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Fluorination of acetylene with cobalt trifluoride
186
B8
Fluorination of acetylene with cobalt trifluoride M. Morioka, M. Sato, N. Takechi, H. Okajima and S. Satoh R&D Center, Kanto De&a
Kogyo
Co., Ltd., 1497 Shibukawa,
Gunma 377 (Japan.
Hexafluoroethane is used as an excellent etching gas in the integrated circuit manufacturing process. We have investigated a process to produce hexafluoroethane with cobalt trifluoride fluorination of acetylene. A fairly good yield of over 90% was obtained without explosive or vigorous side reactions: CH = CH + SCoF, ----+ CF3CF3+ 2HF + 8CoF, The reaction conditions were investigated to reduce the amount of CF, which evolved by the carbon chain scission of acetylene. The quantity of CF, was thus kept below 7%. Data on the influence of the reaction parameters on the yield of CF,CF, will be discussed.
B8
Fluorination of acetylene with cobalt trifluoride M. Morioka, M. Sato, N. Takechi, H. Okajima and S. Satoh R&D Center, Kanto De&a
Kogyo
Co., Ltd., 1497 Shibukawa,
Gunma 377 (Japan.
Hexafluoroethane is used as an excellent etching gas in the integrated circuit manufacturing process. We have investigated a process to produce hexafluoroethane with cobalt trifluoride fluorination of acetylene. A fairly good yield of over 90% was obtained without explosive or vigorous side reactions: CH = CH + SCoF, ----+ CF3CF3+ 2HF + 8CoF, The reaction conditions were investigated to reduce the amount of CF, which evolved by the carbon chain scission of acetylene. The quantity of CF, was thus kept below 7%. Data on the influence of the reaction parameters on the yield of CF,CF, will be discussed.