrown Engineering Hampton, Va.
Teledyne Brown Engineering, Hastings Instruments recently introduced a new solid-state vacuum sensor that delivers far greater performance and numerous other benefits compared with sensors based on conventional thermal conductivity (Pyrani) and convection techniques. The Hastings Model 2000 provides a linear output signal from an instrument based on a small, rugged thin-film microelectronic sensing element, with a highly accurate output signal over eight decades of vacuum (10-5-1,000 Torr). The Model 2000 combines two well-known and understood technologies-silicon-based semiconductor microelectronics and thermal conductivity vacuum measurement techniquescreating a patentable technology that provides rapid, precise, robust vacuum measurement in a relatively low-cost instrument. Device accuracy, to be rated at a conservative value of ti% of reading initially, is expected to be rated to fl% of reading or better across the range of the instruments as device characterization is completed.
Circle 086 on reader information card
Polycold Systems lntemafional San Rafael, Calif.
The Polycold Model PFC Fast Cycle Water Vapor Cryopump cryocondenses water vapor to speed high vacuum pumpdowns. Up to 90% of the gas load in high vacuum systems can be water vapor. Water vapor slows pumpdowns and is one of the most reactive contaminants in vacuum deposition. The Polycold advantage is a result of the cryosurface being placed directly in the processing chamber where it is not conductance limited, providing water speeds up to 200,000 Wsec.
Circle 087 on reader information card
UHV Magnetron Sputtering Cathodes
Kurt J. Lesker Co. C/ah-ton,Pa.
The Torus 2 UHV (2 in.) and the Torus 3 UHV (3 in.) sputtering sources have a patented auxiliary magnet that flattens the plasma over the targets for superior results-higher deposition rates, increased target utilization, and unsurpassed film uniformity. The guns operate in reactive and normal modes and can deposit any class of material. Magnet strength can be upgraded to handle magnetic materials, and an optional magnet configuration allows sputtering at higher power. All UHV Torus guns are bakeable at 400°C without the magnets, which can be easily removed without breaking the ultra high vacuum environment.
Circle 088 on reader information card
46
METAL FINISHING
??
MARCH 1995
Fast Cycle Water Vapor Cryopump
TeledyneBrown Engineering Hampton, Va.
Teledyne Brown Engineering, Hastings Instruments recently introduced a new solid-state vacuum sensor that delivers far greater performance and numerous other benefits compared with sensors based on conventional thermal conductivity (Pyrani) and convection techniques. The Hastings Model 2000 provides a linear output signal from an instrument based on a small, rugged thin-film microelectronic sensing element, with a highly accurate output signal over eight decades of vacuum (10-5-1,000 Torr). The Model 2000 combines two well-known and understood technologies-silicon-based semiconductor microelectronics and thermal conductivity vacuum measurement techniquescreating a patentable technology that provides rapid, precise, robust vacuum measurement in a relatively low-cost instrument. Device accuracy, to be rated at a conservative value of ti% of reading initially, is expected to be rated to fl% of reading or better across the range of the instruments as device characterization is completed.
Circle 086 on reader information card
Polycold Systems lntemafional San Rafael, Calif.
The Polycold Model PFC Fast Cycle Water Vapor Cryopump cryocondenses water vapor to speed high vacuum pumpdowns. Up to 90% of the gas load in high vacuum systems can be water vapor. Water vapor slows pumpdowns and is one of the most reactive contaminants in vacuum deposition. The Polycold advantage is a result of the cryosurface being placed directly in the processing chamber where it is not conductance limited, providing water speeds up to 200,000 Wsec.
Circle 087 on reader information card
UHV Magnetron Sputtering Cathodes
Kurt J. Lesker Co. C/ah-ton,Pa.
The Torus 2 UHV (2 in.) and the Torus 3 UHV (3 in.) sputtering sources have a patented auxiliary magnet that flattens the plasma over the targets for superior results-higher deposition rates, increased target utilization, and unsurpassed film uniformity. The guns operate in reactive and normal modes and can deposit any class of material. Magnet strength can be upgraded to handle magnetic materials, and an optional magnet configuration allows sputtering at higher power. All UHV Torus guns are bakeable at 400°C without the magnets, which can be easily removed without breaking the ultra high vacuum environment.
Circle 088 on reader information card
46
METAL FINISHING
??
MARCH 1995