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High pressure ionisation gauge
Vacuum
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current is stabilised and can be set to any value between 1 m A and 5 mA on the meter scale. Outgasslng of the grid anode is by electron bombardment, and ~s done by turning the gauge unit selector switch to "Outgas". The gauge head is available as a "nude" unit, mounted on a NW35 CF standard UHV flange, or In a glass envelope for sealing to a glass system. [Leybold-Heraeus Ltd] Circle number 32 on Reader Enquiry Service card High pressure ionisation gauge The Ionivac IM 10 is a high pressure iomsaUon gauge covering the range from 2 × 1 0 -7 to 1 torr. A logarithmic range covers the range from 10-s to 1 torr with six linear ranges from 2 × 10 -? to 1 torr. When used in conjunction with a Thermovac 201 S thermal conductivity gauge the Ionivac IM 10 can be automatically switched on and off. A novel electrode system is used for the Ionivac IM 10. Instead of the anode coming between the cathode and the 1on collector, the outer electrode is now the anode, with the ion collector between anode and cathode. Using this configuration the sensitivity only begins to fall off at pressures above 1 tort. The IR 10 gauge head is encapsulated m a glass envelope. A non-burn-out thormm oxide coated iridium cathode is used to protect the head against accidental air admission. The I R 10 nude gauge head electrode system is mounted on an N W 40 K F flange. [Leybold-Heraeus Ltd] Circle number 33 on Reader Enquiry Service card
The Leybold-Heraeus Ionivac IMIO control unit. Pulse bias sputtering system Bendix clmm a significant breakthrough in bias sputtering technology with the introduction of the AST-601 pulse bias sputtering system. Designed as an optional feature on the Bendix-CVC modular AST-601 deposition system, this new umt eliminates the contaminating conditions inevitable in conventional equipment during bias sputtering, thereby ensuring maximum purity of deposited films. To achieve this, the substrate is mounted on a continuously rotating workholder and is "pulse biased" negatively whenever rotation positions the substrate away from the target in the bias zone. This allows the positive ions to bombard the surface of the substrate, removing contaminants and depositmg them harmlessly away from the target. As rotation continues, simultaneous deposition of thin films occurs as the 654
substrate passes through the target zone. The rotating workholder is divided into six segments, each one isolated electrically from the others and from the support structure. Each segment can handle many different substrate confignrahons. Additional advantages include either rf or dc diode and triode sputtering capabihty, independent power supply tuning is available, and it is possible to introduce or terminate substrate bias at any time without upsetting target deposition conditions. [Bendix Vacuum Ltd] Circle number 34 on Reader Enquwy Service card
p~% DIRECT COUPLED RFPACKAGE
DEPOSITIOSTATION N Bendix AST-60I system.
pulse
bias
sputtering
Modular ion implantation systems A modular form of accelerator design for ion implantation and surface studies allows a large range of machine types to be qmckly assembled from standard components over the voltage range 20 to 600 kV, and permits additions or modifications to be easily made at a later date. Recent research has shown that ion implantation techniques can be used in the construction of metal oxide silicon transistors, mtcrowave bipolar transistors, varactor diodes and resistors, avalanche photo-diodes, mtcrowave oscdlator diodes and resistors. Some devices produced by ton implantation are already commercially avadable. The photograph shows a 180 kV model which has been designed to implant production quantities of samples, and yet provide versatile facilities to experimenters. It features an earthed target vessel so that on-line loading facilities can be used, or experimental observation made during processing. Doping uniformity of better than 1 per cent is ensured by scanning the beam in a raster over the target surface. A preproduction machine is being used m the laboratory as a test bed for the development of accelerator hardware, a general research tool, and for implantaUon of customers' samples at economic rates. Of special significance is the long term testing of new pumping fluids which permit the use of corrosive materials in the ion source and result in the virtual eliminahon of polymer films on electrode and target surfaces. lion Beam Systems, CRL-Edwards] Circle number 35 on Reader Enquiry Service card
Mass spectrometer for educational use The Teaching Micromass 201 is a magneticdeflection mass spectrometer, suitable for teaching the principles and techniques of mass spectroscopy to second-year umversity students and for use by advanced students in research projects. Typical experiments which can be undertaken include the determination of ionisation cross sections, molecular structures, isotopes, appearance potentials and bond energies; analysm of gas mixtures; identification of residual vacuum gases and vapours; and detection of leaks. All can be carried out in a few hours. The system consists of a Micromass 2 analyser unit connected via a 2-1itre/second orifice plate to an air-cooled oll diffusion pump which is augmented by a two-stage rotary pump. The connection line between the two pumps incorporates a gauge, trap and isolation valve. A ten-turn potentiometer provides precision control over the range 5-100 eV. The vacuum system is of open design so that students may famdianse themselves with the components and their operating principles. Samples of gases and volatde liquids are introduced into the instrument through a simple inlet system. This consists of a short stainless steel capdlary tube, terminating m a microsyrmge needle which can be inserted into a glass samplecontainer through a rubber septum. A constrichon in the capillary tube limits the flow rate and prevents too high a pressure being admitted to the analyser umt. With samples at atmospheric pressure, a vacuum of 10 -4 to 10 -5 torr is maintained. [VG-Micromass Ltd] Ctrcle number 36 on Reader Enquiry Service card
An ion implantation machine from Edwards. Vacuum flange gaskets A standard line of vacuum flange gaskets is available in sizes from 2-inch to 10-inch for 150 lb ASA flanges. Special gaskets can be made in small custom production runs. Square, round, and rectangular gaskets with single or double seals have been made for special applications. [Vacuum Research Mfg Co] Circle number 37 on Reader Enquiry Service card Straight-through valves An entire hne of straight-through vacuum valves with roughing ports, for UHV apphcations ranging in clear valve aperture from ~ inch to 3~ inch. All valves are
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current is stabilised and can be set to any value between 1 m A and 5 mA on the meter scale. Outgasslng of the grid anode is by electron bombardment, and ~s done by turning the gauge unit selector switch to "Outgas". The gauge head is available as a "nude" unit, mounted on a NW35 CF standard UHV flange, or In a glass envelope for sealing to a glass system. [Leybold-Heraeus Ltd] Circle number 32 on Reader Enquiry Service card High pressure ionisation gauge The Ionivac IM 10 is a high pressure iomsaUon gauge covering the range from 2 × 1 0 -7 to 1 torr. A logarithmic range covers the range from 10-s to 1 torr with six linear ranges from 2 × 10 -? to 1 torr. When used in conjunction with a Thermovac 201 S thermal conductivity gauge the Ionivac IM 10 can be automatically switched on and off. A novel electrode system is used for the Ionivac IM 10. Instead of the anode coming between the cathode and the 1on collector, the outer electrode is now the anode, with the ion collector between anode and cathode. Using this configuration the sensitivity only begins to fall off at pressures above 1 tort. The IR 10 gauge head is encapsulated m a glass envelope. A non-burn-out thormm oxide coated iridium cathode is used to protect the head against accidental air admission. The I R 10 nude gauge head electrode system is mounted on an N W 40 K F flange. [Leybold-Heraeus Ltd] Circle number 33 on Reader Enquiry Service card
The Leybold-Heraeus Ionivac IMIO control unit. Pulse bias sputtering system Bendix clmm a significant breakthrough in bias sputtering technology with the introduction of the AST-601 pulse bias sputtering system. Designed as an optional feature on the Bendix-CVC modular AST-601 deposition system, this new umt eliminates the contaminating conditions inevitable in conventional equipment during bias sputtering, thereby ensuring maximum purity of deposited films. To achieve this, the substrate is mounted on a continuously rotating workholder and is "pulse biased" negatively whenever rotation positions the substrate away from the target in the bias zone. This allows the positive ions to bombard the surface of the substrate, removing contaminants and depositmg them harmlessly away from the target. As rotation continues, simultaneous deposition of thin films occurs as the 654
substrate passes through the target zone. The rotating workholder is divided into six segments, each one isolated electrically from the others and from the support structure. Each segment can handle many different substrate confignrahons. Additional advantages include either rf or dc diode and triode sputtering capabihty, independent power supply tuning is available, and it is possible to introduce or terminate substrate bias at any time without upsetting target deposition conditions. [Bendix Vacuum Ltd] Circle number 34 on Reader Enquwy Service card
p~% DIRECT COUPLED RFPACKAGE
DEPOSITIOSTATION N Bendix AST-60I system.
pulse
bias
sputtering
Modular ion implantation systems A modular form of accelerator design for ion implantation and surface studies allows a large range of machine types to be qmckly assembled from standard components over the voltage range 20 to 600 kV, and permits additions or modifications to be easily made at a later date. Recent research has shown that ion implantation techniques can be used in the construction of metal oxide silicon transistors, mtcrowave bipolar transistors, varactor diodes and resistors, avalanche photo-diodes, mtcrowave oscdlator diodes and resistors. Some devices produced by ton implantation are already commercially avadable. The photograph shows a 180 kV model which has been designed to implant production quantities of samples, and yet provide versatile facilities to experimenters. It features an earthed target vessel so that on-line loading facilities can be used, or experimental observation made during processing. Doping uniformity of better than 1 per cent is ensured by scanning the beam in a raster over the target surface. A preproduction machine is being used m the laboratory as a test bed for the development of accelerator hardware, a general research tool, and for implantaUon of customers' samples at economic rates. Of special significance is the long term testing of new pumping fluids which permit the use of corrosive materials in the ion source and result in the virtual eliminahon of polymer films on electrode and target surfaces. lion Beam Systems, CRL-Edwards] Circle number 35 on Reader Enquiry Service card
Mass spectrometer for educational use The Teaching Micromass 201 is a magneticdeflection mass spectrometer, suitable for teaching the principles and techniques of mass spectroscopy to second-year umversity students and for use by advanced students in research projects. Typical experiments which can be undertaken include the determination of ionisation cross sections, molecular structures, isotopes, appearance potentials and bond energies; analysm of gas mixtures; identification of residual vacuum gases and vapours; and detection of leaks. All can be carried out in a few hours. The system consists of a Micromass 2 analyser unit connected via a 2-1itre/second orifice plate to an air-cooled oll diffusion pump which is augmented by a two-stage rotary pump. The connection line between the two pumps incorporates a gauge, trap and isolation valve. A ten-turn potentiometer provides precision control over the range 5-100 eV. The vacuum system is of open design so that students may famdianse themselves with the components and their operating principles. Samples of gases and volatde liquids are introduced into the instrument through a simple inlet system. This consists of a short stainless steel capdlary tube, terminating m a microsyrmge needle which can be inserted into a glass samplecontainer through a rubber septum. A constrichon in the capillary tube limits the flow rate and prevents too high a pressure being admitted to the analyser umt. With samples at atmospheric pressure, a vacuum of 10 -4 to 10 -5 torr is maintained. [VG-Micromass Ltd] Ctrcle number 36 on Reader Enquiry Service card
An ion implantation machine from Edwards. Vacuum flange gaskets A standard line of vacuum flange gaskets is available in sizes from 2-inch to 10-inch for 150 lb ASA flanges. Special gaskets can be made in small custom production runs. Square, round, and rectangular gaskets with single or double seals have been made for special applications. [Vacuum Research Mfg Co] Circle number 37 on Reader Enquiry Service card Straight-through valves An entire hne of straight-through vacuum valves with roughing ports, for UHV apphcations ranging in clear valve aperture from ~ inch to 3~ inch. All valves are