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Inductively Coupled Plasmas in Analytical Atomic Spectrometry
224
Book Reviews
able the reader better to assess the relative merits of the various analytical approaches. Given the scope of the two titles and the thousands of references included, it is not suprising that there are omissions and errors, e.g., in Volume 1 on page 146 much better detection limits for the spectrophotometric determination of iron can be achieved than those quoted, and on page 501 the same paper is discussed in consecutive but independent paragraphs with separate reference numbers. In summary this is a useful but expensive compendium of approaches to the analysis of natural and treated waters and is therefore a worthwhile source book for analytical chemists. However it does not include critical discussion of the various approaches or set the analytical methods in a wider environmental context. Paul J. Worsfold
I. Nagy, Introduction to Chemical Process Instrumentation, Elsevier, Amsterdam, 1992 (ISBN O444-98712-6). xx + 448 pp. Price US$ 177.OO/Dfl. 345.00. This book is the third volume in the series Process Measurement and Control. It presents a well-structured comprehensible introduction to chemical process instrumentation. In three parts the fundamentals of metrology, process control theory and design methods of process instrumentation, the automatic control of, unit operations and processes, and process plant instrumentation are discussed. The book gives a transparent presentation of the field. Because it is not specifically written for analytical chemists but rather aims at chemical engineers and control engineers, its scope is much wider than purely process analytical chemistry. Nevertheless analytical chemists coming in contact with aspects of process control will find several sections of particular interest highlighted with numerous illustrations. In the cover text it is claimed that the “most recent advances in the field have been treated”. This seems not to be entirely true: it gives the state-of-the-art of the 1980s. For instance, artifi-
cial intelligence in process control is only briefly mentioned in connection with the development of knowledge-based expert systems. Nothing is said about the use of neural networks in this respect. In conclusion, this is a rather classical, easy to read book written for newcomers in the field. Its nice format as well as the many illwtrations and examples makes it good value for money. Willem E. van der Linden
A. Montaser and D.W. Golightly (Eds.), Inductively Coupled Plasmas in Analytical Atomic Spectrometty, 2nd edn., VCH, Weinheim, 1992 (ISBN 3-527-28339-O). 1017 pp. Price f 111.00. This is a timely update of a well respected and useful book. The basic aims of the book remain unchanged, i.e., to provide a comprehensive reference on the theory and practice of ICPs aimed at both the student and established researcher. However the revised text includes five new chapters and much updating of the chapters from the first edition to reflect advances since 1987. The basic format of the book has been retained and again calls on contributions from internationally known scientists for each of the twenty heavily referenced chapters. The book itself may be split into four principal sections covering the potentials and limitations of plasma sources compared to ICP discharges for analytical spectrometry; basic concepts and analytical applications of ICPAES; complementary techniques such as the analytical applications of ICP as an atomization cell for. atomic fluorescence spectrometry and the fundamentals, instrumentation and applications of ICP-MS; and finally modified sample introduction systems, mixed gases and the use of mathematical models. The most important revision in this second edition is the expansion of the coverage given to ICP-MS which now extends to three chapters. This book is presented to a high standard and is highly recommended to all ICP spectroscopists. S.J. Hill
Book Reviews
able the reader better to assess the relative merits of the various analytical approaches. Given the scope of the two titles and the thousands of references included, it is not suprising that there are omissions and errors, e.g., in Volume 1 on page 146 much better detection limits for the spectrophotometric determination of iron can be achieved than those quoted, and on page 501 the same paper is discussed in consecutive but independent paragraphs with separate reference numbers. In summary this is a useful but expensive compendium of approaches to the analysis of natural and treated waters and is therefore a worthwhile source book for analytical chemists. However it does not include critical discussion of the various approaches or set the analytical methods in a wider environmental context. Paul J. Worsfold
I. Nagy, Introduction to Chemical Process Instrumentation, Elsevier, Amsterdam, 1992 (ISBN O444-98712-6). xx + 448 pp. Price US$ 177.OO/Dfl. 345.00. This book is the third volume in the series Process Measurement and Control. It presents a well-structured comprehensible introduction to chemical process instrumentation. In three parts the fundamentals of metrology, process control theory and design methods of process instrumentation, the automatic control of, unit operations and processes, and process plant instrumentation are discussed. The book gives a transparent presentation of the field. Because it is not specifically written for analytical chemists but rather aims at chemical engineers and control engineers, its scope is much wider than purely process analytical chemistry. Nevertheless analytical chemists coming in contact with aspects of process control will find several sections of particular interest highlighted with numerous illustrations. In the cover text it is claimed that the “most recent advances in the field have been treated”. This seems not to be entirely true: it gives the state-of-the-art of the 1980s. For instance, artifi-
cial intelligence in process control is only briefly mentioned in connection with the development of knowledge-based expert systems. Nothing is said about the use of neural networks in this respect. In conclusion, this is a rather classical, easy to read book written for newcomers in the field. Its nice format as well as the many illwtrations and examples makes it good value for money. Willem E. van der Linden
A. Montaser and D.W. Golightly (Eds.), Inductively Coupled Plasmas in Analytical Atomic Spectrometty, 2nd edn., VCH, Weinheim, 1992 (ISBN 3-527-28339-O). 1017 pp. Price f 111.00. This is a timely update of a well respected and useful book. The basic aims of the book remain unchanged, i.e., to provide a comprehensive reference on the theory and practice of ICPs aimed at both the student and established researcher. However the revised text includes five new chapters and much updating of the chapters from the first edition to reflect advances since 1987. The basic format of the book has been retained and again calls on contributions from internationally known scientists for each of the twenty heavily referenced chapters. The book itself may be split into four principal sections covering the potentials and limitations of plasma sources compared to ICP discharges for analytical spectrometry; basic concepts and analytical applications of ICPAES; complementary techniques such as the analytical applications of ICP as an atomization cell for. atomic fluorescence spectrometry and the fundamentals, instrumentation and applications of ICP-MS; and finally modified sample introduction systems, mixed gases and the use of mathematical models. The most important revision in this second edition is the expansion of the coverage given to ICP-MS which now extends to three chapters. This book is presented to a high standard and is highly recommended to all ICP spectroscopists. S.J. Hill