Photoemission from Ne, Ar, Kr, and Xe layers on Ni(110) and Ga films

Photoemission from Ne, Ar, Kr, and Xe layers on Ni(110) and Ga films

A79 tion of the two-atom problem leads to quite good agreement with the Monte Carlo results previously obtained by Stensgaard. Feldman and Silverman (...

30KB Sizes 2 Downloads 99 Views

A79 tion of the two-atom problem leads to quite good agreement with the Monte Carlo results previously obtained by Stensgaard. Feldman and Silverman (SFS). The large parameter limit is studied within the continuous charge model. It is shown that an interpolation of two curves reproduces the universal curve given by SFS.

Surface Science 114 (1982) 683-691 North-Holland Publishing Company

683

PHOTOEMISSION FROM Ne, Ar, Kr AND Xe LAYERS ON Ni(ll0)

AND

K. JACOBI,

Ga FILMS Ya-po

HSU

and H.H.

ROTERMUND

Fritz-Haber-lnstitut der Max-Planck-Gesellschaft, Faradavweg 4-6, D-IO00 Berlin 33, West Gerrnatlv Received 3 July 1981; accepted for publication 14 October 1981 U P spectra were measured for rare gas monolayers of Ne, Ar, Kr and Xe using Hel (21.2 eV) light. For Ar and Kr the binding energy of the valence p electrons does not depend on the metal if it is referred to the vacuum level of the bare metal surface. For Xe the remaining binding energy differences demonstrate an influence of the metal on the initial state. A Ne layer was prepared for the first time on a clean nickel single crystal surface. It behaved in similar fashion to Ar and Kr. For second layers of the other three gases the binding energy was shifted by 0.8 eV to higher values upon both metals. It is argued that this change can be due to a change of the vacuum level to which the different layers are attached instead of a difference in shielding of the final state.