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Inductively Coupled Plasmas in Analytical Atomic Spectroscopy
058.%3547/89$3.00+ SKI Pergamon Press plc
SpecrrochimicaAcfa, Vol. 448, No. 2, P. 235, 1989 Printed in Great Britain.
BOOK REVIEW
Inductively
Coupled
Plasmas in Analytical Atomic Spectroscopy,
edited by A. MONTASERand D. W.
GOLIGHTLY.VCH Pub., New York (1987). Since the early 196Os, the inductively coupled plasma has developed into an effective emission spectroscopic source for use in analytical chemistry. This rapid growth has been due, in part, to the excellent operational characteristics of the argon plasma, solving many of the day to day analytical problems prevalent in the trace analysis laboratory. Utilization of plasmas as high temperature atomization and excitation sources for analytical chemistry, opened new frontiers in technology, that were not well documented in classical reference and text books. In addition to research papers, numerous review articles [ 11, monographs [2], and proceedings of conferences [3] have been compiled describing the state of the art in this technology. However, until recently no definitive or comprehensive texts have been available to serve as reference works specifically for inductively coupled plasma (ICP) analytical spectroscopy. An excellent two volume set, edited by BOUMANS[4,5] provides a detailed description of methodology, instrumentation, applications, and performance. Inductively Coupled Plasmas in Analytical Atomic Spectroscopy is an excellent compilation of contributions from 25 internationally recognized scientists. Montaser and Golightly have arranged the text in four parts: (1) atomic emission spectrometry, including seven chapters on basic concepts, optical instrumentation, ICP equipment, analytical performance, spectral interferences, high resolution spectrometry and fundamental properties; (2) a discussion of complementary techniques including ICP atomic fluorescence spectrometry and ICP mass spectrometry; (3) a discussion of sample introduction including chapters on liquids, solids and gases, as well as chapters on low-gas-flow torches and mixedgas plasmas; and finally, (4) a chapter on recent applications. The book is well edited with each chapter containing the same general kind of material and retaining the same general format which assists the reader in easily perusing through the book to find specific items of interest, an important characteristic for a reference text. Each chapter includes a section on future direction of research of the topic along with an extensive reference list. Technical information in the book appears to be at the state-of-the-art level with extensive citations to publications appearing in the literature within the last two to five years. An added benefit is the table of prominent spectral emission lines for the argon plasma included in the appendix [6]. The section on applications consists of a single, well prepared and well documented overview chapter contributed by P. N. Keliher. If there is any weakness to this volume, it is the lack of more extensive discussions of specific applications. Two or three additional chapters on specific application topics such as environmental chemistry, geology, clinical chemistry or biological applications, would greatly enhance the scope of the book. This is an excellent text that should be in the library of any research scientist or serious student involved with the analytical chemistry use of inductively coupled plasmas. The editors have done an outstanding job of assembling a significant contribution to the reference literature in this field and along with the previously mentioned citations [4,5], this text will be considered a classic reference for years to come. U.S. Geological Survey
H. E.
TAYLOR
Denver, Colorado, U.S.A.
Cl1 S. Greenfield, H. McD. McGeachin and P. B. Smith, Talantn 23, 1 (1976). PI R. M. Barnes, CRC Crit. Reo. Anal. Chem. 7, 203 (1978). c31 R. M. Barnes, Ed., Deuelopments in Atomic Plasma Spectrochemical Analysis. Heyden, Philadelphia (1981). c41 P. W. J. M. Boumans, Inductively Coupled Plasma Emission Spectroscopy, Part I. Methodology, Instrumentation and Performance. Wiley, New York (1987). P. W. J. M. Boumans, Inductively Coupled Plasma Emission Spectroscopy, Part II. Applications and Fundamentals. Wiley, New York (1987). (1979). PI R. K. Winge, V. J. Peterson and V. A. Fassel, Appl. Spectrosc. 33,206219 235
SpecrrochimicaAcfa, Vol. 448, No. 2, P. 235, 1989 Printed in Great Britain.
BOOK REVIEW
Inductively
Coupled
Plasmas in Analytical Atomic Spectroscopy,
edited by A. MONTASERand D. W.
GOLIGHTLY.VCH Pub., New York (1987). Since the early 196Os, the inductively coupled plasma has developed into an effective emission spectroscopic source for use in analytical chemistry. This rapid growth has been due, in part, to the excellent operational characteristics of the argon plasma, solving many of the day to day analytical problems prevalent in the trace analysis laboratory. Utilization of plasmas as high temperature atomization and excitation sources for analytical chemistry, opened new frontiers in technology, that were not well documented in classical reference and text books. In addition to research papers, numerous review articles [ 11, monographs [2], and proceedings of conferences [3] have been compiled describing the state of the art in this technology. However, until recently no definitive or comprehensive texts have been available to serve as reference works specifically for inductively coupled plasma (ICP) analytical spectroscopy. An excellent two volume set, edited by BOUMANS[4,5] provides a detailed description of methodology, instrumentation, applications, and performance. Inductively Coupled Plasmas in Analytical Atomic Spectroscopy is an excellent compilation of contributions from 25 internationally recognized scientists. Montaser and Golightly have arranged the text in four parts: (1) atomic emission spectrometry, including seven chapters on basic concepts, optical instrumentation, ICP equipment, analytical performance, spectral interferences, high resolution spectrometry and fundamental properties; (2) a discussion of complementary techniques including ICP atomic fluorescence spectrometry and ICP mass spectrometry; (3) a discussion of sample introduction including chapters on liquids, solids and gases, as well as chapters on low-gas-flow torches and mixedgas plasmas; and finally, (4) a chapter on recent applications. The book is well edited with each chapter containing the same general kind of material and retaining the same general format which assists the reader in easily perusing through the book to find specific items of interest, an important characteristic for a reference text. Each chapter includes a section on future direction of research of the topic along with an extensive reference list. Technical information in the book appears to be at the state-of-the-art level with extensive citations to publications appearing in the literature within the last two to five years. An added benefit is the table of prominent spectral emission lines for the argon plasma included in the appendix [6]. The section on applications consists of a single, well prepared and well documented overview chapter contributed by P. N. Keliher. If there is any weakness to this volume, it is the lack of more extensive discussions of specific applications. Two or three additional chapters on specific application topics such as environmental chemistry, geology, clinical chemistry or biological applications, would greatly enhance the scope of the book. This is an excellent text that should be in the library of any research scientist or serious student involved with the analytical chemistry use of inductively coupled plasmas. The editors have done an outstanding job of assembling a significant contribution to the reference literature in this field and along with the previously mentioned citations [4,5], this text will be considered a classic reference for years to come. U.S. Geological Survey
H. E.
TAYLOR
Denver, Colorado, U.S.A.
Cl1 S. Greenfield, H. McD. McGeachin and P. B. Smith, Talantn 23, 1 (1976). PI R. M. Barnes, CRC Crit. Reo. Anal. Chem. 7, 203 (1978). c31 R. M. Barnes, Ed., Deuelopments in Atomic Plasma Spectrochemical Analysis. Heyden, Philadelphia (1981). c41 P. W. J. M. Boumans, Inductively Coupled Plasma Emission Spectroscopy, Part I. Methodology, Instrumentation and Performance. Wiley, New York (1987). P. W. J. M. Boumans, Inductively Coupled Plasma Emission Spectroscopy, Part II. Applications and Fundamentals. Wiley, New York (1987). (1979). PI R. K. Winge, V. J. Peterson and V. A. Fassel, Appl. Spectrosc. 33,206219 235