SiGen seeks to invalidate SOI patent claim

Stepper for Taiwanese SAW device maker

F o l l o w i n g a t 1551 m initial-llhasc

include an XRS 2()()() NanoPulsar

bc used for the p r o d u c t i o n o f

c o n t r a c t from DARPA/I 7S Arln.~

l i t h o g r a p h y s t e p p e r m a d e by

h i g h - b a n d w i d t h (,,tAs d e v i c e s

! !ltr:ltech S t e p p e r l n c (San

P,c s c a r c h Lab (scc Issue 2. p l i).

SAI.. pox~ c rc d by at 2=, x£: colli-

lor o p t i c a l n e t w o r k i n g , high-

Jose. CA, (rSA) is s h i p p i n g its

J MAR T u c h n o h ) g i c s (( ~arlsbad.

m a t e d J MAR PXS- 125 laser plas-

pcrt()rm:.lncc w i r e l e s s t c l e c o m s

first o r d e r to Tai~van Ior an i-

CA. [ISA) has b e e n :txv:trdcd a

111~1x-ray SOtlgCC ()l I i1111vv:.lVC-

and milit,iry ma rke t s .

line r e d u c t i o n s t e p p e r (an XLS

( TS$gm r~-scttrch c o n t r a c t to

l e n g t h (t he first x-ray point-

~ 5 0 ( ) ) for SAg' and MEMS

build an i n t c g n t t c d e n g i n e e r i n g

source system with a collimator

JMAR e x p e c t s f u r t h e r I)ARPA

devices.This /ollows comple

prototyl~c of

to bc us e d in s e m i c o n d u c t o r

f u n d i n g by year-end fi~r s y s t e m

t i o n in Q 1 / 2 0 0 1 of the n e w

lithography s.~ stem.This xxill

nl : mufi t c t uri ng).Thc svstclll will

installation and c h e c k o u t .

Further US$9m DARPA/ARL contract for JMAR

a

poillt-SOtll'CC X-I21"~

fiib of Bran chy T e c h n o l o g y Co (l~)unded in 1989 in Tao Yuan Hsicn, Taiwan ). Branchy designs, engineers :.llld lllailltilins vactltlnl ;ll3d process tcchnoh)gy solutions t o t t h e PF.-(]VI), (]U-(]VD. Photo-(~Vl). M()(IVI) ;rod ( J~E markets. l'ltratech'~, (:EO A r t h u r \V Z,ffiropoulo, said."\Ve h:txc i d e n t i f i e d this r e g i o n as a h i g h g r o w t h m a r k e t for SA\V d e v i c e s . ;ts w e l l as MEMS a n d (;aAs.The order signifies r e n e w e d i n t e r e s t for SA\V alld MEMS m a n u t a c t u r i n g lithograp h y in Asia-Pacific - e s p e c i a l l y

0

T a i w a n and China, hc adds.

SiGen seeks to invalidate SOl patent claim

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Silicon G e n e s i s ( o r p ( C a m p b e l l , CA, ! :SA) has filed fi)r a s u m m a r 3 j u d g m e n t to invalidate a key p a t e n t claim for silicon on i l l s u l a t o r technology in a I S lawsuit filcd bx

Ib,

SOH'EC SA (France) m c r a t e c h n i q u e that c m p h ) y s inlphul ration to tk)rm ;I c u t t i n g r e g i o n in b o n d e d xvafcrs. SiGcn d , t i m s that p a t e n t No. 5,3"4,56q "fiiils to t e a c h t h o s e skilled in the art h o w to m a k e and use t h e full s c o p e of t h e experiment;ttiolY' ;is r e q u i r e d by p r e v i o u s c o u r t rulings. "More specifically, t h e p a t e n t filils to t e a c h h o w to use t h e c l a i m e d i n v e n t i o n w i t h all c l a i m e d gas ions".

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