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Oberflächen- und Dünnschicht-Technologie
Vacuum/volume 43/number Printed in Great Britain
0042-207x/92$5.00+.00 Pergamon Press plc
S/page 279/l 992
Book reviews Oberfliicben- und Diinnschicht-Technologie
This includes updated literature diagrams and 23 tables.
R A Haefer.
Part II : Concentrates on the various available surface modification procedures. These technologies are important in their effect on the chemical composition and microstructure in the regions close to the surface, which is of significant technological as well as economic interest. Following a brief review four chapters deal with the surface modification: by laser beams ; ion beams ; electron beams ; plasma techniques ; as well as their applications. In two further chapters, the most recent important developments in the whole surface treatment technology. i.e. for coating and surface modification, are discussed in greater detail, including the production of diamond films by plasma and ion beam technoloev and the latest methods of microtechnology; as employed in the provdction of integrated microelectronic and opto-electronic circuits ; micro-mechanical sensors, miniature cryosystems, and basic opto-electronic components. Finally, the conventional procedures for surface modification are discussed. In these chapters, the fundamental physical basis as well as the practical applications and procedures are described and aaain updated by (more than 1100) references to the literature. There is no doubt that an English translation of these two volumes would be a most useful and important basis for the current wide scale interest; particularly in industrial as well as university, technological research and development laboratories.
Teil I : Beschichtungen und Oberfliichen Springer, Berlin, 1987. ISBN 3-540-1673-4, VIII+334
pp. Price DM138.
references
(more than
1200) with 114
I
Teil II : Oberfliichenmodifikation und Quanten
durch Teilchen
Springer, Berlin, 1991. ISBN 3-540-53012-6, VII + 286 pp. Price DM 168.
The latest developments in thin film technology are the topics covered in these useful handbooks. The first volume deals with all aspects of ‘deposition of thin films on surfaces’ and the second with ‘the modification of surfaces by particles and quanta’. They provide useful monographs for specialists involved in research or industry in this field, as well as for &dents, by giving both an introduction to the fundamental aspects and a review of the manifold applications of these processes. The work was based on the author’s activity over many years in this field both in industry, lectures and tutorials at a technical university. A large number of the current highly technological applications of thin films depend in many instances on their often rather unique physical properties, particularly when they form the essential elements of microelectronic, optical, opto-electronic or magnetic components. As protective coatings to prevent wear, corrosion and oxidation at high temperature of the available rather expensive basic materials permits their rational application, cost effective production and efficient energy consumption. For example, the life time of tools and components can be increased considerably by a suitable surface coating and treatment process. There is a definite need for a concise review of the important industrial surface technological processes available, as achieved here. In view of the wide range of techniques which have been developed, it appeared convenient to divide them into these two sections : Part I : Processes for the deposition of thin films on a substrate. This covers the most important coating procedures ; apart from plasma vapour deposition-PVD-and chemical vapour deposition-CV&involving plasma polymerisation, the electrochemical and chemical coating, nonthermal and thermal spraying techniques, deposition welding, plating, immersion in molten metals, liquid quenching etc., are dealt with. Hence, following a general review of thin film coating technology, a further 14 chapters in Volume I deal with the topics : adhesive properties and microstructures of the layers and pre-treatment of substrate ; thin film measurement and surface test procedures ; plasmas and their properties used in surface technology ; evaporative coating ; sputter deposition ; ion plating ; chemical vapour deposition (CVD) ; plasma activated chemical vapour deposition (PACVD) ; electrochemical and chemical thin film coating processes ; thermal spraying methods ; welding and plating deposition ; metal coating by immersion in melts with fast solidification ; and finally thin films from organic polymers and dispersion systems.
*For details contact : RGD18, Department of Chemistry, University British Columbia, Vancouver. British Columbia. Canada V6T lY6.
of
W Steckelmacher University of Sussex
Rarefied Gas Dynamics: Proceedings of the 17th International Symposium, Aachen 1990 Edited by Alfred E Beylich, VCH Verlagsges mbh, Weinheim, ISBN 3-527-28250-5, XXIV+ 1604 pp. Price DM320.
1991
This International Symposium on Rarefied Gas Dynamics (RGD) is a biennial event, held regularly since the first one in Nice (1958), usually alternating in Europe and North America, but more recently also in Novosibirsk, USSR (1982) and in Tsukuba, Japan (1984). From the 260 papers originally submitted, the 10 invited lectures together with 190 contributed papers were selected for publication in these proceedings and arranged in 20 sections. As usual, these RGD Symposia concentrate on the fundamental aspects of the kinetic theory of matter as well as on applied research and developments, particularly in aerospace, vacuum technology, and more recently also topics such as isotope separation and gas dynamic lasers. The progress made in the treatment of non-equilibrium phenomena in these fields are reviewed in a useful in depth presentation. Typical topics involve the kinetic theory of gas flow also numerical and Monte Carlo techniques, internal as well as external flow, molecular dynamics, expansion flow, jets, molecular beams and clusters ; condensation and evaporation, surface phenomena, gas-surface interactions ; finally instrumentation developments, experimental facilities including RGD applications, are reviewed. This broad range of RGD and its application will certainly be of interest to readers from a wide field of interests in physics, chemistry, engineering and applied mathematics. Incidentally, the proceedings of all the RGD Symposia have been published, though the full details are sometimes not easy to locate. However, they are all listed at the end of the present proceedings publication. Note that the next 18th International Symposium is scheduled for 2631 July 1992, to be held at the University of British Columbia, Vancouver, Canada*. W Steckelmacher University of Sussex 279
0042-207x/92$5.00+.00 Pergamon Press plc
S/page 279/l 992
Book reviews Oberfliicben- und Diinnschicht-Technologie
This includes updated literature diagrams and 23 tables.
R A Haefer.
Part II : Concentrates on the various available surface modification procedures. These technologies are important in their effect on the chemical composition and microstructure in the regions close to the surface, which is of significant technological as well as economic interest. Following a brief review four chapters deal with the surface modification: by laser beams ; ion beams ; electron beams ; plasma techniques ; as well as their applications. In two further chapters, the most recent important developments in the whole surface treatment technology. i.e. for coating and surface modification, are discussed in greater detail, including the production of diamond films by plasma and ion beam technoloev and the latest methods of microtechnology; as employed in the provdction of integrated microelectronic and opto-electronic circuits ; micro-mechanical sensors, miniature cryosystems, and basic opto-electronic components. Finally, the conventional procedures for surface modification are discussed. In these chapters, the fundamental physical basis as well as the practical applications and procedures are described and aaain updated by (more than 1100) references to the literature. There is no doubt that an English translation of these two volumes would be a most useful and important basis for the current wide scale interest; particularly in industrial as well as university, technological research and development laboratories.
Teil I : Beschichtungen und Oberfliichen Springer, Berlin, 1987. ISBN 3-540-1673-4, VIII+334
pp. Price DM138.
references
(more than
1200) with 114
I
Teil II : Oberfliichenmodifikation und Quanten
durch Teilchen
Springer, Berlin, 1991. ISBN 3-540-53012-6, VII + 286 pp. Price DM 168.
The latest developments in thin film technology are the topics covered in these useful handbooks. The first volume deals with all aspects of ‘deposition of thin films on surfaces’ and the second with ‘the modification of surfaces by particles and quanta’. They provide useful monographs for specialists involved in research or industry in this field, as well as for &dents, by giving both an introduction to the fundamental aspects and a review of the manifold applications of these processes. The work was based on the author’s activity over many years in this field both in industry, lectures and tutorials at a technical university. A large number of the current highly technological applications of thin films depend in many instances on their often rather unique physical properties, particularly when they form the essential elements of microelectronic, optical, opto-electronic or magnetic components. As protective coatings to prevent wear, corrosion and oxidation at high temperature of the available rather expensive basic materials permits their rational application, cost effective production and efficient energy consumption. For example, the life time of tools and components can be increased considerably by a suitable surface coating and treatment process. There is a definite need for a concise review of the important industrial surface technological processes available, as achieved here. In view of the wide range of techniques which have been developed, it appeared convenient to divide them into these two sections : Part I : Processes for the deposition of thin films on a substrate. This covers the most important coating procedures ; apart from plasma vapour deposition-PVD-and chemical vapour deposition-CV&involving plasma polymerisation, the electrochemical and chemical coating, nonthermal and thermal spraying techniques, deposition welding, plating, immersion in molten metals, liquid quenching etc., are dealt with. Hence, following a general review of thin film coating technology, a further 14 chapters in Volume I deal with the topics : adhesive properties and microstructures of the layers and pre-treatment of substrate ; thin film measurement and surface test procedures ; plasmas and their properties used in surface technology ; evaporative coating ; sputter deposition ; ion plating ; chemical vapour deposition (CVD) ; plasma activated chemical vapour deposition (PACVD) ; electrochemical and chemical thin film coating processes ; thermal spraying methods ; welding and plating deposition ; metal coating by immersion in melts with fast solidification ; and finally thin films from organic polymers and dispersion systems.
*For details contact : RGD18, Department of Chemistry, University British Columbia, Vancouver. British Columbia. Canada V6T lY6.
of
W Steckelmacher University of Sussex
Rarefied Gas Dynamics: Proceedings of the 17th International Symposium, Aachen 1990 Edited by Alfred E Beylich, VCH Verlagsges mbh, Weinheim, ISBN 3-527-28250-5, XXIV+ 1604 pp. Price DM320.
1991
This International Symposium on Rarefied Gas Dynamics (RGD) is a biennial event, held regularly since the first one in Nice (1958), usually alternating in Europe and North America, but more recently also in Novosibirsk, USSR (1982) and in Tsukuba, Japan (1984). From the 260 papers originally submitted, the 10 invited lectures together with 190 contributed papers were selected for publication in these proceedings and arranged in 20 sections. As usual, these RGD Symposia concentrate on the fundamental aspects of the kinetic theory of matter as well as on applied research and developments, particularly in aerospace, vacuum technology, and more recently also topics such as isotope separation and gas dynamic lasers. The progress made in the treatment of non-equilibrium phenomena in these fields are reviewed in a useful in depth presentation. Typical topics involve the kinetic theory of gas flow also numerical and Monte Carlo techniques, internal as well as external flow, molecular dynamics, expansion flow, jets, molecular beams and clusters ; condensation and evaporation, surface phenomena, gas-surface interactions ; finally instrumentation developments, experimental facilities including RGD applications, are reviewed. This broad range of RGD and its application will certainly be of interest to readers from a wide field of interests in physics, chemistry, engineering and applied mathematics. Incidentally, the proceedings of all the RGD Symposia have been published, though the full details are sometimes not easy to locate. However, they are all listed at the end of the present proceedings publication. Note that the next 18th International Symposium is scheduled for 2631 July 1992, to be held at the University of British Columbia, Vancouver, Canada*. W Steckelmacher University of Sussex 279