Reactive sputtering of thin films and investigation of their properties

Vacuum/volume 34/number Printed in Great Britain

12lpage

106711984

0042-207Xf84S3.00 + .OO Pergamon Press Ltd

Abstracts Electron VVBashenko,

beams as a welding

source

Department of Equipment and Technology of Welding Production, Leningrad Polytechnic Institute, Leningrad 195251. USSR

Electron beams as a welding source Electron beam (EB) welding is now a widely applied technology. The technique has a number of advantages including precise control over the position of the electron beam and of the total and specific heat applied to the metal to be welded. This paper reviews

selected aspects of electron beam welding. Particular attention is paid to heat flow and emission during the welding process and to metal transfer and heat distribution in the molten bath. A discussion is also given of the plasma formed i? ,the welding chamber during EB welding and the use of plasma parameters for the control and regulation of welding.

Reactive sputtering of thin films and investigation of their properties K Reichelt,

lnstitut fiir Festkorperforshung,

Kernforschungsanlage,

The basic processes of sputtering are considered with particular attention to the bombardment and backsputtering of a growing film by neutral Ar atoms. This bombardment can cause a deficiency of the film component with the higher sputtering efficiency but the effect may be controlled by altering the total

Julich 05170

Julich, West Germany

pressure in the sputtering chamber, i.e. by altering the average mean free path. Thus from a single compound target of fixed composition, films of varying composition can be produced. The influence of the substrate on the composition and structure of deposited thin films has also been investigated.

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