Equipment & Materials Processing
Semiconducting form of nitrogen discovered at 1.4m atmospheres T h e new, d e n s e form o f nitrogen stores a large a m o u n t o f e n e r g y
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a n d c o u l d potentially s e r v e as a
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n e w s e m i c o n d u c t i n g material. For years, t h e o r i s t s h a v e pred i c t e d that m o l e c u l a r n i t r o g e n
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(N2) w o u l d b e c o m e e i t h e r a s e m i c o n d u c t o r o r a m e t a l at p r e s s u r e s o f a b o u t 100 GPa.
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A similar t h e o r y h o l d s for gaseous hydrogen, which u n d e r similarly h i g h p r e s s u r e s is e x p e c t e d to t u r n into solid metallic h y d r o g e n (yet to b e
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p r o d u c e d in t h e lab). However, r
previous experiments have b e e n limited in p r e s s u r e a n d in
240
the number of measurements
Pressure, GPa
performed under pressure.
Graph showing the sharp reduction in resistance of nitrogen at pressures from 140 GlgaPascals (1.4 million atmospheres) up to at least 240 GPa.
Newly developed techniques allowed m e a s u r e m e n t o f electrical c o n d u c t i v i t y at v e r y h i g h
With s u p p o r from t h e National
semiconducting from pressures
Science Foundation's Division
of 140 GigaPaseals (1.4m atmos-
s e m i c o n d u c t i n g form of nitrogen
o f Materials Research, Russell
p h e r e s ) u p to at least 240 GPa.
w a s stable over a w i d e p r e s s u r e
Hemley a n d colleagues Mikhail
T h e effect o f t h e p r e s s u r e is to
range, a n d s o m e s a m p l e s - w h e n
Eremets, Ho-kwang Mao a n d
t r a n s f o r m t h e nitrigen f r o m a
h e l d b e l o w 100K - retained this
Eugene Gregoryanz at t h e C a r n e g i e I n s t i t u t i o n of
transparent, insulating molecu-
state w h e n d e c o m p r e s s e d to
lar gas into an o p a q u e , semicon-
a t m o s p h e r i c pressure.
W a s h i n g t o n ' s Geophysical
d u c t i n g solid ( w i t h a b a n d g a p
Laboratory (a core institution o f
of just 0.4 eV) w h i c h is stable at
Last year t h e r e s e a r c h e r s report-
t h e NSF's Science a n d
a m b i e n t p r e s s u r e (Nature 411,
ed signs o f t h e material's trans-
T e c h n o l o g y C e n t e r for High-
10 May, p l 7 0 - 4 ) . T h i s is t h e also
f o r m a t i o n at r o o m t e m p e r a t u r e ,
Pressure Research) have created
first time that electrical meas-
u s i n g optical t e c h n i q u e s alone.
a new form of non-molecular
u r e m e n t s have b e e n m a d e o n a
nitrogen w h i c h , at 30OK, is
c o n d e n s e d gas over 200 GPa.
Eomai1: Hollis Wickman, NSF hwickmanc~nsf.gov
pressures.The non-molecular
Agilent accepts GEN200; first order for dual-reactor GEN2000 T h e first GEN200 multi-wafer
delivery a n d w a s p r o d u c t i o n -
7x6" GEN2000 MBE s y s t e m ,
( 4 x 4 " / 7 x 3 " ) p r o d u c t i o n MBE
qualified w i t h i n eight w e e k s "
w h i c h c a n grow 70,000 6" wafers
Applied Epi I n c
said Applied Epi's p r e s i d e n t a n d
a year in a footprint 50% smaller
(St Paul, MN, USA) h a s received
CEO David R e a m e r . " T h e clus-
t h a n a n y o t h e r multi-6" system.
final a c c e p t a n c e at Agilent
ter-tool d e s i g n o f t h e s y s t e m
T e c h n o l o g i e s Inc's lab in Santa
s p e e d s t h e installation process."
system from
Rosa, CA, USA.
The design can accommodate u p to t h r e e g r o w t h reactors, or
* Applied Epi h a s also received
any o t h e r c o m b i n a t i o n o f six
"The s y s t e m w a s g r o w i n g mate-
its first o r d e r for t h e 2nd-gener-
load-lock, p r e p , storage o r
rial less t h a n t h r e e w e e k s after
ation dual-reactor v e r s i o n o f its
growth modules.
III-Vs REVIEW THE ADVANCED SEMICONDUCTOR MAGAZINE VOL : 4 - NO S - June/July ;toot
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