Short wavelength (visible) quantum well lasers grown by molecular beam epitaxy

Short wavelength (visible) quantum well lasers grown by molecular beam epitaxy

Physica 129B (1985) 465-468 North-Holland, Amsterdam SHORT WAVELENGTH 465 (VISIBLE) QUANTUM WELL LASERS GROWN BY MOLECULAR BEAM EPITAXY P. BLOOD, ...

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Physica 129B (1985) 465-468 North-Holland, Amsterdam

SHORT WAVELENGTH

465

(VISIBLE) QUANTUM WELL LASERS GROWN BY MOLECULAR BEAM EPITAXY

P. BLOOD, E.D. FLETCHER,

K. WOODBRIDGE

Philips Research Laboratories,

and P.J. HULYER

Redhill,

Surrey, RHI 5HA, England.

We have fabricated AIGaAs multiple quantum well lasers from a variety of structures grown by molecular beam epitaxy with the objective of achieving operation at a short wavelength with GaAs wells. A series of structures with well widths from 55~ down to 13~ gave pulsed room temperature laser operation at wavelengths from 837nm to 707nm. All the devices operated at longer wavelengths than that calculated for the n=l(e-hh) transition, though from measurements of their electroluminescence spectra at currents as low as 7% of threshold we find no evidence for changes in the sub-band separation at high injection. The threshold current density of a simple broad area MQW device with 160~ wide GaAs wells operating at ~S80nm was 1.2kA cm -2 a~d an analysis of the threshold current density and losses in these devices suggests that interface optical scattering is small.

2. LAYER GROWTH

I. INTRODUCTION The use of quantum size effects to modify the operating wavelength

of semiconductor

lasers has been extensively especially

investigated,

in the GaAs-AIGaAs

system.

High

The structures were grown by Molecular Beam Epitaxy in a laboratory

built system 8 using Be

and Si as the dopants.

The substrate

temperature

for growth of the device structure

quality current injection quantum well lasers

was 700°C and the growth rate for GaAs was

have been demonstrated

about 1~m hr -I.

by both molecular

epitaxy (MBE)I, 2 and metalorganlc vapour deposition

beam

chemical

(MOCVD)3, 4 using GaAs well

The substrate was rotated

during growth at 120 rpm, giving at least one complete rotation per monolayer deposited,

widths down to about 60~ producing emission as

ensure good lateral uniformity.

short as 820nm.

used to determine

Recently,

Hersee et al 5 have

to

The methods

the well width have been

reported growth of injection structures with

described prevlously 9.

wells nominally as thin as 20~ but emission

A1 in the wells because the measured cut off

wavelengths

of the AI beam by the shutter occurs in a time

apparently

suggest the wells are

much thicker than the nominal values. reductions

Further

in wavelength have only been

achieved by using relatively wide AIGaAs wells

We believe there is no

shorter than the monolayer deposition

time,

and A1 diffusion at the growth temperature

is

negligible.

where the wavelength shortening due to the quantum size effect is small 6,7.

In this work

we have studied the growth and device characteristics

of current injection multiple

3. DEVICE RESULTS The dependence of the emission wavelength of a set of MQW lasers as a function of the

quantum well (MQW) lasers with narrow (~55~)

GaAs well width is shown in Figure I.

GaAs wells in which we have achieved laser

sample details are given in reference 9.

emission down to 707nm utilising

device with wells only 13~ wide operates at a

size effect alone.

the quantum

We have also investigated

wavelength of 707nm.

The The

Note also that the

the factors affecting the threshold current of

operating wavelength of the device with 25A

devices with 160~ wide GaAs wells.

wells and 40A barriers appears to lengthen

0378-4363/85/$03.30 © Elsevier Science Publishers B.V. (North-Holland Physics Publishing Division)

46b

P. B l o o d ct al. ,' Short warelc'ngth (risibh,) qu~mmm ~t'¢'ll h~s¢'rs

absorption data measured on the same sample9.0ne possibility

850

is that the sub-band

separation is reduced at high injection i'effective gap shrinkage") eLectroluminescence

p.

800

E

show no shift tn peak wavelength

• 10 wells • 20 wells

• 40, ~, barriers oa Calculation

2,

unlikely.

photoexcitation of similar 60 well MQW isotype samples give edge photolumineseence

at a

18nm longer than the surface

luminescence II.

' ~ X b '~0 45

for currents

[th so this e×planation Is

We have observed that spot

wavelength m 700

b.t

spectra from the N) × 55A

well device ot Figure l, given in Figure ~t,

down to 0.07

g 7.5O

Levels

A similar effect has been

reported by Tarncha e t a [ 12 and shown to be due to ceabsorption.

65C

o

l Well

L

2o

3'0

width,

i

The threshold current of these devices is

do

the valnes have b e e n

abs

55£ M a W 154)

Lz,(,&)

FIGURE I Plot of emission wavelength as a function of well width for MQW lasers. The I0 well devices are simple MQW structures with about 34% AI in the barriers; The 20 well devices have GRIN regions with 60% AI in the outer cladding. Except for the device indicated, all devices have 804 wide barriers. The calculated circles give the wavelength of the n=l(e-hh) transition calculated for each device.

compared with the other devices with 80~ barriers,

shown in Figure 3:

suggesting some coupling between the

®

-

__

/

\ ~

I/ ~\

0 951,, -

i,Y " J," I/ \\

0.48Z.

254 wide wells with the thinner barriers. An important feature of these results is

0211,

that all devices operate at longer wavelengths than that calculated for the n=l(e-hh) 0 0 7 1 ,.

transition using the measured well widths and barrier compositions 9.

The participation of

800

85O Wavelength t n m )

LO phonons in the emission process I0 is unlikely because the wavelength shift varies from sample to sample.

Furthermore the effect

cannot be due to error in the assignment of the well width, graded barriers or fluctuations in composition (as suggested by Hersee et al 5) because we observe differences between laser emission wavelengths and

FIGURE Z Electroluminescence spectra from a 10 x 55A GaAs MQW laser at various drive currents. Also shown are the wavelengths of laser emission and the calculated n=l(e-hh) transition, and the positions of the MQW absorption peaks (Figure 2 ref. 9). The latter differs from the calculation by the exciton binding energy.

467

P. Blood et al. / Short wavelength (visible) quantum well lasers

optical loss ~i ~ 2cm-l"

20

x 10 w e l l , no GRIN 20 w e l l , GRIN

o

The loss obtained

from external differential efficiency (qD) data is about 10cm -I.

16

At threshold,

free-carrler scattering, ~fc, in "bulk" material is about 10cm -I, contributing a loss

12

Jth (kA cm -2)

8

Fsfc ~ 3.5cm -I in these devices.

The loss in

the cladding and barrier regions,

(l-r)~fc , is

about 1.6cm -I suggesting an overall free carrier loss of about 5cm -I.

Comparison of

our data with these numbers suggests that despite the number of layers in the structure I

I

O

I

10

I

I

I

2'0 3JO 4'0 Well w i d t h (,~)

I

5'0

60

the optical loss due to scattering at interfaces is small, at the most about 5cm -I. The temperature dependence of the threshold

FIGURE 3 Threshold current density of 50um oxide stripe MQW lasers as a function of well width (all the devices are those of Figure i) with no correction for current spreading.

current in these 160~ MQW devices in the range 30-60=C can be characterlsed by a T o ~ 200K, which is larger than obtained by Tsang 13. From a plot of nD-i versus device length for 50~m stripe devices we have also been able

calculated for 250~m long 50~m wide oxide

to estimate the internal differential

stripe devices with no corrections for current

efficiency q i above threshold.

spreading.

obtained for the 8 x 160~ GaAs well devices is

Although these data represent a

variety of MQW structures they show the

The value

0.37 by a fit to all data points, and from the

advantages of using a graded refractive index

best values of qD at each length we obtain

(GRIN) structure and the strong increase in

qi = 0.57.

threshold current for narrow wells.

For stripe devices circulating

The

latter may be due to both a decrease in the

8 x 1 6 0 A wells, 60~, b a r r i e r s , 33°/° A[

capture probability for carriers into the

x

wells and a decrease in the optical

3

confinement factor. We have also grown a set of simple MQW lasers with 8 160A GaAs wells and 33% AI in the barriers.

These lasers emit at about

Jtn

(kA cm -2) 2

880nm, with a broad area (250~m x 150~m) threshold current density of 1.2kAcm -2, as also reported by Tsang 13 for a similar structure.

A plot of threshold current

density versus reciprocal device length for

o

~o

~ 4~0 ' L-I (cm -I)

6~0

~

8~0

50um oxide stripe devices is shown in Figure 4.

The equivalent broad area threshold

current density at infinite length is about 850Acm -2 and using gain current data of Kasemset et a114 we calculate an internal

FIGURE 4 Threshold current density as a function of reciprocal length for a set of 50Bm oxide stripe devices having a simple 8 x 160~ GaAs MQW active region.

P. Blood el al. / Short wa~,elength (l,isible) qualttum well laser~

468

modes should not affect the measurement

of n i

and the non-uniform current distribution under the stripe should not reduce the measured efficiency to much less than 80% 15 .

I. W.T.

Tsang, Appl. Phys. Lett. 38 (1981

204.

In these

simple devices without separate confinement regions the injected carriers may leak into the cladding regions on either side of the MQW structure.

REFERENCES

According to Tang et a116 the

probability of an electron being captured into a 160A wide well is at least 0.5 and so the

2. W.T. Tsang, Appl. Phys. Lett. 39 ([98[ 786. 3. S.D. Hersee, M. Baldy, P. Assenat, B. de Cremoux and J.P. Duchemin, Elec. Lett. 18 (1982) 870. 4. D. Kasemset, C.S. Hong, N.B. Patel and P.D. Dapkus, Appl. Phys, Lett. 41 (1982) 912.

fraction transmitted across 8 wells will only be (I-0.5) 8 = 0.004.

However the capture

probability for holes will be less than for electrons and so there is the possibility of holes leaking through to the N-cladding.

In

addition there may be spontaneous or

5. S.D. Hersee, B. de Cremoux and J.P. Duchemin, Appl. Phys. Lett. 44 ([984) 476. 6. R.D. Burnham, C. LindstrSm, T.L. Pao[L, D.R. Scrifes, W. Streifer and N. Holonyak Jnr., Appl. Phys. Lett. 42 (1983) 937.

non-radiative recombination in the barrier 7. W.T. Tsang and J.A. Ditzenberger, Phys. Lett. 39 (1981) 193.

regions between the wells.

4. SUMMARY We have prepared multiple quantum well lasers by molecular beam epitaxy with GaAs wells as thin as 13~ operating in the visible part of the spectrum at 707nm.

The threshold

currents of these devices increase with decreasing well width.

An analysis of the

Appl.

8. K. Woodbridge, P. Dawson, J.P. Gowers and C.T. Foxon, J. Vac. Sci. Technol. B2 (1984) 163. 9. K. Woodbridge, P. Blood, E.D. Fletcher and P.J. Hulyer, Appl. Phys. Lett. 45 (1984) 16. 10. J.J. Coleman, P.D. Dapkus, D.R. Clarke, M.D. Camras and N. Holonyak Jnr., Appl. Phys. Lett. 39 (1981) 864.

threshold currents of simple MQW devices with 8 x 160A GaAs wells suggests that the total internal losses including interface optical scattering are small.

ACKNOWLEDGEMENTS We thank G. Duggan for calculation of the transition wavelengths, P. Kershaw for help

I[. P, Dawson, unpublished. L2. S. Tarucha, Y. Horikoshi and H. Okamoto, Jap. J. Appl. Phys. 22 (1983) L482. 13. W.T. Tsang, Appl. Phys. Lett. 39 (1981) 786. 14. D. Kasemset, C-S. Hong, N.B. Patel and P.D. Dapkus, IEEE Journ. Quantum Electrics QE-19 (1983) 1025.

with the measurements and G. Duggan, P. Dawson and C.T. Foxon for helpful discussions.

15. B.W. Hakki, Journ. AppL. Phys. 46 (1975) 292. 16. J.Y. Tang, K. Hess, N. Hoionyak Jnr., J.J. Coleman and P.D. Dapkus, Journ. Appl. Phys. 53 (1982) 604~.