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Photoelectric conversion device
Vacwmlvolume 39lnumber Printed in Great Britain
G/pages
0042-207X/89$3.00+.00
i to v/l 989
Pergamon
NEW PATENTS This Section contains abstracts and, where appropriate, illustrations of recently issued United States patents and published patent applications filed from over 30 countries under the Patent Cooperation Treaty. This information was obtained from recent additions to the Pergamon PATSEARCH ’ online database in accordance with interest profiles developed by the Editors. Further information about Pergamon PATSEARCH” can be obtained from Pergamon Orbit InfoLine Inc., 8000 Westpark Drive, McLean, Virginia 22102 U.S.A. Copies of complete patents announced in this Section are available from Pergamon Orbit InfoLine Inc. for $8 per copy. Payment with order is required. Orders outside North America add $2 for air postage. Order by patent number for Pergamon Orbit InfoLine only. Please note that the following items are reproduced result in some slight ambiguities (e.g. SiO, appears
directly from a computerised as Si02).
database.
This may occasionally
4781358
4781767
APPARATUS FOR MONITORING AN ARTICLE IN SINTERING FURNACE
PHOTOELECTRIC CONVERSION DEVICE
John
Langan
An apparatus for measuring and regulating the variable pressure furnace gas chemistry is described. The apparatus uses a mass spectrometer for measurements, in the preferred form of the invention, in which gas species percent composition is obtained quantitatively independent of total furnace pressure variation. Using such a real time measurement capability, active control of batch process furnace operations is possible by intrinsic measurement of the part outgassing rather than by assumption of batch part status as a function of extrinsic parameters such as temperature and total pressure. Thus, by a combination of batch process temperature ramp control and variable admittance of suitable gas into the furnace,uniform batch processing is possible by closed loop control, due to renormalization of furnace residual gas chemistry from day to day drift and from batch part chemistry variation. Quantitative measurements of the variable residual pressure is made possible by adjusting in real time the throughput into the mass spectrometer independent of the total pressure variation in the furnace. These measurement means also make possible the real time determination of sinter part densification in vacuum furnaces by measurement of the part outgassing attenuation during pore closure.
Kohji Toda, Kohji Takahashi, Yasuo Niwa, Yokosuka, Japan assigned to TDK Corporation A photoelectric conversion device in which a thin crystalline Pb-Cr oxide film is formed on the surface of a substrate and a pair of spaced apart conductive film electrodes are formed on the thin film. The thin crystalline Pb-Cr oxide film is formed by a vacuum evaporation process using a sintered body prepared from PbO and Cr203 as a target and heat treating the thin film in an atmosphere containing Pb.
4782267 IN-SITU WIDE AREA VACUUM ULTRAVIOLET LAMP George Applied
J Collins, Zeng-qi Electron Corporation
Yu
assigned
to
An open wide area vacuum ultraviolet lamp for use in microelectronics processing applications employes a ring-shaped cold cathode to produce a trapped electron beam discharge of generally disc-shaped cross section in a low pressure molecular gas environment and without the use of VUV windows.
Press plc
G/pages
0042-207X/89$3.00+.00
i to v/l 989
Pergamon
NEW PATENTS This Section contains abstracts and, where appropriate, illustrations of recently issued United States patents and published patent applications filed from over 30 countries under the Patent Cooperation Treaty. This information was obtained from recent additions to the Pergamon PATSEARCH ’ online database in accordance with interest profiles developed by the Editors. Further information about Pergamon PATSEARCH” can be obtained from Pergamon Orbit InfoLine Inc., 8000 Westpark Drive, McLean, Virginia 22102 U.S.A. Copies of complete patents announced in this Section are available from Pergamon Orbit InfoLine Inc. for $8 per copy. Payment with order is required. Orders outside North America add $2 for air postage. Order by patent number for Pergamon Orbit InfoLine only. Please note that the following items are reproduced result in some slight ambiguities (e.g. SiO, appears
directly from a computerised as Si02).
database.
This may occasionally
4781358
4781767
APPARATUS FOR MONITORING AN ARTICLE IN SINTERING FURNACE
PHOTOELECTRIC CONVERSION DEVICE
John
Langan
An apparatus for measuring and regulating the variable pressure furnace gas chemistry is described. The apparatus uses a mass spectrometer for measurements, in the preferred form of the invention, in which gas species percent composition is obtained quantitatively independent of total furnace pressure variation. Using such a real time measurement capability, active control of batch process furnace operations is possible by intrinsic measurement of the part outgassing rather than by assumption of batch part status as a function of extrinsic parameters such as temperature and total pressure. Thus, by a combination of batch process temperature ramp control and variable admittance of suitable gas into the furnace,uniform batch processing is possible by closed loop control, due to renormalization of furnace residual gas chemistry from day to day drift and from batch part chemistry variation. Quantitative measurements of the variable residual pressure is made possible by adjusting in real time the throughput into the mass spectrometer independent of the total pressure variation in the furnace. These measurement means also make possible the real time determination of sinter part densification in vacuum furnaces by measurement of the part outgassing attenuation during pore closure.
Kohji Toda, Kohji Takahashi, Yasuo Niwa, Yokosuka, Japan assigned to TDK Corporation A photoelectric conversion device in which a thin crystalline Pb-Cr oxide film is formed on the surface of a substrate and a pair of spaced apart conductive film electrodes are formed on the thin film. The thin crystalline Pb-Cr oxide film is formed by a vacuum evaporation process using a sintered body prepared from PbO and Cr203 as a target and heat treating the thin film in an atmosphere containing Pb.
4782267 IN-SITU WIDE AREA VACUUM ULTRAVIOLET LAMP George Applied
J Collins, Zeng-qi Electron Corporation
Yu
assigned
to
An open wide area vacuum ultraviolet lamp for use in microelectronics processing applications employes a ring-shaped cold cathode to produce a trapped electron beam discharge of generally disc-shaped cross section in a low pressure molecular gas environment and without the use of VUV windows.
Press plc