New patent

New patent

Nucl. Tracks Rod&. Meas., Vol. 13, Nos 213, pp. i-ii, hr. J. Radiat. Appl. Instrum., Part D Printed in Great Britain Pergamon 1987 NEW Journals L...

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Nucl. Tracks Rod&. Meas., Vol. 13, Nos 213, pp. i-ii, hr. J. Radiat. Appl. Instrum., Part D Printed in Great Britain

Pergamon

1987

NEW

Journals

Ltd

PATENTS

This Section contains abstracts and, where appropriate, illustrations of recently issued United States patents and published patent applications filed from over 30 countries under the Patent Cooperation Treaty. This information was obtained from recent additions to the Pergamon PATSEARCH@ online database in accordance with interest profiles developed by the Editors. Further information about Pergamon PATSEARCH@ can be obtained from Pergamon Orbit InfoLine Inc., 8000 Westpark Drive, McLean, Virginia 22102 U.S.A. Copies of complete patents announced in this Section are available from Pergamon Orbit InfoLine Inc. for $8 per copy. Payment with order is required. Orders outside North America add $2 for air postage. Order by patent

number for Pergamon Orbit InfoLine only.

4640589

4644167

MICROSCOPE ILLUMINATOR

RADIATION DOSE RATE MEASURING DEVICE

William

N Reich assigned

to Spectrolyte

Inc Robert

A microscope illuminator containing an incandescent point source of illumination, an aspheric lens with heat absorbing characteristics defining an optical path for the illumination, a cut-off filter and a rotatable dichroic interference filter capable of being moved into the optical path of the illumination and capable of polarizing light as its angle of incidence with respect to the optical path is varied, a condensing lens and a rotatable mirror for receiving the polarized illumination from the dichroic filter and altering the optical path to coincide with the optical axis of a microscope. Additional filters are optionally provided.

4643799 METHOD OF DRY ETCHING Tsujii, Kanji Yusuke Murayama, Nishitama, Hitachi Ltd

Yajima, Seiichi Japan assigned to

A dry etching method according to the present invention is composed of the steps of evacuating the reaction chamber in which a substrate to be etched is set, introducing etching gas into the reaction chamber, causing the substrate to adsorb the introduced etching gas and thereafter evacuate the etching gas remaining in the reaction chamber, and irradiating the surface of the substrate to be etched with photon energy through a light window provided in the reaction chamber.

Sorber

assigned

to Duke

Power

Com-

pany A beta radiation particle detector having a housing that is substantially impervious to beta radiation particles and which surroundingly encompasses an ionization chamber which is defined by electrically conductive wails is disclosed. The walls terminate in an edge which defines an opening into the ionization chamber with the opening being covered by a beta radiation pervious electrically conductive window that entraps, within the ionization chamber, a quantity of gaseous molecules which are adapted to ionize upon impact with a beta radiation particle. An electrode is disposed within the ionization chamber and has a generally shallow concave surface having a width which is substantially greater than its depth and which faces the electrically conductive window. The concave surface of the electrode terminates in a generally annular rim that is disposed substantially adjacent to the edge of the walls so that the rim is configured to substantially conform to the electrically conductive walls so as to define a beta radiation sensitive volume generally located within the ionization chamber between the beta radiation pervious electrically conductive window and the concave surface of the electrode. A battery, for establishing an electrical potential between the electrode and the electrically conductive walls and window, is adapted, upon creation of an ion within the beta radiation sensitive volume of the ionization chamber to cause an electric current to tlow within a circuit between the walls/window and the electrode. A meter for detecting and measuring the flow of electric current in the circuit and displaying the amount of radiation dose rate present is included.

ii

New

Patents

4647420

4648950

NUCLEAR FUEL PIN SCANNER

CR-39 TRACK ETCHING AND BLOW-UP METHOD

Richard L Bramblett, Charles signed to The United States represented by the Department

A Preskitt of America of Energy

asas

Systems and methods for inspection of nuclear fuel pins to determine fissile loading and uniformity. The system includes infeed mechanisms which stockpile, identify and install nuclear fuel pins into an irradiator. The irradiator provides extended activation times using an approximately cylindrical arrangement of numerous fuel pins. The fuel pins can be arranged in a magazine which is rotated about a longitudinal axis of rotation. A source of activating radiation is positioned equidistant from the fuel pins along the longitudinal axis of rotation. The source of activating radiation is preferably oscillated along the axis to uniformly activate the fuel pins. A detector is provided downstream of the irradiator. The detector uses a plurality of detector elements arranged in an axial array. Each detector element inspects a segment of the fuel pin. The activated fuel pin being inspected in the detector is oscillated repeatedly over a distance, equal to the spacing between adjacent detector elements, thereby multiplying the effective time available for detecting radiation emissions from the activated fuel pin.

Dale Hankins assigned to The United States of America as represented by the United States Department of Energy This invention is a method of etching tracks in CR-39 foil to obtain uniformly sized tracks. The invention comprises a step of electrochemically etching the foil at a low frequency and a &37 blow-up +3X + 0 step of electrochemically etching the foil at a high frequency.+RE

4659449 APPARATUS FOR CARRYING OUT DRY ETCHING Toru Watanabe, Yokohama, Kabushiki Kaisha Toshiba

Japan

assigned

to

A dry etching apparatus according to the present invention is characterized in that an etching process is applied to a sample by using both physical etching means and chemical etching means. To perform such an etching process, the dry etching apparatus is provided with a chamber for accommodating a sample to be etched, a suction unit for reducing a pressure within the chamber, a gas introducing unit for introducing a reactive gas from the external into said chamber, an excitation unit to excite the reactive gas for producing activated species allowing the sample to be etched due to chemical reaction, and an ion irradiation unit for irradiating ions to the sample, thereby making it possible to independently control the energy or density of ions and the density of the activated species, thus setting optimum etching conditions in conformity with a material to be etched or an etching pattern.

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