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413. Double variable gas leak
Classified
abstracts
403-422 24
403. An electrically-operated J B Watkins, Lab Practice,
two-way gas valve. f Gwo/ Britczini 14 (II), Nor 1965, lZYS_ 1297.
404. Air-inlet
simplicity.
27 : 14 of the con-
Molecular and viscous How in a leak and the determination ductivity. See abstract number 339. 23
valve of great
( USA J
In every vacuum system provision must be made to allow the system to reach atmospheric pressure. ‘lhc \ai\c descr~bcd hcrc i\ claimed to achieve this easily and at minimum C‘O\I. A C MacDonald. Kev Scietrl ImIrrrm, 36 / I I I , ‘VCJI, IY6jz 1620. 21 405. A new extreme high-vacuum New scaling materials coupled
breakable
( USA/
valve.
with complete utliization 01’ an old sealing principle has made po\siblc a new all-metal vaivc that I\ breakable closed at 450 C without solid-htatc bonding.
P L Clarke,
J Vat Sci Tecbnol,
2 (6/,
Nov/Dcc
IY65, 308 3/O.
21 406. Device for protecting the inspection holes in high temperature vacuum apparatus. ( USSR) A Ya Teitel’man et rrl. Byul l;obrr,t i 7owt11~~hl1 Ltrahov. II, lY6.F. 33-34, (in Rusxiu~~) 23 407. Vacuum valves. i USA) D Berringer, 111.s1rlct1rc~nt.s and COII~WI S) .tiet~~.t, 3X f I_‘) , Lkc I ‘/h> II5 117. 25.
Baffles,
An electric abstract
traps discharge
number
35
and
refrigeration
mass spectrometer as a sensitive gasanalyzer. See abstract number 395.
pump vacuum
25 : 18 : 21 systems. Set
I.
leak detector
1-f Inonge.
Kc\,Scient
III. Vacuum
In.v/rutu, 36 ill),
Nov 1965, I642
vacuum technology including cryosorption, pump and pressure calibration studies. (US/l)
diffusion
applications
30. Evaporation
and
sputtering
machine nutnhcr
for temperatures
30 : 20 : 4x to 20 K and
down
361,
: 20 : 41
30
High-vacuum apparatus for studying sublimation weighing method. See abstract number 363.
by the continuous-
P J Bryant and C M Gosselin, Rep N/1S,4-C‘R-63.?3Y, Inst, Kmsas City. Mo, Ma), I Y65. 409. A simple traps. (USA)
inexpensive
liquid
nitrogen
:t4ir/we.\/ Ret
level controller
25 : 33 for cold
The details of construction of a simple non-electrical ilcluld nttrogcn controller are presented. The level controller maintains the liquid nitrogen level in a vacuum cold trap suHiciently constant for the attainment and maintcnancc of prczsure less than 0. I torr for prolonged periods.
J R Woodyard 719.
and C B Cooper,
J Scient
i Crctr/ Brirtritr!
‘5 411. The efficiency of a liquid hydrogen trap in the presence of a leak. (Great Britain) V A Otroschenko, Cr.soge,!ics. 5 (6), Dee 1965, 341, i USSR).
25 412. Ultrahigh
vacuum
in an unbaked
apparatus.
(G,-crrt Brirrritri
27. Leak
cf ul. C‘yj~openicv, 5 i6),
detectors
and
leak
Occ IY6.i. 337 33X.
detection 27
Some data on mass-spectrometrical imestigation ofa halogen leak detector. See abstract number 154
of magnesium 233 (71,
77 --
of work mechanism 389.
: 44
vacuum. 30
415. Effect of vacuum on the tensile properties crystals. j US.4) D P Williams and If G Nelson, Ikant AlME, 134.5.
lY65,
: 37
single
l33Y
30 : 41 416. Method for vacuum deposition of cobalt metal tilms using graph( ,l’c~r/tl~,-lrllrll\ / ite crucibles. A Rose, Nuclrrr~ Itr.tlrr~~.MetId~, 35 / I), IY65. I65 166 30 : 41 417. Vacuum deposited molybdenum films. (USA) Vacuum cvaporatlon of Mo \%ith an electron bombardment on oxidlred sii~cun wafers produces liims whose properties on the condensatton temperature.
R A Holmwood 827 8.~1.
and R Clang,
J L/cctroclre/t/.
Sot,
source depend
112 (N!, IY65.
418. Vacuum-depositing of thin films of iron in sealed systems low pressures. (C‘xdmlowh iu j V L LBska, J Pbv.v,
30 at very
i USA) Description deposition and vacuum made.
methods-electrodeposition, autocatalytIc deposltion-by which the metal film5 can be
30 420. Vacuum
physics
applied
to
deposition
technolog).
Urilrritz)
Vacuum conditions are considered i Gt-ctrr Bfirain) and condcnscd.
1, Holland,
In connection with a study on adsorption propcrtlcs of aluminlum oxide baffles, a number of experlmcnts were carrlcd out on the production of UHV using low temperature 111an unheated apparatus put together with rubber packing. /USSR)
L L Gerasimov
of testing dry film lubricants in an ultrahigh Jr, Proc Imt tInt,irorl Sri, IY65, 365-36X
1nstr11111,42 (Y i /Y65, 717 2’
410. Insulation of liquid gas vessels. Anon, Vacnique, 5 (17). Ott 1965, 7.
30 414. A method
R N Hager
The effcctivcncss of an optically dencc chcm~cai trap in reducing the gaseous contamination of ultrahigh-vacuum syjtcms was studied. The system used an oil diffusion pump with DC-705 pumping fluid. The experiments were done at liquid nitrogen. dry ice and acetone and ambient tcmperaturcs. The data collected by means of a scnj~tive partial pressure analyzer indicated that a significantly lower lcvci of contamination was achieved by coddling the chemlcai trap even to -7X’C. Comparing the data ob~ulned with data taken (11 the trap operating without chemicals, it wa\ found that a significant increase in trapping efficiency can be realized when chemicals arc used. The greatest improvement over the non-chcmlcal condition\ was noted at the dry ice-acctonc blurry tempcraturc. (Author)
22
1643.
25 408. Extreme
:
and residual
27 413. Double variable gas leak. I USA/ I.hc need to admit gas into a highly evacuated cnciosure at a controlled rate is often encountered in research experiments cmpioylng gases. The author has developed a double variable gas leak valve which is a scl of a needle valve and a variable capillary leak in series. This device can control the small rates of gas flow in the range i-10” I /L/SWwith fairly good results, while it behaves iike a conventional needle valve above the range. (Japan)
A gas refrigerating lower. See abstract
equipment
as a trap for diffusion
27 A small
under which film\ are voiatllizcd
Vacrliqrrc, 5 / 171 , Or/ 1965, 2 6. 30
421. Semiconducting
copper sulphide
coatings.
f USSR) A method I\ de\crlbed of depositing conducting copper sulphlde by vacuum ccaporation with subsequent treatment of the deposit 111 qulphur vapours at 70-80 C. The method makes po\slbie the coating of piastlc and polymer film\.
B I’ Kryzhanovshii I67 /6Y,
and A Ya Kuznatsov, Ruv\icrtrl.
Pribor!,
I 7iahIr
\pv-.
2. 30
Production t..pltaxIaI
tiim\
of
la)ers \iilcon
50
vacuum.
of thick.
were
1 by vacuum
abstracts
403-422 24
403. An electrically-operated J B Watkins, Lab Practice,
two-way gas valve. f Gwo/ Britczini 14 (II), Nor 1965, lZYS_ 1297.
404. Air-inlet
simplicity.
27 : 14 of the con-
Molecular and viscous How in a leak and the determination ductivity. See abstract number 339. 23
valve of great
( USA J
In every vacuum system provision must be made to allow the system to reach atmospheric pressure. ‘lhc \ai\c descr~bcd hcrc i\ claimed to achieve this easily and at minimum C‘O\I. A C MacDonald. Kev Scietrl ImIrrrm, 36 / I I I , ‘VCJI, IY6jz 1620. 21 405. A new extreme high-vacuum New scaling materials coupled
breakable
( USA/
valve.
with complete utliization 01’ an old sealing principle has made po\siblc a new all-metal vaivc that I\ breakable closed at 450 C without solid-htatc bonding.
P L Clarke,
J Vat Sci Tecbnol,
2 (6/,
Nov/Dcc
IY65, 308 3/O.
21 406. Device for protecting the inspection holes in high temperature vacuum apparatus. ( USSR) A Ya Teitel’man et rrl. Byul l;obrr,t i 7owt11~~hl1 Ltrahov. II, lY6.F. 33-34, (in Rusxiu~~) 23 407. Vacuum valves. i USA) D Berringer, 111.s1rlct1rc~nt.s and COII~WI S) .tiet~~.t, 3X f I_‘) , Lkc I ‘/h> II5 117. 25.
Baffles,
An electric abstract
traps discharge
number
35
and
refrigeration
mass spectrometer as a sensitive gasanalyzer. See abstract number 395.
pump vacuum
25 : 18 : 21 systems. Set
I.
leak detector
1-f Inonge.
Kc\,Scient
III. Vacuum
In.v/rutu, 36 ill),
Nov 1965, I642
vacuum technology including cryosorption, pump and pressure calibration studies. (US/l)
diffusion
applications
30. Evaporation
and
sputtering
machine nutnhcr
for temperatures
30 : 20 : 4x to 20 K and
down
361,
: 20 : 41
30
High-vacuum apparatus for studying sublimation weighing method. See abstract number 363.
by the continuous-
P J Bryant and C M Gosselin, Rep N/1S,4-C‘R-63.?3Y, Inst, Kmsas City. Mo, Ma), I Y65. 409. A simple traps. (USA)
inexpensive
liquid
nitrogen
:t4ir/we.\/ Ret
level controller
25 : 33 for cold
The details of construction of a simple non-electrical ilcluld nttrogcn controller are presented. The level controller maintains the liquid nitrogen level in a vacuum cold trap suHiciently constant for the attainment and maintcnancc of prczsure less than 0. I torr for prolonged periods.
J R Woodyard 719.
and C B Cooper,
J Scient
i Crctr/ Brirtritr!
‘5 411. The efficiency of a liquid hydrogen trap in the presence of a leak. (Great Britain) V A Otroschenko, Cr.soge,!ics. 5 (6), Dee 1965, 341, i USSR).
25 412. Ultrahigh
vacuum
in an unbaked
apparatus.
(G,-crrt Brirrritri
27. Leak
cf ul. C‘yj~openicv, 5 i6),
detectors
and
leak
Occ IY6.i. 337 33X.
detection 27
Some data on mass-spectrometrical imestigation ofa halogen leak detector. See abstract number 154
of magnesium 233 (71,
77 --
of work mechanism 389.
: 44
vacuum. 30
415. Effect of vacuum on the tensile properties crystals. j US.4) D P Williams and If G Nelson, Ikant AlME, 134.5.
lY65,
: 37
single
l33Y
30 : 41 416. Method for vacuum deposition of cobalt metal tilms using graph( ,l’c~r/tl~,-lrllrll\ / ite crucibles. A Rose, Nuclrrr~ Itr.tlrr~~.MetId~, 35 / I), IY65. I65 166 30 : 41 417. Vacuum deposited molybdenum films. (USA) Vacuum cvaporatlon of Mo \%ith an electron bombardment on oxidlred sii~cun wafers produces liims whose properties on the condensatton temperature.
R A Holmwood 827 8.~1.
and R Clang,
J L/cctroclre/t/.
Sot,
source depend
112 (N!, IY65.
418. Vacuum-depositing of thin films of iron in sealed systems low pressures. (C‘xdmlowh iu j V L LBska, J Pbv.v,
30 at very
i USA) Description deposition and vacuum made.
methods-electrodeposition, autocatalytIc deposltion-by which the metal film5 can be
30 420. Vacuum
physics
applied
to
deposition
technolog).
Urilrritz)
Vacuum conditions are considered i Gt-ctrr Bfirain) and condcnscd.
1, Holland,
In connection with a study on adsorption propcrtlcs of aluminlum oxide baffles, a number of experlmcnts were carrlcd out on the production of UHV using low temperature 111an unheated apparatus put together with rubber packing. /USSR)
L L Gerasimov
of testing dry film lubricants in an ultrahigh Jr, Proc Imt tInt,irorl Sri, IY65, 365-36X
1nstr11111,42 (Y i /Y65, 717 2’
410. Insulation of liquid gas vessels. Anon, Vacnique, 5 (17). Ott 1965, 7.
30 414. A method
R N Hager
The effcctivcncss of an optically dencc chcm~cai trap in reducing the gaseous contamination of ultrahigh-vacuum syjtcms was studied. The system used an oil diffusion pump with DC-705 pumping fluid. The experiments were done at liquid nitrogen. dry ice and acetone and ambient tcmperaturcs. The data collected by means of a scnj~tive partial pressure analyzer indicated that a significantly lower lcvci of contamination was achieved by coddling the chemlcai trap even to -7X’C. Comparing the data ob~ulned with data taken (11 the trap operating without chemicals, it wa\ found that a significant increase in trapping efficiency can be realized when chemicals arc used. The greatest improvement over the non-chcmlcal condition\ was noted at the dry ice-acctonc blurry tempcraturc. (Author)
22
1643.
25 408. Extreme
:
and residual
27 413. Double variable gas leak. I USA/ I.hc need to admit gas into a highly evacuated cnciosure at a controlled rate is often encountered in research experiments cmpioylng gases. The author has developed a double variable gas leak valve which is a scl of a needle valve and a variable capillary leak in series. This device can control the small rates of gas flow in the range i-10” I /L/SWwith fairly good results, while it behaves iike a conventional needle valve above the range. (Japan)
A gas refrigerating lower. See abstract
equipment
as a trap for diffusion
27 A small
under which film\ are voiatllizcd
Vacrliqrrc, 5 / 171 , Or/ 1965, 2 6. 30
421. Semiconducting
copper sulphide
coatings.
f USSR) A method I\ de\crlbed of depositing conducting copper sulphlde by vacuum ccaporation with subsequent treatment of the deposit 111 qulphur vapours at 70-80 C. The method makes po\slbie the coating of piastlc and polymer film\.
B I’ Kryzhanovshii I67 /6Y,
and A Ya Kuznatsov, Ruv\icrtrl.
Pribor!,
I 7iahIr
\pv-.
2. 30
Production t..pltaxIaI
tiim\
of
la)ers \iilcon
50
vacuum.
of thick.
were
1 by vacuum