Hiden Analytical claim that the HAL quadrupole gas analyser is a flexible, upgradeable system, fast and easy to use. The following new features substantiate this. Dual mass/pressure display. Alternate scanning of two independent mass ranges with independent pressure selection. Simultaneous display and printout. Trend analysis (MID) mode. Continuous output from 16 mass channels with individual autorange on each channel over six decades of pressure. Monitoring periods from as short as 100 ms to many days. Cracking pattern library. Integral mass search eliminates all but best-fit compounds from the 70+ species. Dual Faraday/electron multiplier detection. The dual detector offers multiplier detection to 5 x 1 O-l4 torr yet retains the full performance of the Faraday detector-a unique feature. Mass range options outstanding. ‘S’ series SIMS beam milling).
to 300 AMU.
probe.
The price/performance value is
Options for uhv and for high pressure (ion
And all systems are fully software upgradeable by substitution of a single PCB. HAL 10 Greys Court, Kingsland Grange, Warrington WA1 4RW
Compact
system
for multi-purpose
sputtering
The Edwards ESMlOO is a universal sputtering system with considerable built-in flexibility for research and development work in an industrial or a university research laboratory. The modular
A scanning electron micrograph showing a typical etch carried out by TegalS new 903E plasma etcher. The etched contact is in a chemical vapour deposited oxide layer 500 A thick. The resist is still present. The contact dimension is around 1.8pm.
routine which automatically cleans the reaction chamber, thus reducing the risk of debris and particulate contamination. Improved productivity is also accomplished in the 900E Series by improvements to the wafer transport system which results in reduction of the overall cycle time in processing wafers. Real-time control of rf power delivery together with faster and more stable rf tuning both contribute to process stability and improvements in effective wafer throughput. The provision of automatic chamber cleaning will additionally aid throughput as well as contributing to particulate control. The 900E series comprises three systems, the 900E aimed at single wafer resist stripping, descum and non-critical nitride or polysilicon etching together with backside etching, the 901 E for polysilicon and nitride etch and the 903E for oxide, nitride or polyimide etching. Tegal, founded in 1972 as a supplier of plasma chemistry instruments, produced its first plasma etch and strip equipment in 1975 and became a subsidiary of Motorola in 1977. Membership of Motorola’s New Enterprises organization has provided the opportunity for long term investment coupled with an independence of activity. With headquarters in Novato, California, employing over 300 people, Tegal has offices worldwide, including a sales office in Maidenhead and a demonstration and customer support facility in Livingston. Tegal UK Old Court, Cox Green Lane, Cox Green, Maidenhead, Berks
Photograph shows the Edwards ESMlOO universal sputtering system, comprising E306A pumping unit, for research and development work in industrial or university research laboratories.