Optical and structural properties of TiO2 thin films prepared by sol–gel spin coating

Optical and structural properties of TiO2 thin films prepared by sol–gel spin coating

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Optical and structural properties of TiO2 thin films prepared by solegel spin coating A. Elfanaoui a,*, E. Elhamri a, L. Boulkaddat a, A. Ihlal a, K. Bouabid a, L. Laanab b, A. Taleb c, X. Portier d a

Laboratoire Mate´riaux et Energies Renouvelables (LMER), Universite´ Ibn Zohr De´p. Physique, Faculte´ des sciences B.P.8106, Hay Dakhla, 80000 Agadir, Morocco b Centre de Microscopie, Faculte´ des sciences, Universite´ Mohamed V, 10 000 Rabat, Morocco c LECIME, Ecole Nationale Supe´rieure de Chimie de Paris, 11 rue Pierre et Marie Curie, 75231 Paris cedex 05, France d CIMAP, Ensicaen, Bd du Mare´chal Juin, 14050 Caen, France

article info

abstract

Article history:

Hydrogen is a renewable and non-polluting fuel. Its production from water using renew-

Received 16 April 2010

able energy is an attractive challenge. In this work we report some results on the prepa-

Received in revised form

ration of titanium oxide TiO2 thin films for environmental applications such as water

8 July 2010

photosplitting. TiO2 thin films have been prepared by spin coating technique of sol

Accepted 11 July 2010

precursor onto glass substrates. The deposited films were annealed at different tempera-

Available online 15 August 2010

tures in air. The X-ray diffraction (XRD) experiments show that the two well-known anatase and rutile phases were observed depending both on the conditions of deposition

Keywords:

and on the temperature of annealing. The best conditions of crystallization were found to

TiO2

be around 400  C in air. The influence of the number of deposited layer on the crystalline

Nano-particles

quality of the films was investigated. The surface morphology of the deposited film was

Anatase

characterized by atomic force microscopy (AFM) and scanning electronic microscopy

Rutile

(SEM). The UVeViseNIR spectroscopy shows that the film exhibits a high transmission around 90%. The best layers were obtained when concentrated (HCl) was added to the sol solutions. The direct band gap of the films was found to be around 3.7 eV, and their refractive index was found to vary from 2 to 2.4. Copyright ª 2010, Hydrogen Energy Publications, LLC. Published by Elsevier Ltd. All rights reserved.

1.

Introduction

Titanium oxide (TiO2) is currently the focus of intensive research thanks to the wide range of its potential applications. Thanks to its durability, non-toxicity, stability and its high refractive index, such material is a preferred material for optical purposes, white pigment, gas sensor, and corrosive-protective (for a review about TiO2 see Diebold [1]). For environmental concerns, TiO2 is extensively used for photodegradation of organic and inorganic pollutants [2], photovoltaic energy

production [3], and hydrogen production by water photosplitting [4e6]. For this later concern, the water photosplitting over semiconductor oxides yields high pure hydrogen and is the topic of many investigations that have been culminated in the publication of many articles [7]. Hydrogen is a renewable and nonpolluting fuel and its production from cheap raw materials like water using renewable energy is an attractive challenge. Because its abundance and non-toxicity, TiO2 is one of the attractive materials for such applications. TiO2 thin films have

* Corresponding author. Tel.: þ212 528220957; fax: þ212 28220100. E-mail address: [email protected] (A. Elfanaoui). 0360-3199/$ e see front matter Copyright ª 2010, Hydrogen Energy Publications, LLC. Published by Elsevier Ltd. All rights reserved. doi:10.1016/j.ijhydene.2010.07.057

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Titanium Tetraisopropoxyde

Brushing with a detergent

isopropanol

Mixing for 10min

Rinsing with bidistilled water

Concentrated hydrochloric acid HCl (0.1ml) + 0.2ml distilled water

Ultrasonic cleaning in a bidistilled water during 15 min

Mixing for 24h

Rinsing with bidistilled water

Gel

Substrat Cleaning with ultrasound in an acetone bath

Spin coating Cleaning with ultrasound in a bidistilled

Drying (70°C) for 1h

water bath.

Thermal treatment For 1h (300,350 and 400°C)

Rinsing with bidistilled

water

Stoving at 200°C (20min)

Fig. 1 e Flow chart showing the procedure for processing the TiO2 thin films (left) and substrate preparation (right).

been prepared using a variety of processes including plasma enhanced chemical vapour deposition [8] radio-frequency magnetron sputtering [5], metal organic chemical vapour deposition [9], spray pyrolysis [10,11], chemical bath deposition [12], sputtering [13], electrochemical deposition [14e16], solegel [17,18] photo-deposition [6] and cold plasma method

[19]. Non-vacuum methods are very attractive since they are cost effective, simple and suitable for large area scaling. In this work, we show that by using very simple and low cost solegel synthesis technique we can prepare granular TiO2 film.

2. A(101)

25

20

1 coating layers 3 coating layers 5 coating layers

A(215)

R(112)

A(211)

A(200)

5

A(204)R(002)

10 A(004)

I (au)

15

0 10

20

30

40

50

60

70

80

2θ (°) Fig. 2 e XRD pattern of TiO2 thin films annealed at 400  C for different thickness: 1 (red curve), 3 (blue curve) and 5 (green curve) coatings layers (For interpretation of the references to colour in this figure legend, the reader is referred to the web version of this article).

Experiments

The solegel process was used to synthesize TiO2 thin films. The alkoxide used during the current work is titanium isopropoxide TTIP (C12H28O4Ti) with purity of 99.99% which was mixed with isopropanol and hydrochloric acid (11M) as a catalyst and distilled water. The procedure of preparation includes the dissolution of 25 ml of isopropanol as solvent and 0.1 ml of hydrochloric acid (HCl), 0.2 ml of distilled water is added as well as 3.5 ml of titanium isopropoxide (C12H28O4Ti) (Fig. 1); this solution is transparent, of yellowish colour and is ready for the deposit. Thin films of TiO2 were deposited by the method of spin coating in air at room temperature, on corning glass (25  25  2 mm3) as substrate. The process of cleaning the substrate is summarized in the flow chart (Fig. 1). The films were dried at 100  C for 1 h and annealed at 300, 350 and 400  C in air during 1 h. The crystalline structure was characterized by an X-ray diffractometer (Philips PW) in 2q range from 10 to 80 by 0,02 s1 steps operating at 40 kV accelerating voltage and 40 mA current using Cu Ka radiation source. The incident angle was kept constant at 0.5 throughout the

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conditions, we observe in addition to anatase (101), (004), (200), (211), (204) and (215) the formation of rutile which crystallizes in the (002) and (112) plane parallel to the surface. We also observe that the intensities corresponding to the lines characteristic of anatase and rutile increase as the number of coating layers decreases. From the peaks intensity we can determine the variation of TiO2 amount as a function of the number of coatings layers. The grain size (L) of the prepared TiO2 thin films was obtained from XRD line broadening using the Scherrer equation: L¼

Fig. 3 e SEM micrograph of the surface of TiO2 annealed at 400  C (1 coating).

experimentation. Atomic force microscopy (AFM) measurements were performed at room temperature using a Nanoscope III instrument in a standard tapping mode to investigate the surface morphology of TiO2 spin-coated films. Scanning electronic microscopy SEM (JOEL JSM 6400 Scanning microscope) was used to study the surface morphology and pore distribution of the produced films. The transmission spectra were measured by Lambda 9 UV/VIS/NIR PerkineElmer spectrophotometer.

3.

Results and discussion

TiO2 has three well-known phases namely: Anatase, Rutile and Brookite. Rutile and Anatase are tetragonal whereas Brookite is orthorhombic. Rutile is the only stable phase whereas Anatase and Brookite are metastable at all temperatures and can be converted to rutile after heat treatment at high temperature. Fig. 2 shows the evolution of XRD pattern of (TiO2) thin films prepared with 1, 3 and 5 coatings layers on glass substrate and annealed at temperature of 400  C. These spectra show a peak corresponding to the (101) plane, which is attributed to the presence of Anatase regardless of number of coatings layers. At annealing temperatures of 400  C and for 1 and 3 coatings layers

0; 9l bcosq

A). l is the wavelength of X-ray beam (Cu Ka ¼ 1.5406 b is the full width at half maximum (FWHM) of the (hkl) diffraction peak. q is the Bragg angle. We have calculated the grain sizes of the thin films annealed at temperature of about 400  C and different numbers of coating 1 and 3. We found that the crystallinity of the obtained Anatase particles increased from 2.9 to 8.3 nm as the number of coatings layers increase, whereas the size of Rutile crystallites increases with increasing the number of coatings layers from 3.2 nm to 5.9 nm. From the obtained results, we identify the optimum conditions for complete crystallization of the prepared TiO2 films as 1 coating layer and annealing temperature of 400  C. In Fig. 3, we show SEM micrograph of TiO2 annealed film at temperature of 400  C. We can observe that the substrate is inhomogeneously covered by large aggregates with typically 10 mm wide and smooth surface with well-defined edges. The aggregates are separated by larges cracks probably formed during the drying process due to surface tension between the film and the air. Fig. 4 shows typical two- and three-dimensional AFM surface micrographs of TiO2 films prepared by 1 coating layer and annealed at temperature of 400  C. The deposited film exhibits smooth and compact granular morphology. From the AFM pattern we can observe that the film is formed by the nanoparticles of 20 nm in diameter and the corresponding average roughness is about 8.8 nm. Fig. 5 shows the typical evolution of (ahy)2 as a function of the photon energy in our films. The optical band gap value

Fig. 4 e 3D and 2D AFM images of TiO2 thin granular film recorded on the aggregates shown in Fig. 3.

i n t e r n a t i o n a l j o u r n a l o f h y d r o g e n e n e r g y 3 6 ( 2 0 1 1 ) 4 1 3 0 e4 1 3 3

[2] Carp O, Huisman CL, Reller A. Photoinduced reactivity of titanium dioxide. Prog Solid State Chem 2004;32:33e177.

2 12 -1 2 (αhυ) 10 (eV Cm )

6

4

2

3,7

0 1

2

3

4

5

hυ (eV) Fig. 5 e Evolution of (ahy)2 vs the photon energy for the film of Fig. 4.

deduced from this figure is 3.7 eV. This value is in good agreement with those published by other authors [20,21]. However, it is still higher than the optimum range for solar energy conversion. It should be reduced by adding some metallic elements such as aluminuim and silver. Such work is currently undertaken in our laboratory.

4.

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Conclusions

This study deals with the preparation and characterization of TiO2 thin films using a simple and cost effective method: solegel spin coating. The deposition was performed on glass substrates at room temperature. The effect of the number of coatings and the annealing temperature were investigated. It has been shown that the complete crystallization of the films occurs after annealing at 400  C in air. The best XRD spectra were observed on the layers prepared with one coating. SEM analyses show that the films consist of agglomeration of large particles. These particles consist of clusters of Anatase and Rutile nanoparticles as revealed by XRD characterizations. The band gap value deduced from the optical spectra using UVeViseNIR spectrometry indicates a value around 3.7 eV. This value is still higher for an efficient utilization under sun light illumination. It should be reduced by addition of some metallic elements such as aluminium or incorporation of Nitrogen in the films. Intensive works are actually undertaken in our laboratory to achieve this concern.

Acknowledgements This work was partially supported by the CNRST/CNRS cooperation program (Chimie 05/06, 05/07, 05/08 and SPM05/09).

references

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