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Fugitive emissions detection system
Feature
Patents This is a list of r e c e n t l y p u b l i s h e d p a t e n t s covering d e s i g n s a n d i n v e n t i o n s of r e l e v a n c e to Sealing Technology r e a d e r s . C o u n t r i e s c a n be identified by the code in fronl of lhe n u m b e r : AT A u s t r i a US U n i t e d S t a t e s BE B e l g i u m AU A u s t r a l i a CA C a n a d a BR Brazil CH S w i t z e r l a n d D Germany EP E u r o p e a n P a l e n t ES S p a i n FR F r a n c e FI F i n l a n d HU H u n g a r y GB B r i t a i n IR Eire IL Israel JP Japan IT Italy LI L i e c h t e n s t e i n KP North Korea NL N e t h e r l a n d s LU L u x e m b o u r g RO R o m a n i a NO Norway SU F o r m e r Soviel Union SE S w e d e n WO World P a t e n t Full copies of the original p a t e n t d o c u m e n t s c a n be o b t a i n e d from the Iollowing:
The British Library P a t e n t Express, 25 S o u t h a m p t o n Buildings L o n d o n WC2A lAW, UK Fax: +44 171 4 1 2 7 9 3 0 The British Library will also s u p p l y a list of l i b r a r i e s i n c l u d e d in lhe P a t e n l I n f o r m a t i o n Network.
US P a t e n t Office S c i e n t i f i c Library 15th and East Streets, NW Washington, DC 2 0 2 3 1 , USA The J a p a n e s e P a t e n t Office 43 Kaksumigaseki 3-chome Chiyoda-ku, T o k y o 100, J a p a n
Fugitive emissions detection system
16
P a t e n t number: W O 9 6 1 6 3 2 1 Publication date: 3 0 May 1 9 9 6 I n v e n t o r s and applicants: R Lawson, M Kelly This p a t e n t d e s c r i b e s a m o n i t o r i n g s y s t e m w h i c h detects fugitive e m i s s i o n s from p o t e n t i a l leak p o i n t s s u c h as valves a n d bolted flange c o n n e c t i o n s . The b a s i c device c o n s i s t s of two half pieces w h i c h w h e n j o i n e d e n c o m p a s s the c o n n e c t i o n p o i n t in q u e s t i o n (Figure 1). T h e s e m e m b e r s form a c e n t r a l l y located i n t e r n a l c h a n n e l . In the case of a flange c o n n e c t i o n , the h a l v e s are m a d e from a m a t e r i a l s u c h as a l u m i n i u m a n d o n either side of the c h a n n e l are seals t h a t form a n e n c l o s u r e a r o u n d the g a s k e t area. A port is i n c l u d e d for receiving a detector or a v e n t plug. In the case of a valve, the lwo m e m b e r s are m a d e from Ultem 1000 or a l u m i n u m or similar, s h a p e d to Iorm a hollow f r u s t r u m when joined. A mechanical seal is formed b e t w e e n the two halves r a t h e r t h a n u s i n g a gaskel. A previously u n k n o w n a d s o r p t i o n leak detector is also d e s c r i b e d {Figure 2). The device is m a d e of a s u b s t r a t e , electrode e l e m e n t s a n d a n e l a s t o m e r or binder and may include a
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Figure I. The a s s e m b l e d p i e c e s form a c h a m b e r around t h e flange connection.
Sealing Technology No. 34
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Figure 2. When e x p o s e d to e m i s s i o n s , the r e s i s t i v i t y of t h e d e t e c t o r c h a n g e s measurably. t e m p e r a l u r e detector. In o p e r a t i o n , a voltage is applied a c r o s s the deteclor w h i c h h a s s t a n d a r d resistivily. W h e n e m i s s i o n s e s c a p e inlo lhe e n c l o s u r e , the resistivity of the e x p o s e d detector changes, m e a s u r a b l y . The a d s o r p t i o n d e t e c t o r c a n be made using microelectronic l a b r i c a t i o n t e c h n o l o g y - - photo lithographic reduction a n d thick-film m e t a l l i z a t i o n a n d silk s c r e e n i n g t e c h n i q u e s m a y be used. The following g e n e r a l s t e p s are involved: c o m b i n e c a r b o n a n d silicone to form a m i x t u r e ; a d d a m e t a l oxide to the mix; mix or b l e n d to e n s u r e a n e q u a l d i s p e r s i o n of c o m p o n e n t s t h r o u g h o u t ; a n d apply to the s u b s t r a t e , e n s u r i n g the t h i c k n e s s is u n i f o r m . This u n i t c a n detect s u b s t a n c e s with a Van der Waals "a" c o n s t a n t of less t h a n 9 w h e n o p e r a t e d in a n o n - c u r r e n t s a t u r a t e d m o d e or in a l i n e a r region u s i n g c a r b o n or a d s o r b e n t partic, les. This s y s t e m c a n be u s e d with t r a n s m i t t e r s , w h i c h c o m m u n i c a t e with a c e n t r a l p r o c e s s i n g location to t r a n s m i t r e g u l a r s t a t u s reporis.
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Patents This is a list of r e c e n t l y p u b l i s h e d p a t e n t s covering d e s i g n s a n d i n v e n t i o n s of r e l e v a n c e to Sealing Technology r e a d e r s . C o u n t r i e s c a n be identified by the code in fronl of lhe n u m b e r : AT A u s t r i a US U n i t e d S t a t e s BE B e l g i u m AU A u s t r a l i a CA C a n a d a BR Brazil CH S w i t z e r l a n d D Germany EP E u r o p e a n P a l e n t ES S p a i n FR F r a n c e FI F i n l a n d HU H u n g a r y GB B r i t a i n IR Eire IL Israel JP Japan IT Italy LI L i e c h t e n s t e i n KP North Korea NL N e t h e r l a n d s LU L u x e m b o u r g RO R o m a n i a NO Norway SU F o r m e r Soviel Union SE S w e d e n WO World P a t e n t Full copies of the original p a t e n t d o c u m e n t s c a n be o b t a i n e d from the Iollowing:
The British Library P a t e n t Express, 25 S o u t h a m p t o n Buildings L o n d o n WC2A lAW, UK Fax: +44 171 4 1 2 7 9 3 0 The British Library will also s u p p l y a list of l i b r a r i e s i n c l u d e d in lhe P a t e n l I n f o r m a t i o n Network.
US P a t e n t Office S c i e n t i f i c Library 15th and East Streets, NW Washington, DC 2 0 2 3 1 , USA The J a p a n e s e P a t e n t Office 43 Kaksumigaseki 3-chome Chiyoda-ku, T o k y o 100, J a p a n
Fugitive emissions detection system
16
P a t e n t number: W O 9 6 1 6 3 2 1 Publication date: 3 0 May 1 9 9 6 I n v e n t o r s and applicants: R Lawson, M Kelly This p a t e n t d e s c r i b e s a m o n i t o r i n g s y s t e m w h i c h detects fugitive e m i s s i o n s from p o t e n t i a l leak p o i n t s s u c h as valves a n d bolted flange c o n n e c t i o n s . The b a s i c device c o n s i s t s of two half pieces w h i c h w h e n j o i n e d e n c o m p a s s the c o n n e c t i o n p o i n t in q u e s t i o n (Figure 1). T h e s e m e m b e r s form a c e n t r a l l y located i n t e r n a l c h a n n e l . In the case of a flange c o n n e c t i o n , the h a l v e s are m a d e from a m a t e r i a l s u c h as a l u m i n i u m a n d o n either side of the c h a n n e l are seals t h a t form a n e n c l o s u r e a r o u n d the g a s k e t area. A port is i n c l u d e d for receiving a detector or a v e n t plug. In the case of a valve, the lwo m e m b e r s are m a d e from Ultem 1000 or a l u m i n u m or similar, s h a p e d to Iorm a hollow f r u s t r u m when joined. A mechanical seal is formed b e t w e e n the two halves r a t h e r t h a n u s i n g a gaskel. A previously u n k n o w n a d s o r p t i o n leak detector is also d e s c r i b e d {Figure 2). The device is m a d e of a s u b s t r a t e , electrode e l e m e n t s a n d a n e l a s t o m e r or binder and may include a
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40
Figure I. The a s s e m b l e d p i e c e s form a c h a m b e r around t h e flange connection.
Sealing Technology No. 34
18
Figure 2. When e x p o s e d to e m i s s i o n s , the r e s i s t i v i t y of t h e d e t e c t o r c h a n g e s measurably. t e m p e r a l u r e detector. In o p e r a t i o n , a voltage is applied a c r o s s the deteclor w h i c h h a s s t a n d a r d resistivily. W h e n e m i s s i o n s e s c a p e inlo lhe e n c l o s u r e , the resistivity of the e x p o s e d detector changes, m e a s u r a b l y . The a d s o r p t i o n d e t e c t o r c a n be made using microelectronic l a b r i c a t i o n t e c h n o l o g y - - photo lithographic reduction a n d thick-film m e t a l l i z a t i o n a n d silk s c r e e n i n g t e c h n i q u e s m a y be used. The following g e n e r a l s t e p s are involved: c o m b i n e c a r b o n a n d silicone to form a m i x t u r e ; a d d a m e t a l oxide to the mix; mix or b l e n d to e n s u r e a n e q u a l d i s p e r s i o n of c o m p o n e n t s t h r o u g h o u t ; a n d apply to the s u b s t r a t e , e n s u r i n g the t h i c k n e s s is u n i f o r m . This u n i t c a n detect s u b s t a n c e s with a Van der Waals "a" c o n s t a n t of less t h a n 9 w h e n o p e r a t e d in a n o n - c u r r e n t s a t u r a t e d m o d e or in a l i n e a r region u s i n g c a r b o n or a d s o r b e n t partic, les. This s y s t e m c a n be u s e d with t r a n s m i t t e r s , w h i c h c o m m u n i c a t e with a c e n t r a l p r o c e s s i n g location to t r a n s m i t r e g u l a r s t a t u s reporis.
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