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Radiation-sensitive composition
least one ultraviolet-curing unsaturated bond in its molecule, said compound being a reaction product of a dibasic acid anhydride with a (meth)acrylate compound, a base selected from the group consisting of alkanolamines. ammonia, alkylamines. alkylene polyamines, morpholine, piperidine, NaOH, LiOH, and KOH, and a polymerization initiator. and having a viscosity of IO centipoises or less. to the surface of a copper-foil laminated substrate by :nk-jet printing; drying the composition pntternwise imparted, to evaporate its ac,ueous carrier. followed by exposure to ultraviolet rays to form an etching resist pattern, etching the copper foil; and removing the etching resist pattern.
Deposition Aluminum
of a Ti/TiN/Ti Underlayer
U.S. Patent5,738,917. Apr. 14, 1998 PR Besser and KQ. Jran, assignors to Advanced Micro Devices Inc.. Sunnyvale, Calif.
A method for depositing Ti: TiN, ;md Ti comprising placing a sample in a
echo 1026 HansonCourt Milpitas, CA 95035 order L;le: 800-878-6924 408-945-0325 Fax 408-945-0336 Circle
033
on reader
sample: terminating the plasma in the chamber; decreasing the flow rate of argon gas; introducing N, gas to form TiN on the target; depositing TiN, without removing the sample from the chamber, on the Ti deposited on the sample; removing the N, gas; and depositing Ti, without removing the sample from the chamber, on the TiN.
Cationic Electrodepositable Coating Composition U.S. Patent 5,739,185. Apr. 14, 1998 H. Haneishi ef a/., assignors to Kansai Paint Co. Ltd., Japan
A cationic electrodepositable coating ‘composition comprising a polyurethanemodified epoxy resin-amine adduct obtained by a reaction of a polyurethane compound having one terminal isocyanate group and at least one blocked isocyanate in the molecule; a bisphenol epoxy resin having at least two epoxy groups in the molecule; and an active-hydrogen-containmg amine compound and a nonionic filmforming resin.
Radiation-Sensitive Composition U.S. Patent 5,738,972. Apr. 14, 1998 M Padmanaban ef al, assignors to Hoecbst Ltd., Tokyo
Japan
A radiation-sensitive composition comprising in admixture a binder insoluble in water and soluble in an aqueous alkali solution or swellable in an aqueous alkali solution; optionally a crosslinking agent or a dissolution inhibitor; a photosensitive compound capable of generating an acid upon exposure to actinic radiation; a base capable of degrading into a neutral compound upon exposure to actinic radiation; and a phenolic compound in an amount effective to improve the resolution and depth of focus
Humidity-Resistant Compositions
Coating
U.S. Patent 5,739,194.Apr. A. Natesh et al., assignors Pittsburgh
14, 1998 to PPG lndusfries
Inc.,
A water-reducible chain-extended polyurethane-acrylic resin, which comprises 50 to 90% by weight of a polyurethane that is substantially free of silane groups and IO to 50% of the free radical polymerization product of a mixture of vinyl monomers.
supply 5375 W. 86th St. IN 46268 Order Indianapolis, Line: 800-783-2461 317-876-8848 Fax: 317-875-0035 information
card
ZALL TODAYFORA QUOTATION. ,
1800) 423-2380 ?O. BOX750338
l l
Circle
FAX(707) 7784691 PETALUMA,CA94975 021 on reader
information
METAL FINISHING
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13
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card
SEPTEMBER 1998
Deposition Aluminum
of a Ti/TiN/Ti Underlayer
U.S. Patent5,738,917. Apr. 14, 1998 PR Besser and KQ. Jran, assignors to Advanced Micro Devices Inc.. Sunnyvale, Calif.
A method for depositing Ti: TiN, ;md Ti comprising placing a sample in a
echo 1026 HansonCourt Milpitas, CA 95035 order L;le: 800-878-6924 408-945-0325 Fax 408-945-0336 Circle
033
on reader
sample: terminating the plasma in the chamber; decreasing the flow rate of argon gas; introducing N, gas to form TiN on the target; depositing TiN, without removing the sample from the chamber, on the Ti deposited on the sample; removing the N, gas; and depositing Ti, without removing the sample from the chamber, on the TiN.
Cationic Electrodepositable Coating Composition U.S. Patent 5,739,185. Apr. 14, 1998 H. Haneishi ef a/., assignors to Kansai Paint Co. Ltd., Japan
A cationic electrodepositable coating ‘composition comprising a polyurethanemodified epoxy resin-amine adduct obtained by a reaction of a polyurethane compound having one terminal isocyanate group and at least one blocked isocyanate in the molecule; a bisphenol epoxy resin having at least two epoxy groups in the molecule; and an active-hydrogen-containmg amine compound and a nonionic filmforming resin.
Radiation-Sensitive Composition U.S. Patent 5,738,972. Apr. 14, 1998 M Padmanaban ef al, assignors to Hoecbst Ltd., Tokyo
Japan
A radiation-sensitive composition comprising in admixture a binder insoluble in water and soluble in an aqueous alkali solution or swellable in an aqueous alkali solution; optionally a crosslinking agent or a dissolution inhibitor; a photosensitive compound capable of generating an acid upon exposure to actinic radiation; a base capable of degrading into a neutral compound upon exposure to actinic radiation; and a phenolic compound in an amount effective to improve the resolution and depth of focus
Humidity-Resistant Compositions
Coating
U.S. Patent 5,739,194.Apr. A. Natesh et al., assignors Pittsburgh
14, 1998 to PPG lndusfries
Inc.,
A water-reducible chain-extended polyurethane-acrylic resin, which comprises 50 to 90% by weight of a polyurethane that is substantially free of silane groups and IO to 50% of the free radical polymerization product of a mixture of vinyl monomers.
supply 5375 W. 86th St. IN 46268 Order Indianapolis, Line: 800-783-2461 317-876-8848 Fax: 317-875-0035 information
card
ZALL TODAYFORA QUOTATION. ,
1800) 423-2380 ?O. BOX750338
l l
Circle
FAX(707) 7784691 PETALUMA,CA94975 021 on reader
information
METAL FINISHING
l
13
.:, : ,:: .,,., :g, . .‘,“” ; .:.,
card
SEPTEMBER 1998