Radiation Physics and Chemistry 121 (2016) 93–98
Contents lists available at ScienceDirect
Radiation Physics and Chemistry journal homepage: www.elsevier.com/locate/radphyschem
Simulation of ion beam bombardment using Bayfol CR 6-2 S.I. Radwan, M.M. Shehata, H. El-Khabeary, A.G. Helal Accelerators & Ion Sources Department, Basic Nuclear Science Division, Nuclear Research Center Atomic Energy Authority, P.N.13759, Cairo, Egypt
H I G H L I G H T S
Copper and lead ions beam bombardment in Bayfol CR 6-2 polymer at different energies and incident angles were determined. The range, recoil distribution and total damage of copper and lead ions at different energies and incident angles for Bayfol CR 6-2 were studied. The aim of the use copper ions to produce conducting polymer and lead ions for industrial fields. The aim of use lead ions on Bayfol CR 6-2 polymer for applications in a wide range of industrial fields.
art ic l e i nf o
a b s t r a c t
Article history: Received 22 January 2015 Received in revised form 14 December 2015 Accepted 19 December 2015 Available online 21 December 2015
In this work, the simulation of ion beam bombardment in Bayfol CR 6-2 polymer at energies varies from 5 keV to 45 keV was determined. The simulation process was made by multiply charged copper and lead ions of different incident angles. The open source computer code SRIM 3D was used for the simulation to determine the ion beam penetrability into the Bayfol CR 6-2 specimens. The range, recoil distribution and total damage of copper and lead ions using Bayfol 6-2 specimens at different energies and incident angles were studied. It was found that the ion range, recoil distribution and total damage at different incident angles on Bayfol 6-2 specimens increases by increasing the ions energy using copper and lead ions respectively. & 2015 Elsevier Ltd. All rights reserved.
Keywords: Ion range Recoil distribution Total target damage Bayfol CR 6-2 polymer
1. Introduction The interaction of high energy ion beam with solid surface has formed an extensive area of research [Liu et al., 2002; Norem et al., 2005]. The ion beams have been used for sputtering [Moshfegh, 2009] to remove or deposit materials [Dai et al., 2010; Colligon, 2004], etching of materials [Ying et al., 2009; Meskinis et al., 2007], cleaning semiconductor surfaces [Razek et al., 2007], implantation and microelectronics manufacturing process [Insepov et al., 2010; Christou and Web, 2005]. However, the use of ion beams presents some unique problems in the design of the ion source, the transport and focusing systems [Yao, 2007]. The intended application of ion implantation [Kumar et al., 2002; Prins, 2003] places requirements on the characteristics of the ion beam and the target environment and thereby on the implantation system. These requirements are ion species needed, ion beam purity, ion energy and ion current density. Stopping and Range of Ions in Solids (SRIM) [James et al., 2008] E-mail addresses:
[email protected] (S.I. Radwan),
[email protected] (M.M. Shehata),
[email protected] (H. El-Khabeary),
[email protected] (A.G. Helal). http://dx.doi.org/10.1016/j.radphyschem.2015.12.019 0969-806X/& 2015 Elsevier Ltd. All rights reserved.
is a group of programs which calculate the stopping and range of ions (up to 2 GeV/amu) into matter using a quantum mechanical treatment of ion–atom collisions (assuming a moving atom as an “ion”, and all target atoms as “atoms”). During the collisions, the ion and atom have a screened Coulomb collision, including exchange and correlation interactions between the overlapping electron shells. The ion has long range interactions creating electron excitations and plasmons within the target. Transport of Ions in Matter (TRIM) is the core of SRIM program and calculates both the final 3D distribution of the ions and also all kinetic phenomena associated with the ion’s energy loss: target damage, sputtering, ionization, and phonon production. Bayfol CR 6-2 polymer is blend of translucent polycarbonate / polybutylene terephthalate (PBT) based film that offers superior fatigue resistance, abrasion resistance along with added chemical resistance. It displays considerably better formability, improved dynamic load-bearing capacity and better resistance to the influence of chemicals than a pure polycarbonate film. Its films are extremely versatile films used in a broad range of applications such as instrument panels, trade show displays, membrane switches, control panels and decals. They offer excellent lightdiffusing characteristics, improved UV and chemical resistance,
S.I. Radwan et al. / Radiation Physics and Chemistry 121 (2016) 93–98
and other proven properties. The ion beam also causes damage to solid targets by atom displacement. Most aspects of the energy loss of ions in matter [Weaver and Westphal, 2002; Bichsel, 2006] are calculated in SRIM, includes quick calculations which produce tables of stopping powers, range and straggling distributions for any ion at any energy in any elemental target. More elaborate calculations include targets with complex multi-layer configurations. Ion beams are used to modify [Nastasi and Mayer, 2006; Ozturk, 2009; Ghoranneviss et al., 2007; Williams et al., 2012; Sakr, 2010] targets by injecting atoms to change the target chemical and electronic properties. Heavy ion irradiation is a useful technology to induce suitable modifications of polymers for applications in a wide range of industrial fields [Abdel Salam, 2011]. There are several applications of ion irradiated polymer such as microelectronics and biosensers production technology. The aim of use copper ions on Bayfol CR 6-2 polymer is to produce conducting polymer which has important repercussions in the field of flexible electronics, electrical biosensors [Hadjichristov et al., 2008], human machine interfaces, intelligent textiles, robotic interfaces and machine / body sensing devices [Axisa et al., 2005; Someya et al., 2004].
550 1 Incident angle 2 Incident angle 3 Incident angle 4 Incident angle 5 Incident angle
500 450 400
Ion range (A o )
94
350
= 0o = 30o = 45o = 60o = 89o
Pb
1 2 3
300 250
4
200 150 100 5
50 0
0
5
10
15
20
25
30
35
40
45
50
Ion energy (keV) Fig. 2. Ion range versus ion energy for Bayfol CR 6-2 specimens using lead ions at different incident angles.
700 Cu
Incident angle = 0 o
600
The simulation of ion beam processing was made using the open source SRIM 3D computer program at 10000 incident ions. The simulation studied the range, the recoil distribution and total damage of copper and lead ions with energy equals 5, 15, 25, 35 and 45 keV at zero and 89° ions incident angles using Bayfol CR 6-2 polymer specimens
Ion range (A o)
500
2. Ion beam simulation
Ion range (A o )
500 400
1 2
40
45
30
35
40
45
50
700 Ion energy = 45 keV
600 500 400 300 200
Cu
10
20
30
40
50
60
70
80
90
100
Ion incident angle ( θ o ) Fig. 4. Ion range versus different ion incident angles for Bayfol CR 6-2. specimens using copper and lead ions at energy equal to 45 keV.
0
20 25 30 35 Ion energy (keV)
25
Ion energy (keV)
0
5
15
20
Pb
200
10
15
0
4
5
10
100
3
100
5
Fig. 3. Ion range versus ion energy for Bayfol CR 6-2 specimens using copper and lead ions at incident angle equal to zero.
Ion range (A o)
Cu
300
0
200
0
700 I ncident angle = 0o o I ncident angle = 30 o I ncident angle = 45 o I ncident angle = 60 o I ncident angle = 89
300
0
When an energetic ion beam with typically 1 keV–1 MeV bombardment with a solid target, the ions penetrate through the material, slow down by transferring their energy to the target atoms / electrons and eventually stop at a certain depth ( 0– 1 μm) below the target surface. The average penetration depth is called the ions range. Figures (1) and (2) show the relation between ion range in (Å) and ion energy in (keV) for Bayfol CR 6-2 specimens using copper and lead ions at different incident angles. It is found that the ion range increases by increasing the ions energy and a maximum ion range can be obtained at normal incident angle and low atomic number element.
1 2 3 4 5
Pb
100
2.1. Ion range in Bayfol 6-2 specimens
600
400
50
Fig. 1. Ion range versus ion energy for Bayfol CR 6-2 specimens using copper ions at different incident angles.
Figure (3) shows ion range in (Å) versus ion energy in (keV) for Bayfol CR 6-2 specimens using copper and lead ions. It was found that at incident angle equal to zero and ions energy equal to 45 keV, the ion range in Bayfol CR 6-2 specimens equal to 614 Å and 465 Å can be obtained using copper and lead ions respectively.
S.I. Radwan et al. / Radiation Physics and Chemistry 121 (2016) 93–98
95
Fig. 7. Recoil distribution of lead ions on Bayfol CR 6-2 specimen surface at energy equal to 5 keV and zero ions incident angle. Fig. 5. Recoil distribution of copper ions on Bayfol CR 6-2 specimen surface at energy equal to 5 keV and zero ions incident angle.
Figure (4) shows ion range in (Å) versus different incident angles of ions in (ϴ°) for Bayfol CR 6-2 using copper and lead ions. It is clear that the ion range decreases by increasing ions incident angle and at incident angle equal to zero and ions energy equal to 45 keV, the ions range equal to 650 Å and 465 Å, while at the same ions energy and incident angle equal to 89°, the ions range equal to 114 Å and 56 Å can be obtained using copper and lead respectively. 2.2. Recoil distribution on Bayfol specimens Figures (5-8) show an example of the recoil distribution on the
Fig. 8. Recoil distribution of lead ions on Bayfol CR 6-2 specimen surface at energy. equal to 45 and zero ions incident angle.
Fig. 6. Recoil distribution of copper ions on Bayfol CR 6-2 specimen surface at energy equal to 45 keV and zero ions incident angle.
Bayfol CR 6-2 specimens surface at ions energy equal to 5 keV and 45 keV and ions incident angle equal to zero using copper and lead ions. It is clear that the recoils distribution on the specimens surface [(atom/cm3) / (atoms/cm2)] increases by increasing the ions energy. Figures (9-12) show an example of the recoil distribution on the Bayfol CR 6-2 specimens surface at ions energy equal to 5 keV and 45 keV and ions incident angle equal to 89° using copper and lead ions. It is clear that the recoils distribution on the specimens surface [(atom/cm3) / (atoms/cm2)] increases by increasing the ions energy. Figures (13) and (14) show the recoil distribution in [(atom/ cm3) / (atoms/cm2)] on the Bayfol CR 6-2 specimens surface versus different ions energy in (keV) using copper and lead ions at ion incident angle equal to zero and 89° respectively. It is clear that the
96
S.I. Radwan et al. / Radiation Physics and Chemistry 121 (2016) 93–98
Fig. 11. Recoil distribution of lead ions on Bayfol CR 6-2 specimen surface at energy equal to 5 keV and 89° ions incident angle. Fig. 9. Recoil distribution of copper ions on Bayfol CR 6-2 specimen surface at energy equal to 5 keV and 89° ion incident angle.
Fig. 12. Recoil distribution of lead ions on Bayfol CR 6-2 specimen surface at energy equal to 45 and 89° ions incident angle.
Fig. 10. Recoil distribution of copper ions on Bayfol CR 6-2 specimen surface at energy equal to 45 keV and 89° ion incident angle.
respectively. 2.3. Total damage of Bayfol specimens
behavior is linear relation and at constant ions energy, the recoil distribution of high atomic number material (lead) is higher than that of low atomic number material (copper). This is due to the interaction between the incident ions and surface atoms of Bayfol CR 6-2 specimens. Also, it is obvious that at ions energy equal to 45 keV and ions incident angle equal to zero, the recoil distribution on Bayfol CR 6-2 specimens surface equal to 120 [(atom/cm3) / (atoms/cm2)] and 140 [(atom/cm3) / (atoms/cm2)], While at the same ions energy and ions incident angle equal to 89°, the recoil distribution equal to 500 [(atom/cm3) / (atoms/cm2)] and 600 [(atom/cm3) / (atoms/cm2)] using copper and lead ions
As each ion penetrates the target, it undergoes a series of collisions displacing host atoms along the way. Both the ion and dislodged target atoms can continue and cause further damage, and so the energy is spread over many moving particles. Eventually, the energy per particle becomes too small and the cascade stops. Hence, after many ions have been implanted, an initially crystalline target will be so perturbed that it will have changed to a highly disordered state. Heavy ions displace a greater volume of target atoms per ion, and so a higher temperature is necessary for complete recrystallization. Normal damage is closely related to the ion penetration depth and is o10 nm. Abnormal damage can be
S.I. Radwan et al. / Radiation Physics and Chemistry 121 (2016) 93–98
Ions incident angle = 0o
140
Pb
120
Total damge (keV / ion)
(Atoms / cm3) / (Atoms / cm2)
160
Cu
100 80 60 40 20 0
0
5
10
15 20 25 30 Ion energy (keV)
35
40
45
50
700
Pb
Incident angle = 89o
600
Cu
500 400 300 200 100 0
0
5
10
15
20 25 30 Ion energy (keV)
35
40
45
50
0
5
15
20 25 30 35 Ion energy (keV)
1 2 3
40
Ion energy = 45 keV
45
50
Pb
Cu
0
Total damge (keV / ion)
10
2.35 2.3 2.25 2.2 2.15 2.1 2.05 2 1.95 1.9 1.85 1.8 1.75 1.7 10
Fig. 14. Recoil distribution on the Bayfol CR 6-2 specimens surface versus different ion energy at 89° ion incident angle.
2.2 2 1.8 1.6 1.4 1.2 1 0.8 0.6 0.4 0.2 0
Pb
1 Incident angle = 89o 2 Incident angle = 60o 3 Incident angle = 0 o
Fig. 16. Total damage of Bayfol CR 6-2 specimens versus different ion energy at different incident angles using lead ions.
Total damage (keV / ion)
(Atoms / cm3) / (Atoms / cm2)
Fig. 13. Recoil distribution on the Bayfol CR 6-2 specimens surface versus different ion energy at zero ions incident angle.
2.6 2.4 2.2 2 1.8 1.6 1.4 1.2 1 0.8 0.6 0.4 0.2 0
97
20
30
40
50
60
70
80
90
100
o
Ion incident angle (θ ) Fig. 17. Total damage versus different ions incident angles for Bayfol specimen at constant ions energy using copper and lead ions.
1 Incident angle = 89o 2 Incident angle = 60o 3 Incident angle = 0o
0
5
10
15
1 2 3
Cu
20 25 30 35 Ion energy (keV)
40
45
Figure (17) shows the relation between total damage in (keV/ ion) and different ion incident angles in (θ°) for Bayfol CR 6-2 specimens using copper and lead ions at energy equal to 45 keV. It is obvious that at ions energy equal to 45 keV and ions incident angle equal to zero, the total damage of Bayfol CR 6-2 specimens equal to 1.76 keV/ion and 1.88 keV/ion. While at ions energy equal to 45 keV and ions incident angle equal to 89°, the total damage equal to 1.99 keV/ion and 2.25 keV/ion using copper and lead ions respectively. 50
Fig. 15. Total damage of Bayfol CR 6-2 specimens versus different ions energy at different incident angles using copper ions.
caused by an elevated target temperature and can be »10 nm. Figures (15) and (16) show the relation between total damage in (keV/ion) and ion energy in (keV) for Bayfol CR 6-2 specimens using copper and lead ions at different incident angles. It can be concluded that total damage of Bayfol CR 6-2 specimens increases by increasing the energy and incident angle of ions. At ions energy equal to 45 keV and ions incident angle equal to zero, the total damage of Bayfol CR 6-2 specimens equal to 1.76 keV/ion and 1.99 KeV/ion. While at the same ions energy and ions incident angle equal to 89°, the total damage equal to 1.88 keV/ion and 2.25 keV/ion using copper and lead ions respectively.
3. Conclusion The simulation of ions beam bombardment of energy varies from 5 keV to 45 keV with Bayfol CR 6-2 specimens surface was determined using the open source computer code SRIM 3D. The simulation was made using copper and lead ions at different incident angles. It is concluded that the ion range in the specimens increases by increasing the ions energy and a maximum ion range can be obtained at normal incident angle and low atomic number element. It is clear that the recoils distribution on the specimens surface [(atoms/cm3) / (atoms/cm2)] increases by increasing the ions energy and the element of high atomic number has highest recoil distribution. It is obvious that at ions energy equal to 45 keV and ions incident angle equal to zero, the recoil distribution on the specimens surface equal to 120 [(atom/cm3) / (atoms/cm2)] and 140 [(atom/cm3) / (atoms/cm2)], while at the same ions energy and
98
S.I. Radwan et al. / Radiation Physics and Chemistry 121 (2016) 93–98
ions incident angle equal to 89°, the recoil distribution equal to 500 [(atom/cm3) / (atoms/cm2)] and 600 [(atom/cm3) / (atoms/ cm2)] using copper and lead ions respectively. Also, it can be concluded that total damage of the specimens increases by increasing the energy and incident angle of ions. At ions energy equal to 45 keV and incident angle equal to zero, the total damage of the specimens equal to 1.76 keV/ion and 1.88 KeV/ion. While at the same ions energy and incident angle equal to 89°, the total damage equal to 1.99 keV/ion and 2.25 keV/ion using copper and lead ions respectively. This theoretical study will be made experimentally using heavy ion injector T – 5010 in Accelerators and Ion Sources Department, Nuclear Research Center, Egyptian Atomic Energy Authority.
References Liu, X.Y., Daw, M.S., Kress, J.D., Hanson, D.E., Arunachalam, V., Coronell, D.G., Liud, C. L., Voter, A.F., 2002. Thin Solid Films 422, 141. Norem, J., Insepov, Z., Konkashbaev, I., 2005. Nucl. Instrum. Meth. Phys. Res. Sec. A 537, 510. Moshfegh, A.Z., 2009. Sputtering Deposition: Physics and Technology Aug. 3rd International Workshop on Physics and Technology of Thin Films, Tehran, Iran. Dai. Y., Liao. W., Chen. S., Zhou. L., Xie. X. Proc. SPIE, 7655(2-3), 76550X (2010). Colligon, J.S., 2004. Phil. Trans. R Soc. Lond. A 362, 103. Ying. X., Xiaobo. Z., Gang. L., Ying. L., Dequan. X., Yangchao, T. Proc. SPIE, 7282, 72821 O (2009).
Meskinis, S., Kopustinsk, V., Slapikas, K., Gudaitis, R., Guobiene, A., Tamulevicius, S., 2007. Mater. Sci. 13 (4), 282. Razek, N., Otte, K., Chasse, T., Hirsch, D., Schindler, A., Frost, F., Rauschenbach, B., 2007. J. Vac. Sci. Technol. 20 (4), 1492. Insepov, Z., Norem, J., Veitzer, S., 2010. Nucl. Instrum. Methods B 268, 642. Christou, A., Webb, W.M., 2005. Reliability and Quality in Microelectronic Manufacturing. University of Maryland, College Park, USA. Yao, N., 2007. Focused Ion Beam Systems: Basics and Applications. Princeton University, New Jersey. Kumar, M., Jkumar, R.A., Kumar, D., George, P.J., 2002. Bull. Mater. Sci. 25 (6), 549. Prins, J.F., 2003. Semicond. Sci. Technol. 18 (3), 27. James, F.Z., Jochen, P.B., Matthias, D.Z., 2008. SRIM-The Stopping and Range of Ions in Matter. Lulu Press Co., North Carolina, USA. Weaver, B.A., Westphal, A.J., 2002. Nucl. Instrum. Methods Phys. Res. B 187, 285. Bichsel, H., 2006. Nucl. Instrum. Methods A562, 154. Nastasi, M., Mayer, J.W., 2006. Ion Implantation and Synthesis of Materials. Springer, Berlin Heidelberg, New York. Ozturk, O., 2009. Nucl. Instrum. Methods Phys. Res. Sec. B 267 (8–9), 1526. Ghoranneviss, M., Shokouhy, A., Larijani, M.M., Haji Hosseini, S.H., Yari, M., Anvar, A., Gholipur, M., Shahraki, A.H. Sari, Hantehzadeh, M.R., 2007. Pramana J. Phys. 68 (1), 135. Ion Beam Modification of Materials”. In: Williams, J.S., Elliman, R.G., Ridgway, M.C. (Eds.), Netherlands. Elsevier Science B.V.. Sakr, E.M., 2010. Recent Pat. Mech. Eng. 3 (1), 45–50. Abdel Salam, M.H., Nouh, S.A., Radwan, E.Y., Fouad, S.S., 2011. Mater. Chem. Phys. 127, 305. Hadjichristov, G.B., Gueorguiev, V.K., Ivanov, Tz.E., Marinov, Y.G., Ivanov, V.G., Faulques, E., 2008. Org. Electron. 9, 1051. Axisa, F., Schmitt, P.M., Gehin, C., Delhomme, G., McAdams, E., Dittmar, A., 2005. IEEE Trans. Inf. Technol. Biomed. 9, 325. Someya, T., Sekitani, T., Iba, S., Kato, Y., Kawaguchi, H., Sakurai, T., 2004. Proc. Natl. Acad. Sci. U.S.A. 101, 9966.