Laser-induced chemical processing at interfaces

Laser-induced chemical processing at interfaces

Microelectronic Engineering 5 (1986) 433 North-Holland LASER-INDUCED CHEMICAL PROCESSINGAT INTERFACES Dieter Bauerle Angewandte Physik, Johannes Kepl...

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Microelectronic Engineering 5 (1986) 433 North-Holland

LASER-INDUCED CHEMICAL PROCESSINGAT INTERFACES Dieter Bauerle Angewandte Physik, Johannes Kepler Universit~t, 4040 Linz, Austria Laser-induced chemical processing (LCP) of materials is a new and interdisciplinary field1,2). The technique permits maskless single-step deposition of thin films of metals, semiconductors and insulators with lateral dimensions ranging from a few tenths of a micron up to several centimeters. Moreover, materials removal or synthesis, or surface modifications, such as oxidation, n i t r i d a t i o n , reduction, metallization and doping, are also possible within similar dimensions. Additionally, laser chemical processing is not limited to planar substrates, but permits also threedimensional fabrication. In LCP, the laser light activates or enhances a chemical reaction either at a gas- or liquid-solid interface, or within the gaseous, liquid or solid material i t s e l f . The activation of the reaction can be based on photothermal and/or photochemical mechanisms. The talk gives an overview on the various different p o s s i b i l i t i e s and limitations of LCP.

References 1) D. Bauerle: CHEMICAL PROCESSING WITH LASERS, Springer Verlag (lg86) 2) LASER PROCESSING AND DIAGNOSTICS, ed. by D. B~uerle, Springer Series in Chemical Physics, Vol. 39 (1984), and references therein

0167-9317/86/$3.50 © 1986, Elsevier Science Publishers B.V. (North-Holland)

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