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Granted in the Metal Finishing Field Compiled by Anselm Kuhn; E-mail,
[email protected]
METAL F I N I S H I N G PATENTS PUBLISHED IN DECEMBER 2 0 0 3 PROCESS FOR |N-SITU ELECTROFORMING A STRUCTURAL LAYER OF METALLIC MATERIAL TO AN OUTSIDE WALL OF A METAL TUnE
US 2003234181 Brooks, I.; Palumbo, G. METHOD OF DEPOSITING EPITAXIAL LAYERS ON A SUBSTRATE
US. 6,670,308 (UT Battelle LLC) Goyal, A. ATOMIC LAYER DEPOSITION METHOD USING A NOVEL GROUP I V METAL PRECURSOR
US 6669990 (Samsung Electronics Co. Ltd.) Cho, YJ.; Kim, D.S. METHOD FOR PRODUCING BY EVAPORATION A FUNCTIONALLY GRADED COATING WITH AN OUTER CERAMIC LAYER ON A METAL SUUSTRATE
US 6669989 (Internat. CT For Electron Beam) Nerodenko, L.M. HARDWARE ASSEMBLY FOB C V I / C V D
PROCESSES
US 6669988 (Goodrich Corp..) Bazshushtari, A.; Daws, D. PROCESS FOR ETCHING BISMUTH-CONTAINING OXIDE FILMS
US 6669857 (Infineon Technologies AG) Hintermaier, F. METHOD FOR HIGH DEPOSITION RATE SOLDER ELECTROPLATING ON A MICROELECTRONIC WOBKPIECE
US 6669834 (Semitool Inc..) Ritzdorf, T.L.; Conrady, S. Method, chemistry, and apparatus for selectively electrodepositing tin-lead solder bumps and other structures at a high deposition rate onto a microelectronic device from a workpiece, such as a semiconductor wafer. Apparatus comprises a reactor chamber containing an electroplating solution having free ions of tin and lead for plating onto the workpiece. A chemical delivery system is used to deliver the electroplatApril 2004
ing solution to the reactor chamber at a high flow rate. A workpiece support is used that includes a contact assembly for providing electroplating power to a surface at a side of the workpiece that is to be plated. The workpiece is electrically contacted at a large plurality of discrete contact points, isolated from exposure to the electroplating solution. An anode, preferably a consumable anode, is spaced from the workplece support within the reaction chamber and is in contact with the electroplating solution. A methane sulfonic acid electrolyte may be used. SELF-HEALING NON-CHROMATE CONVERSION COATINGS FOR ALUMINUM AND ITS ALLOYS
US 6669786 (Concurrel~t Technologies Corp.~ Sampath, K. Chromate-replacement coatings for aluminum and its alloys includes forming a boehmite coating. Layer with A1 (III) ions on an aluminum surface, and applying an ionic conversion coating solution to the coating layer. The ionic conversion coating solution comprises hexavalent and trivalent ions. The trivalent ions are selected from the group consisting of Ce, Ga, Mn, Sc, Ti, Te and V. The hexavalent ions are selected from the group consisting of Mn, Mo, Se and W. The resulting coatings claim to provide corrosion resistance and self-healing effect in any defects present in the coatings. PRETREATMENT FOR ALUMINUM AND ALUMINUM ALLOYS
US 6669764 (US Navy) Matzdorf, C.A.; Nickerson, Jr W. Pretreated aluminum and aluminum alloys and the process and composition for pretreating them to provide a coating with color recognition for identification purposes and to improved the corrosion-resistance, electrical conductivity, and adhesion properties which comprises pretreating aluminum and its alloys with an effective amount of an acidic aqueous solution having a pH ranging from about 2.5 to 5.5 comprising water soluble trivalent chromium compounds, alkali metal hexafluorozirconates, divalent zinc compounds, alkali metal fluoro-com67
pounds, and effective a m o u n t s of w a t e r soluble thickeners, surfactants or wetting agents. SYSTEMS AND METHODS OF MONITORING THIN FILM DEPOSITION
US 6668618 (Agilent Technologies Inc.) Karlquist, R.K.; Larson, III METHOD OF | N - S r r g MONITORING OF THICKNESS AND COMPOSITION OF DEPOSITED FILMS USING HAMAN SPECTROSCOPY
US 6667070 (Advanced Micro Devices Inc.) Adem, E. CHEMICAL VAPOR DEPOSITION APPARATUS AND CHEMICAL VAPOR DEPOSITION
US 6666921 (Japan Pionics) Takamatsu, Y.; Mori, Y. GAS COLLECTOR FOR PROVIDING AN EVEN FLOW OF GASES THROUGH A REACTION CHAMBER OF AN EPITAXlAL REACTOR
US 6666920 (ITT MFG Enterprises Inc.) Sillmon, R.; Nguyen, K.V.
METHOD OF FABRICATING DAMASCENE STRUCTURES IN MECHANICALLY WEAK INTERLAYER DIELECTRICS
US 2003234182 Andryushchenko, T N o N - T o x I c CORROSION-PROTECTION CONVERSION COATS BASED ON COBALT
US 2003234063 Phelps, A. W.; Swartzbaugh, J. T et al. Conversion coatings based on cobalt are described for substrate metals such as aluminum, zinc, magnesium, titanium, cadmium, silver, copper, tin, lead, cobalt, zirconium, beryllium, or indium, their alloys, or items coated with these metals. The conversion coating contains a trivalent or t e t r a v a l e n t cobalt/valence stabilizer complex. The coating bath m a y also contain a preparative agent or solubility control agent. The oxidized cobalt is present in the coating in a "sparingly soluble" form. The valence stabilizers can be either inorganic or organic in nature. Cobalt/valence stabilizer combinations are chosen b a s e d on the well-founded principles of cobalt coordination chemistry. A n u m b e r of cobalt/valence stabilizer combinations that match
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