Recent patents on microelectronics

Microelectronics and Reliabilit). Vol. 17. pp. ,409 to 412. Pergamon Press, 1978. Printed in Great Britain

lq E C E N T P A T E N T S ON MICR O E L E C T R O N I C S P a t i n e t e l L i m i t e d p e r u s e a p p r o x i m a t e l y 900 U n i t e d K i n g d o m p a t e n t s e a c h w e e k and s u p p l y a h i g h - s p e e d p a t e n t a l e r t i n g s y s t e m to e l e c t r o n i c s u s e r s . The following brief abstracts on m i c r o e l e c t r o n i c s h a v e b e e n s e l e c t e d f r o m t h e i r w e e k l y b u l l e t i n a n d a r e p u b l i s h e d by c o u r t e s y of P a t i n t e l L i m i t e d , 13 N o r t h A v e n u e , G o s f o r t h , N e w c a s t l e on T y n e NE3 4DT.

F i l m Circuits:

Descrl p__tion_

Patentee

Date

Number

5/1/78

1496994

Thick film paste including a base metal powder, boron powder, and a liquid vehicle

Engelhard Mineral & Chemicals Corpn.

12/1/78

1497583

Thin film circuit including a first resistive f i l m w i t h c o n d u c t i v e c o n t a c t s t h e r e o n and a s e c o n d r e s i s t i v e f i l m o v e r l y i n g a r e a s of t h e f i r s t f i l m and the conductive film

Standard Telephones & Cables Ltd.,

1497586

Process for monitoring surface resistivity d i s t r i b u t i o n of v a c u u m d e p o s i t e d m e t a l s

Sierracin Corpn.

Z5/I/78

1498637

Circuit assembly including a ceramic or glass s u b s t r a t e w i t h f i l m e l e m e n t s t h e r e o n and p r o v i d e d with contact e l e m e n t s having opposed s p a c e d a p a r t f l a n k s e m b r a c i n g one edge of t h e substrate

S i e m e n s AG.

1/2/78

1499364

Vaporising crucible for v a c u u m vapour deposition equipment

Leybold Heraeus V e rwaltung GmbH

1499965

Passive microcircuit including a metal substrate with a dielectric layer of the metal thereon, circuit elements being deposited on the dielectric layer

G. G. S m o l k o and others

1500414

Crucible for use in the v a c u u m deposition of thin films

Xerox Corpn.

8/Z/78

Semiconductors and Devices: .

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5/1/78

12/1/78

18/1/78

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1496814

S e m i c o n d u c t o r device and p a r t i c u l a r l y f e a t u r e s of a p a s s i v a t i n g p o l y c r y s t a l l i n e s i l i c o n l a y e r

Sony C o r p n .

1497191 1497192 1497193

B o r o n d o p i n g of s e m i c o n d u c t o r s

Owens -Illinois Inc.

1497199

M e t h o d of f o r m i n g a r e c e s s e d s i l i c o n d i o x i d e i s o l a t i o n r e g i o n in a m o n o c r y s t a l l i n e s i l i c o n body

I B M Corpn.

1497457

M e t h o d of c a r r y i n g out l i q u i d p h a s e e p i t a x i a l g r o w t h f o r t h e m a n u f a c t u r e of a s e m i c o n d u c t o r device

Nippon Telegraph & Telephone Public Corpn.

1497499

P r o c e s s f o r p r o d u c i n g a d i e l e c t r i c r e g i o n in t h e s u r f a c e of a s i l i c o n s u b s t r a t e

IBM Corpn.

1497566

A p p a r a t u s f o r n o n - c r u c i b l e low m e l t i n g of crystalline semiconductor rod

S i e m e n s AG.

1497626

I n s u l a t e d gate field effect t r a n s i s t o r

IBM Corpn.

1498085

I m p r o v e d i n d u c t i o n h e a t i n g coil f o r n o n - c r u c i b l e z o n e m e l t i n g of s e m i c o n d u c t o r r o d s

S i e m e n s AG.

409

410

2511178

112178

Recent Patents on Microelectronics 1498096

M e t h o d of f o r m i n g a r e s i n f i l m on a s e m i c o n d u c t o r b o d y f o r s t a b l i s i n g t h e s u r f a c e of t h e s e m i conductor device

Hitachi Ltd.

1498159

M e t h o d of m a n u f a c t u r i n g a s e m i c o n d u c t o r d e v i c e particularly a bipolar transistor with reduced p r o b l e m of p h o t o m a s k a l i g n m e n t

Yanushoni s, S. S. Bel Y a u s k a s and others

1498266

Method for producing purified silicon material for semiconductor devices

Texas Instruments Ltd.

1498288

M e t h o d of p r e p a r i n g cadmium telluride

F i z - T a k h Inst I m Af loffe Akad Nauk SSSR

1498326

Thyristor particularly having a semiconductor e l e m e n t w i t h f o u r z o n e s of a l t e r n a t i n g c o n d u c t ivity type

Siemens AG.

1498374

Cadmium telluride semiconductor

Commissariat a L'Energie Atomique

1498459

Growing semiconductor

1498925

M e t h o d of m a n u f a c t u r i n g s e m i c o n d u c t o r d e v i c e s b y p r o v i d i n g a l a y e r of s e m i c o n d u c t o r m a t e r i a l o n a s o l i d s u b s t r a t e b y s o l i d i f i c a t i o n of m o l t e n semiconductor material

Phiiips Electronic & Assoc. Industries Ltd.

1498928

Process for unsoldering a semiconductor in the flip-chip technique

Siemens

1499030

M e t h o d of b o n d i n g a m e t a l a r t i c l e h a v i n g a c o p p e r s u r f a c e l a y e r to a g l a s s a r t i c l e a n d a p p l i c a b l e i n t h e e n v e l o p i n g of s e m i c o n d u c t o r di ode s

Philips Electronic & Assoc. Industries Ltd.

1499090

Insulated gate field effect transistor manufacture

IBM

1499267

Voltage controlled resistance two field effect transistors

1499289

Apparatus for growing a ribbon of crystalline silicon f r o m a melt

IBM Corpn.

1499455

M e t h o d and circuit a r r a n g e m e n t for propagating potential inversion wells in semiconductor bodies

IBM

1499490

P r o c e s s for polishing semiconductor

Wacker

doped s i n g l e c r y s t a l s

single crystal

of

intrinsic

epitaxial film

Phizi Inst. ImPN Lebedeva Akad N a u k SSSR

module

and

incorporating

surfaces

AG.

Corpn.

International Standard Electric Corpn,

Corpn. -

Chemitronic Ges Fur Elektr onik G r u n d -Stoffe MBH 1499548

Gomplementary insulated gate field effect transistor structure and process for fabrication

Fairchild Camera & In strument Corpn.

1499561

Semiconductor heterojunction m e t h o d of f a b r i c a t i o n

University of Connecticut

structure

and

411

Recent Patents on Microelectronics

812178

1512178

22/2/78

1499847

M e t h o d of s e l e c t i v e l y r e m o v i n g m a t e r i a l f r o m t h e s u r f a c e of a w o r k p i e c e , s u c h a s a s e m i conductor w a f e r , b y sputter etching

Western Electric Co. Inc.

1499848

Recessed oxide n-channel and fabrication

IBM Corpn.

1499857

Method and arrangement for plasma etching a l u m i n i u m f i l m s c a r r i e d on s o l i d s u b s t r a t e s , eg. in semiconductor processing

Standard Telephones & Cables Ltd.

1499889

High frequency semiconductor p a r t i c u l a r l y a p a c k a g e f o r it

R C A Corpn.

1500238

Masing layer for a semiconductor m e t h o d of p r o v i d i n g it

1500325

Localised ballasting such as transistors,

1501114

M e t h o d of e t c h i n g s i l i c o n i n a c o n t r o l l e d m a n n e r f o r m a k i n g a patterned p o l y c r y s t a l l i n e silicon layer in a semiconductor device

R CA Corpn.

1501158

P r o c e s s f o r t h e p r o d u c t i o n of a m u l t i l a y e r structure in semiconductor chips

Siemens

1501187

Lead frame

Tokyo Shibaura Electric Co. Ltd.

1501194

Photoresist process applicable for use in processing semiconductor wafers

IBM Corpn.

1501245

Method of gettering contaminants in a silicon body in semiconductor processing

IBM Corpn.

1501249

Field effect transistor

I B M Corpn.

1501477

Method for removing copper contaminant semiconductor surfaces

1501020

M e t h o d of m a n u f a c t u r i n g a s e m i c o n d u c t o r c o m p o n e n t a n d p a r t i c u l a r l y m o u n t i n g of a s e m i c o n d u c t o r d e v i c e on a h e a t s i n k

Texas Instruments Ltd.

1501693

Apparatus for automatically of s e m i c o n d u c t i v e m a t e r i a l

C a n o n K , K.

1502165

Semiconductor device including two semiconductor regions spaced from one another by a distance s m a l l e r t h a n t h e d i f f u s i o n l e n g t h of m i n o r i t y carriers in the first region

Sony Corpn.

1502230

F o r m a t i o n of a c o n d u c t i v e p a t t e r n conductor substrate

IBM Corpn.

1501894

M e t h o d of m a n u f a c t u r i n g

1501896

M e t h o d of m a n u f a c t u r i n g a h i g h p o w e r s e m i conductor device, particularly a transistor structure

IBM Corpn,

1502066

Controllable semiconductor component including two tapered metal bodies with a semiconductor element located therebetween

Siemens AG.

1502087

M e t h o d of p r e p a r i n g a s e m i c o n d u c t o r c o m p o u n d by synthesis and applicable to the preparation of a c r y s t a l l i n e g a l l i u m a r s e n i d e b o d y

Philips Electronic & ASSOC. Industries Ltd.

1502229

P r o c e s s f o r t h e p r o d u c t i o n of a n i n v e r s e l y operated planar transistor in a semi-conductor body

Siemens

field effect transistor

device and body and

of s e m i c o n d u c t i n g d e v i c e s to reduce localised heating

for a semiconductor

device

structure from

orienting a wafer

on a s e m i -

a power transistor

IBM Corpn. R CA Corpn.

AG.

I B M Corpn.

IBM Corpn.

AG.

412

Recent Patents on Microelectronics

I_~_t_~$ _=_~_t~ a_ci_~_¢_~jt ~_2/5/78

1496958

P h o t o r e s i s t e l e m e n t s p e c i a l l y c a p a b l e of f o r m i n g a m e t a l l i c i m a g e a n d a p p l i c a b l e to integrated circuit production

Fuji Photo F i l m Co. L t d .

IZ/I/78

149743Z

Apparatus for producing masks, particularly for integrated circuit manufacture

Thomson-CSF

1497779

M e t h o d of m a k i n g a s e m i c o n d u c t o r i n t e g r a t e d circuit utilising photoreist techniques

IBM Corpn.

1497892

I n t e g r a t e d c i r c u i t of t h e m e r g e d t r a n s i s t o r l o g i c or i n t e g r a t e d i n j e c t i o n l o g i c t y p e

IBM Corpn.

18/i/78

14983Z9

P r o c e s s f o r f o r m i n g a m e t a l p a t t e r n on a substrate for integrated circuit devices

IBM Corpn.

Z5/I/78

1498940

Semiconductor charge transfer device for s t o r i n g or d e l a y i n g a n a l o g u e o r d i g i t a l s i g n a l s

National Research Development Gorpn.

1499Z94

M e t h o d of m a k i n g a m a s k f o r u s e in p h o t o l i t h o g r a p h i c t r a n s f e r of a p a t t e r n by x - r a y s or other radiation, in semiconductor integrated c i r c u i t s and m i n i a t u r e e l e c t r o n i c c o m p o n e n t manufacture

IBM Gorpn.

I/Z/78

1499358

I n t e g r a t e d c i r c u i t p a c k a g e a n d m e t h o d of manufacture

Burroughs Corpn.

8/Z/78

15005Z9

M e t h o d of m a k i n g a p a t t e r n e d e t c h - r e s i s t a n t m a s k a p p l i c a b l e in i n t e g r a t e d c i r c u i t manufacture

IBM Gorpn.

1500 541

M e t h o d of p r o d u c i n g p o s i t i v e w o r k i n g e l e c t r o n resist coatings

M u l l a r d Ltd.

1500606

Electron beam positive resist method

I B M Corpn.

1500959

Arrangement for exposing a light sensitive l a y e r t h r o u g h a m a s k f o r t h e m a n u f a c t u r e of an integrated circuit

I B M Corpn.

1501Z15

Space-charge-limiter circuit

I B M Corpn.

1501Z79

n-scale counter including insulated gate field effect t ransistors

Tokyo Shibaura E l e c t r i c Co. Ltd.

1501483

T e c h n i q u e f o r i s o l a t i n g e l e m e n t s in a s e m i c o n d u c t o r i n t e g r a t e d c i r c u i t f r o m one a n o t h e r during manufacture

Hitachi Ltd.

1501908

A u t o m a t i c p o s i t i o n i n g of i m a g e a n d / o r o b j e c t s u r f a c e s in o p t i c a l a p p a r a t u s u s e d in t h e p r o j e c t i o n c o p y i n g of m a s k s on s e m i c o n d u c t o r wafer s for integrated circuits

I B M Corpn.

150ZIZZ

High voltage, high power integrated semiconductor device

R C A Corpn.

150Z130

Integrated circuit device incorporating complementary field effect t'ransistors

I B M Corpn.

15/Z/78

ZZ/Z/78

transistor integrated