An etching inhibitor combination for liquid compositions for clean• ing, deoxidizing, or both cleaning and deoxidizing aluminum, tita• nium, or both aluminum and tita• nium, said inhibitor combination consisting essentially of quater• nary ammonium salts that con• tain aryl moieties and dissolved organic compounds. Palm .....PPI. COMNSnIOII
U.S. Patent 6.001.192. Dec. 14, 1999 J.P. Lallier and S. Fouquay. assignors to Elf Atochem S.A., Puteaux. France
A process for removing a paint surface layer from a substrate coated therewith comprising con• tacting with an effective amount of a paint stripping composition
Since 1923
comprising, by volume, 1 to 99% of an aprotic polar solvent and 99 to 1% of an ether. ....., , . ._ '1'-'"
U.S. Patent 6,001,227. Dec. 14, 1999 V. Pavate et al., assignors to Applied Materials Inc., Santa Clara, Calif.
A target for use in magnetron sput• tering of aluminum for forming metallization films having low de• fect densities and methods for man• ufacturing and using such target. PLAn• • • •COMDUCYOa U.S. Patent 6,001,234. Dec. 14, 1999
R. W. Batz, Jr. et al, assignors to Semitool Inc., Kalispell, Mont.
A method for plating semiconduc• tor workpieces using a workpiece• engaging electrode assembly with a sealing boot.
MFG. CO.
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U.S. Patent 6,001,235. Dec. 14, 1999 D.M. Arken et aZ., assignors to International Business Machines Corp., Armonk, N. Y.
A rotary plater with radially dis• tributed plating solution. • •,
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U.S. Patent 6,001,424. Dec. 14, 1999 B. Lettmann et aZ., assignors to BASF £ocke + Farben AG, Muenster·Hiltrup, Germany
A process for the preparation of a two-coat finish on a substrate sur• face comprising providing an aqueous dispersion of a polyure• thane resin having hydrophilic groups; polymerizing in the aque• ous dispersion and in the pres• ence of at least one water-insolu• ble initiator, at least one member
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