Corrigendum to “Polymer filling ratio with various pressure variation rates in nanoimprint lithography” [Microelectron. Eng. 131 (2015) 24–28]

Corrigendum to “Polymer filling ratio with various pressure variation rates in nanoimprint lithography” [Microelectron. Eng. 131 (2015) 24–28]

Microelectronic Engineering 134 (2015) 68–68 Contents lists available at ScienceDirect Microelectronic Engineering journal homepage: www.elsevier.co...

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Microelectronic Engineering 134 (2015) 68–68

Contents lists available at ScienceDirect

Microelectronic Engineering journal homepage: www.elsevier.com/locate/mee

Corrigendum

Corrigendum to ‘‘Polymer filling ratio with various pressure variation rates in nanoimprint lithography’’ [Microelectron. Eng. 131 (2015) 24–28] JiHyeong Ryu a, HyungJun Lim a,b, Sang-Ho Lee c,⇑, JaeJong Lee a,b,⇑ a b c

Department of Nano Mechatronics, University of Science and Technology, Daejeon 305-807, Republic of Korea Nano-Convergence and Mechanical Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea Division of Mechanical & Automotive Engineering, Wonkwang University, Iksan 570-749, Republic of Korea

The authors regret that there were mistakes in the author’s affiliations and equation in the earlier version published. The correct authors’ affiliations are now shown above. The authors would like to consent to parameter S being changed to (S + W) at an Eq. (4)

V NIL ðtÞ ¼

PðtÞ  HðtÞ3

lðtÞ  ðSÞ

2

) V NIL ðtÞ ¼

PðtÞ  HðtÞ3

lðtÞ  ðS þ WÞ2

The authors would like to apologise for any inconvenience caused in this matter.

DOI of original article: http://dx.doi.org/10.1016/j.mee.2014.10.012

⇑ Corresponding authors at: Nano-Convergence and Mechanical Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea (J. Lee). E-mail addresses: [email protected] (S.-H. Lee), [email protected] (J. Lee). http://dx.doi.org/10.1016/j.mee.2014.12.005 0167-9317/Ó 2014 Elsevier B.V. All rights reserved.