416
Classified Abstracts 1009--1015
Vacuum Applications 30.
E v a p o r a t i o n and S p u t t e r i n g
30 Review of the International Colloquium on solid thin film optics. See Abstr. No. 1064. 30 An ultra-high vacuum ultra-violet irradiation chamber with controlled temperature. See Abstr. No. 1029. 30
Elastomeric coatings.
See Abstr. No. 1036.
30 Effect of residual gases on the magnetic properties of thin permalloy films. See Abstr. No. 1056. 30 Ultra-high vacuum system for the continuous evaporation of multlplayer thin films. See Abstr. No. 962. 30
Reactive sputtering.
See Abstr. No. 978.
3O On the possibility of utilising a pulse mass spectrometer for the study of evaporation processes of complex materials. See Abstr. No. 998.
Magnetic interaction between two thin ferromagnetic films separated by a thin film of chromium or palladium of thickness less than 300A. See Abstr. No. 1022. 30:41 1009. Epitaxy of germanium films deposited on germanium substrates by vacuum condensation. (U.S.S.R.) The object of these experiments was to determine the importance of substrate temperature on the degree of perfection of the deposits. "l'he n-type germanium was evaporated from a tungsten boat at an initial pressure of approximately 1 × 10-7 torr. The minimum substrate temperature for epitaxial films was 300 °C. Previous experimentors had found it necessary to have substrate temperatures as high as 800 °C in order to avoid mosaic structure. This is attributed to the higher gas pressures employed in their case. The experimental results are stated to be in agreement with a previously published theoretical analysis (G. A. Kurov, Fiz. Tver. Tela, 5, 1963, 3041). N. L. Mezentsev, Fiz. Tver. Tela, 6 (7), 1964, 2026-2031. (In Russian) 30:14 1010. The influence of dispersion of anisotropy on the dynamic properties of thin permalloy films. (U.S.S.R.) Over 300 permalloy films of average thickness of 1300A were deposited on glass substrates at 10 5 torr and various substrate temperatures and values of magnetic field. The former varied from 20 to 320°C, whilst the magnetic field ranged from zero to 250°C. It appears that anisotropic dispersion depends primarily on the temperature of the substrate and magnitude of the magnetic field during deposition. In consequence, variations in these parameters have a profound influence on the magnetic properties of the film (rate of magnetic polarity reversal, etc.). R. V. Telesnin and T. N. Nikitina, Phys. of Metals and Metallurg. Sci., 17 (5), 1964, 672-677. (In Russian)
30:41 1011. The nature of amorphous germanium. (U.S.S.R.) Germanium films obtained by vacuum evaporation exhibit a metastable amorphous structure if the substrate temperature is below a certain value. Examination of the pertinent literature revcaled a considerable variation in this critical value. According to Semiletov (Kristallogral~ya, (1), 1956, 542) amorphous germanium films resulted with substrate temperature equal to or less than 370°C in a vacuum ranging from 5 x 10 5to 1 × 10 torr. Experiments made by the author at substrate temperature between 200 and 400°C and pressures below 1 × 10 6 torr on the other hand yielded crystalline deposits throughout. It is concluded that the degree of vacuum during evaporation has an effect on the nature of the deposit and that the formation of an anaorphous film depends on the absorption of residual gases during deposition. G . A . Kurov, Fiz. Tl'er. Tela, 6(6),1964,1911. (In Russian)
30 : 56 1012. Electron gun for determining the rate of vaporization of materials with high melting points. (U.S.S.R.) The rate of evaporation for various materials with high melting points was obtained by subjecting them to electronic bombardment. By stabilizing the high voltage and filament current of the gun, it was found possible to maintain the temperature of the sample constant to within + 10°C during the process. Temperatures up to 3000°C could be reached and by surrounding the sample with a water-cooled anode, complete condensation of the vapour was ensured. Temperatures were measured with an optical pyrometer which could be focused either on the surface of the sample or in previously machined groves. G. P. Kovtun et al., Pribory i Tekh, Eksper., (2), 1964, 130-132. (In Russian)
30 : 56 1013. On the conductivity of semiconductor films deposited on conducting substrates. (U.S.S.R.) The possibility of direct measurement of the conductivity of thin semiconductor films deposited on a conducting substrate is considered and a suitable formula derived. The two-layer model assumes the same type of conductivity for film and base. A p - n pass will otherwise form between the two and thus produces the equivalent of a three layer model. This case has not been considered by the author. V. L. Konikov, Fiz. Tver. Tela., 6, 1964, 2207-2209. (In Russian)
30 : 41 : 56 1014. Ferromagnetic films. Discussion on Ni-Fe films deposited on glass substrates in vacuo. Their use as computor storage elements is explained. C. E. Fuller, Electronics andPower, 10, Aug. 1964, 266.
3O 1015. Thickness uniformity on rotating substrates. (U.S.A.) In the device described by the author, the samples rotate around their axis whilst at the same time undergoing a rotation about a central evaporating source. The necessary design parameters to ensure highest thickness uniformity are determined theoretically and confirmed by experimental results. K. H. Behrndt, Trans. 10 Nat. Vac. Syrup., New York, 1963, 379-384.