Classified Abstracts
553-562
Classified Abstracts Abstracting Editor’s Note. The label immediately following the title of each item denotes country of origin of publication, and that at the end of each abstract indicates country of origin of work (where known).
General 11.
Vacuum
Science
14.
Production of Low Pressures
11 553. Research into the rational production of an ultra-high vacuum. H. Blank et al., ExpZZe. Tech. Phys., 12 (l), 1964, 49-57. 11 :30 554. Ultra-high vacuum chamber (lo-lo torr) for producing extremely thin films (10 atoms thick). (Great Britain) Anon., Eng. Digest, 24 (9), Sept. 1963, 103.
16.
Measurement of Low Pressure
559. Adhesive
Research
& Devel.,
17.
561. Measurement
Thermodynamics 17 : 33 for use in cryostats.
of the
vapour
density
17 : 33 in a vacuum arc.
(U.S.S.R.)
13 : 51 : 48 557. Ultra centrifuge with magnetic suspension in vacua. (Great Britain)
The rotor of this centrifuge consists of a steel ball 10 to 20 mm in diameter which floats in vacua between the poles of a vertical Rotation is produced by the magnetic field, suitably stabilized. influence of a cyclic horizontal magnetic filed, generated by a transistron with frequencies ranging from 40 to 100 kc/set. The ball can be made to rotate steadily at the rate of several million r.p.m., the actual speed being measured optically. The instrument appears to be specially suited for testing adhesion of w. J. s. coating films. (Czechoslovakia). in Engng.,
Res., 69 (2), 15 Jan. 1964,235.
The vapour density in an arc set up in a vacuum switch when interrupting a current of lO-50A in a 11OV supply was estimated from the attenuation experienced by a 4-1OkeV electron beam when passing through the arc. The beam was produced by an electron gun with electrostatic focusing and the electrons emerging were collected in a Faraday cylinder with 4 mm aperture, the effective solid angle being 0.014 sterad. The measurements were made during continuous evacuation, the pressure remaining in The average specific the region of 10-6-10-7 torr throughout. density of the vapour in the arc was estimated at 0.95-l .2 x lo6 g/cm3. This value may increase tenfold during the early stages (U.S.S.R) of degassing of the switch contacts.
14 (12), Dec. 1963, 58-60.
Vacuum Applications
Des. and Components
16 : 34 in V.H. vacuum.
powders
17 : 34 560. Emphasis on space cryogenics advances at Linde. J. F. Judge, Missiles and Rockets, 13 (13), 23 Sept. 1963, 22.
12
F. Einhorn,
of silicate
High vacuum insulated electrical feedthrough See Abstr. No. 595.
556. How to measure vacuum. (U.S.A.) D. B. Arlidge, Znstr. & ControlSystem, 36 (12), Dec. 1963, 109.
13.
behaviour
(U.S.A.) J. W. Salisbury, J. Geophys.
w. J. s.
(U.S.A.)
Gases and Solids
16 : 30 Method of obtaining metallic catalysts in the form of a film, vacuum condensed on a fine grained substrate. See Abstr. No. 621.
12 555. Calibrating vacuum gauges below lo-@ torr. (U.S.A.) The system described is the result of research associated with the development of a cold cathode ionization gauge intended to It was measure the low pressure on the surface of the moon. therefore necessary to construct vacuum systems capable of attaining pressures of lo-l2 torr or lower and devise a method of calibrating gauges at these low pressures. The author gives the lay-out of the multiple mercury diffusion pump system employed. Practically all the important components were made of Pyrex and could be baked at temperatures up to 500°C. The gauge calibrations were carried out by the so-called flow-technique, which consists in admitting gas at a known rate into a test chamber and removing it at a known rate. A capillary tube which had been carefully measured is used in these tests. According to the author absolute gas flow measurements have yielded “ believable ” calibrations of gauges in the 10-11-10-12 torr region and the method can be extended to even lower pressures once better vacuum systems can be constructed. W. Kreisman,
Kinetic Theory of Gases
14 558. Distribution of molecular flow on a surface during evaporation in vacuum. (U.S.S.R.) V. I. Lozgachev, Zhur. Tekh. Fiziki, 32 (8), 1962, 1012-1022.
(Germany)
12.
and Engineering
I. A. Lukatskaya, 703.
Zhur.
18.
Tekh.
Fiziki,
34 (4), April
1964, 694-
Gaseous Electronics 18
562. Present uses, future hopes for plasma, EB and Laser. Anon, Welding Engr., 49 (l), Jan. 1964, 35.
Sept. 1963,20-24. 243